公开(公告)号：US20140034605A1

公开(公告)日：2014-02-06

申请号：US13942162

申请日：2013-07-15

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chin-Ching LIN ,  Yu-Chun CHEN ,  En-Kuang WANG ,  Mei-Ching CHIANG ,  Yi-Chen CHEN

IPC: B44C1/22

CPC classification number: B44C1/227 ,  C23C24/082 ,  C23C24/085 ,  H01L21/0272

Abstract: The present disclosure provides a patterning process for an oxide film, including: covering a barrier layer composition on a substrate to form a patterned barrier layer, wherein the barrier layer composition includes an inorganic component and an organic binder with a weight ratio of 50-98:2-50; forming an oxide film on the patterned barrier layer and the substrate, wherein a thickness ratio (D1/D2) of the barrier layer (D1) to the oxide film (D2) is about 5-2000; and lifting off the barrier layer and the oxide film thereon, while leaving portions of the oxide film on the substrate.

Abstract translation: 本公开提供了一种用于氧化物膜的图案化工艺，包括：在基板上覆盖阻挡层组合物以形成图案化阻挡层，其中阻挡层组合物包含无机组分和重量比为50-98的有机粘合剂 ：2-50; 在图案化的阻挡层和基板上形成氧化膜，其中阻挡层（D1）与氧化膜（D2）的厚度比（D1 / D2）约为5〜2000; 并且在其上放置阻挡层和氧化膜，同时将氧化膜的一部分留在基板上。

公开(公告)号：US20150328659A1

公开(公告)日：2015-11-19

申请号：US14655112

申请日：2012-12-28

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yu-Chun CHEN ,  Chin-Ching LIN ,  En-Kuang WANG ,  Mei-Ching CHIANG ,  Yi-Chen CHEN ,  Hung-Chou LIAO

IPC: B05D1/34 ,  B05D3/00 ,  B05D1/02

CPC classification number: B05D1/34 ,  B05D1/02 ,  B05D3/002 ,  C03C17/253 ,  C23C18/1216 ,  Y10T428/24355

Abstract: A low-haze tin oxide film and a manufacturing method thereof are provided. The method includes: applying a mixed solution on a substrate and heating the substrate to form a tin oxide film. The mixed solution contains a tin source, an oxidizing agent, and a solvent.

Abstract translation: 提供了一种低雾氧化锡膜及其制造方法。 该方法包括：将混合溶液施加在基底上并加热基底以形成氧化锡膜。 混合溶液含有锡源，氧化剂和溶剂。