公开(公告)号：US20140034605A1

公开(公告)日：2014-02-06

申请号：US13942162

申请日：2013-07-15

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chin-Ching LIN ,  Yu-Chun CHEN ,  En-Kuang WANG ,  Mei-Ching CHIANG ,  Yi-Chen CHEN

IPC: B44C1/22

CPC classification number: B44C1/227 ,  C23C24/082 ,  C23C24/085 ,  H01L21/0272

Abstract: The present disclosure provides a patterning process for an oxide film, including: covering a barrier layer composition on a substrate to form a patterned barrier layer, wherein the barrier layer composition includes an inorganic component and an organic binder with a weight ratio of 50-98:2-50; forming an oxide film on the patterned barrier layer and the substrate, wherein a thickness ratio (D1/D2) of the barrier layer (D1) to the oxide film (D2) is about 5-2000; and lifting off the barrier layer and the oxide film thereon, while leaving portions of the oxide film on the substrate.

Abstract translation: 本公开提供了一种用于氧化物膜的图案化工艺，包括：在基板上覆盖阻挡层组合物以形成图案化阻挡层，其中阻挡层组合物包含无机组分和重量比为50-98的有机粘合剂 ：2-50; 在图案化的阻挡层和基板上形成氧化膜，其中阻挡层（D1）与氧化膜（D2）的厚度比（D1 / D2）约为5〜2000; 并且在其上放置阻挡层和氧化膜，同时将氧化膜的一部分留在基板上。

公开(公告)号：US20150030802A1

公开(公告)日：2015-01-29

申请号：US14335560

申请日：2014-07-18

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yu-Chun CHEN ,  Pei-Hsin YANG ,  Chin-Ching LIN ,  Yi-Chen CHEN ,  Hung-Chou LIAO ,  Mei-Ching CHIANG

IPC: C04B35/495 ,  G02B5/20

CPC classification number: C04B35/495 ,  C03C17/007 ,  C03C2217/445 ,  C03C2217/475 ,  C03C2217/48 ,  C04B35/62218 ,  C04B35/62222 ,  C04B2235/3201 ,  C04B2235/762 ,  C04B2235/767 ,  C04B2235/80 ,  G02B5/208 ,  Y10T428/24 ,  Y10T428/2982

Abstract: The disclosure provides an infrared absorption material, a method for fabricating the same, and a thermal isolation structure employing the same. The infrared absorption material includes a tungsten bronze complex having a formula of M1xM2yWOz, wherein 0.6≦x≦0.8, 0.2≦y≦0.33, 0.8≦x+y

Abstract translation: 本发明提供红外线吸收材料，其制造方法以及使用其的热隔离结构。 红外吸收材料包括具有式M1xM2yWOz的钨青铜络合物，其中0.6和nlE; x和nlE; 0.8,0.2和nlE; y和nlE; 0.33,0.8和nlE; x + y <1和2

公开(公告)号：US20140134734A1

公开(公告)日：2014-05-15

申请号：US13713327

申请日：2012-12-13

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Pei-Ju LIN ,  Guilhem TOURNIAIRE ,  Yi-Chen CHEN ,  Kathryn SWINDELLS ,  Bin-Ru SHE ,  Hsiang-Chun HSU ,  Chih-Ching LIAO ,  Su-Yo LIN

IPC: C12N5/00

CPC classification number: C12N5/0031 ,  C08F220/06 ,  C08F220/14 ,  C08F220/18 ,  C08F220/28 ,  C08F222/26 ,  C12N5/0037 ,  C12N5/0068 ,  C12N2533/30

Abstract: The disclosure provides a cell culture system and a serum-free method for cultivating cells. The cell culture system includes a substratum, wherein the substratum has a surface. A polymer is disposed on the surface of the substratum, wherein the polymer is prepared by polymerizing a first monomer with a second monomer. The first monomer has a structure as represented by Formula (I), and the second monomer has a structure as represented by Formula (II): wherein, R1 is hydrogen or methyl; R2 is methyl, ethyl, or —CH2CH2OCH3; R3 is hydrogen or methyl; and, R4 is hydrogen, —CH2CH2OCOCHCHCOOH, —CH2CH2OCOCH2CH2COOH, or —CH2CH2COOH.

Abstract translation: 本公开提供了一种培养细胞的细胞培养系统和无血清方法。 细胞培养系统包括底物，其中底物具有表面。 聚合物设置在基底的表面上，其中聚合物通过使第一单体与第二单体聚合来制备。 第一单体具有由式（I）表示的结构，第二单体具有由式（II）表示的结构：其中，R 1为氢或甲基; R2是甲基，乙基或-CH2CH2OCH3; R3是氢或甲基; 和R 4是氢，-CH 2 CH 2 OCOCHCHCOOH，-CH 2 CH 2 OCOCH 2 CH 2 COOH或-CH 2 CH 2 COOH。

公开(公告)号：US20220204936A1

公开(公告)日：2022-06-30

申请号：US17475794

申请日：2021-09-15

Applicant: Industrial Technology Research Institute

Inventor： Yu-Bing LIOU ,  Chih-Ching LIAO ,  Hsin-Yi HSU ,  Ying-Wen SHEN ,  Yun-Chung TENG ,  Hsin-Hsin SHEN ,  Yi-Chen CHEN

IPC: C12N5/077 ,  C08J5/18

Abstract: A non-fibrous film of which the composition includes a collagen and a polyester polymer is provided. A content of the polyester polymer in the non-fibrous film is 1-60 wt %. Moreover, the non-fibrous film has a swelling rate of 1-200 μm/hour or a swelling proportion per unit time of 0.1-2%/hour in an aqueous liquid.

公开(公告)号：US20150328659A1

公开(公告)日：2015-11-19

申请号：US14655112

申请日：2012-12-28

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yu-Chun CHEN ,  Chin-Ching LIN ,  En-Kuang WANG ,  Mei-Ching CHIANG ,  Yi-Chen CHEN ,  Hung-Chou LIAO

IPC: B05D1/34 ,  B05D3/00 ,  B05D1/02

CPC classification number: B05D1/34 ,  B05D1/02 ,  B05D3/002 ,  C03C17/253 ,  C23C18/1216 ,  Y10T428/24355

Abstract: A low-haze tin oxide film and a manufacturing method thereof are provided. The method includes: applying a mixed solution on a substrate and heating the substrate to form a tin oxide film. The mixed solution contains a tin source, an oxidizing agent, and a solvent.

Abstract translation: 提供了一种低雾氧化锡膜及其制造方法。 该方法包括：将混合溶液施加在基底上并加热基底以形成氧化锡膜。 混合溶液含有锡源，氧化剂和溶剂。