公开(公告)号：US20220059704A1

公开(公告)日：2022-02-24

申请号：US16999819

申请日：2020-08-21

Applicant: INTEL CORPORATION

Inventor： Chieh-jen Ku ,  Bernhard Sell ,  Pei-hua Wang ,  Christopher J. Wiegand

IPC: H01L29/786 ,  H01L27/108

Abstract: Disclosed herein are transistor cap-channel arrangements, and related methods and devices. For example, in some embodiments, a transistor cap-channel arrangement may include a channel material having a conductivity type; an insulating material; and a cap material between the channel material and the insulating material, wherein the cap material is different from the channel material and the insulating material, and the cap material has a conductivity type that is a same conductivity type as the channel material.

公开(公告)号：US20230171936A1

公开(公告)日：2023-06-01

申请号：US18161915

申请日：2023-01-31

Applicant: Intel Corporation

Inventor： Abhishek A. Sharma ,  Juan G. Alzate-Vinasco ,  Fatih Hamzaoglu ,  Bernhard Sell ,  Pei-hua Wang ,  Van H. Le ,  Jack T. Kavalieros ,  Tahir Ghani ,  Umut Arslan ,  Travis W. Lajoie ,  Chieh-jen Ku

IPC: H10B10/00 ,  G11C11/403 ,  H10B12/00

CPC classification number: H10B10/00 ,  G11C11/403 ,  H10B12/01

Abstract: Described herein are two transistor (2T) memory cells that use TFTs as access and gain transistors. When one or both transistors of a 2T memory cell are implemented as TFTs, these transistors may be provided in different layers above a substrate, enabling a stacked architecture. An example 2T memory cell includes an access TFT provided in a first layer over a substrate, and a gain TFT provided in a second layer over the substrate, the first layer being between the substrate and the second layer (i.e., the gain TFT is stacked in a layer above the access TFT). Stacked TFT based 2T memory cells allow increasing density of memory cells in a memory array having a given footprint area, or, conversely, reducing the footprint area of the memory array with a given memory cell density.

公开(公告)号：US11450669B2

公开(公告)日：2022-09-20

申请号：US16043548

申请日：2018-07-24

Applicant: Intel Corporation

Inventor： Abhishek A. Sharma ,  Juan G. Alzate-Vinasco ,  Fatih Hamzaoglu ,  Bernhard Sell ,  Pei-hua Wang ,  Van H. Le ,  Jack T. Kavalieros ,  Tahir Ghani ,  Umut Arslan ,  Travis W. Lajoie ,  Chieh-jen Ku

IPC: H01L27/108 ,  G11C7/06 ,  G11C11/407 ,  H01L23/00 ,  H01L25/065 ,  H01L27/06 ,  H01L29/417 ,  H01L29/786 ,  H01L27/11

Abstract: Described herein are arrays of embedded dynamic random-access memory (eDRAM) cells that use TFTs as selector transistors. When at least some selector transistors are implemented as TFTs, different eDRAM cells may be provided in different layers above a substrate, enabling a stacked architecture. An example stacked TFT based eDRAM includes one or more memory cells provided in a first layer over a substrate and one or more memory cells provided in a second layer, above the first layer, where at least the memory cells in the second layer, but preferably the memory cells in both the first and second layers, use TFTs as selector transistors. Stacked TFT based eDRAM allows increasing density of memory cells in a memory array having a given footprint area, or, conversely, reducing the footprint area of the memory array with a given memory cell density.

公开(公告)号：US20200035683A1

公开(公告)日：2020-01-30

申请号：US16043548

申请日：2018-07-24

Applicant: Intel Corporation

Inventor： Abhishek A. Sharma ,  Juan G. Alzate-Vinasco ,  Fatih Hamzaoglu ,  Bernhard Sell ,  Pei-hua Wang ,  Van H. Le ,  Jack T. Kavalieros ,  Tahir Ghani ,  Umut Arslan ,  Travis W. Lajoie ,  Chieh-jen Ku

IPC: H01L27/108 ,  H01L27/06 ,  H01L25/065 ,  H01L29/786 ,  H01L23/00 ,  H01L29/417 ,  G11C11/407 ,  G11C7/06

Abstract: Described herein are arrays of embedded dynamic random-access memory (eDRAM) cells that use TFTs as selector transistors. When at least some selector transistors are implemented as TFTs, different eDRAM cells may be provided in different layers above a substrate, enabling a stacked architecture. An example stacked TFT based eDRAM includes one or more memory cells provided in a first layer over a substrate and one or more memory cells provided in a second layer, above the first layer, where at least the memory cells in the second layer, but preferably the memory cells in both the first and second layers, use TFTs as selector transistors. Stacked TFT based eDRAM allows increasing density of memory cells in a memory array having a given footprint area, or, conversely, reducing the footprint area of the memory array with a given memory cell density.

