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    Method of effecting correction in an optical system
    1.
    发明授权
    Method of effecting correction in an optical system 失效

    公开(公告)号：US3362285A

    公开(公告)日：1968-01-09

    申请号：US35352764

    申请日：1964-03-20

    Applicant: INST PLASMAPHYSIK GMBH

    Inventor： HEINRICH HORA

    IPC: B23K26/02 ,  G02B27/00 ,  G02B27/58

    CPC classification number: G02B27/58 ,  B23K26/02 ,  G02B27/0025 ,  Y10S359/90

    Abstract: 1,021,839. Etching. INSTITUT FUR PLASMAPHYSIK G.m.b.H. March 23, 1964 [March 22, 1963], No. 12110/64. Heading B6J. [Also in Divisions G2 and H3] The boundary surface of a laser crystal 10 1 , Fig. 3, or other optical element is corrected to make it correspond more closely to the equiphase surface of a wave front passing therethrough by producing an image at 26 of the uncorrected surface showing the phase errors in the form of intensity variations of the image, projecting this image back on to layer 20 bounding the surface and made of a material whose solubility characteristics in a specific solvent can be varied by irradiation with the light used for the back projection, and, using this irradiated layer as a control, selectively removing material from the uncorrected boundary surface so as to obtain a surface corresponding more closely with the equiphase surface of the wavefront. As applied to a ruby crystal 10 1 , the end faces are ground substantially plane-parallel to one another and coated with a 100% reflective mirror 16 at one end and a transparent layer 20, of a material whose solubility in certain solvents alters under irradiation by short wave light, but is insensitive to the red light emitted by the laser, and, after layer 20 is ground flat at 22 a 95 to 99% reflective non-absorptive mirror coating 18 1 . The crystal 10 1 is excited to produce stimulated emission and through optical system 24 produces an image on the red-sensitive photographic layer 26. The mirror coating 18 1 is removed and photographic layer 26 developed and fixed. Light, to which layer 20 is sensitive, is now used to project an image of developed layer 26 back on to layer 20 which is then treated with a solvent so that layer 20, which is used as one face of the laser crystal, has a boundary surface more closely correspondingwith the equiphase surface. A coating similar to 18 1 is then provided on the new surface. In a modification the production of the image and back projection are repeated several times to obtain a boundary surface successively closer to that required. In a further form, layer 20 does not remain in the optical element but is used as an etch-resistant layer for controlling the direct etching away of the element and the layer is subsequently removed.

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