公开(公告)号：US20190326296A1

公开(公告)日：2019-10-24

申请号：US15956379

申请日：2018-04-18

Applicant: Intel Corporation

Inventor： Yih Wang ,  Abhishek A. Sharma ,  Tahir Ghani ,  Allen B. Gardiner ,  Travis W. Lajoie ,  Pei-hua Wang ,  Chieh-jen Ku ,  Bernhard Sell ,  Juan G. Alzate-Vinasco ,  Blake C. Lin

IPC: H01L27/108 ,  H01L27/12 ,  H01L23/528 ,  H01L23/522 ,  H01L27/06

Abstract: Described herein are embedded dynamic random-access memory (eDRAM) memory cells and arrays, as well as corresponding methods and devices. An exemplary eDRAM memory array implements a memory cell that uses a thin-film transistor (TFT) as a selector transistor. One source/drain (S/D) electrode of the TFT is coupled to a capacitor for storing a memory state of the cell, while the other S/D electrode is coupled to a bitline. The bitline may be a shallow bitline in that a thickness of the bitline may be smaller than a thickness of one or more metal interconnects provided in the same metal layer as the bitline but used for providing electrical connectivity for components outside of the memory array. Such a bitline may be formed in a separate process than said one or more metal interconnects. In an embodiment, the memory cells may be formed in a back end of line process.

公开(公告)号：US12238913B2

公开(公告)日：2025-02-25

申请号：US18161915

申请日：2023-01-31

Applicant: Intel Corporation

Inventor： Abhishek A. Sharma ,  Juan G. Alzate-Vinasco ,  Fatih Hamzaoglu ,  Bernhard Sell ,  Pei-hua Wang ,  Van H. Le ,  Jack T. Kavalieros ,  Tahir Ghani ,  Umut Arslan ,  Travis W. Lajoie ,  Chieh-jen Ku

IPC: H10B10/00 ,  G11C11/403 ,  H10B12/00

Abstract: Described herein are two transistor (2T) memory cells that use TFTs as access and gain transistors. When one or both transistors of a 2T memory cell are implemented as TFTs, these transistors may be provided in different layers above a substrate, enabling a stacked architecture. An example 2T memory cell includes an access TFT provided in a first layer over a substrate, and a gain TFT provided in a second layer over the substrate, the first layer being between the substrate and the second layer (i.e., the gain TFT is stacked in a layer above the access TFT). Stacked TFT based 2T memory cells allow increasing density of memory cells in a memory array having a given footprint area, or, conversely, reducing the footprint area of the memory array with a given memory cell density.

公开(公告)号：US11329047B2

公开(公告)日：2022-05-10

申请号：US15956379

申请日：2018-04-18

Applicant: Intel Corporation

Inventor： Yih Wang ,  Abhishek A. Sharma ,  Tahir Ghani ,  Allen B. Gardiner ,  Travis W. Lajoie ,  Pei-hua Wang ,  Chieh-jen Ku ,  Bernhard Sell ,  Juan G. Alzate-Vinasco ,  Blake C. Lin

IPC: H01L27/108 ,  H01L27/12 ,  H01L23/528 ,  H01L23/522 ,  H01L27/06

Abstract: Described herein are embedded dynamic random-access memory (eDRAM) memory cells and arrays, as well as corresponding methods and devices. An exemplary eDRAM memory array implements a memory cell that uses a thin-film transistor (TFT) as a selector transistor. One source/drain (S/D) electrode of the TFT is coupled to a capacitor for storing a memory state of the cell, while the other S/D electrode is coupled to a bitline. The bitline may be a shallow bitline in that a thickness of the bitline may be smaller than a thickness of one or more metal interconnects provided in the same metal layer as the bitline but used for providing electrical connectivity for components outside of the memory array. Such a bitline may be formed in a separate process than said one or more metal interconnects. In an embodiment, the memory cells may be formed in a back end of line process.

公开(公告)号：US20200091156A1

公开(公告)日：2020-03-19

申请号：US16133655

申请日：2018-09-17

Applicant: Intel Corporation

Inventor： Abhishek A. Sharma ,  Juan G. Alzate-Vinasco ,  Fatih Hamzaoglu ,  Bernhard Sell ,  Pei-hua Wang ,  Van H. Le ,  Jack T. Kavalieros ,  Tahir Ghani ,  Umut Arslan ,  Travis W. Lajoie ,  Chieh-jen Ku

IPC: H01L27/11 ,  H01L27/108 ,  G11C11/403

Abstract: Described herein are two transistor (2T) memory cells that use TFTs as access and gain transistors. When one or both transistors of a 2T memory cell are implemented as TFTs, these transistors may be provided in different layers above a substrate, enabling a stacked architecture. An example 2T memory cell includes an access TFT provided in a first layer over a substrate, and a gain TFT provided in a second layer over the substrate, the first layer being between the substrate and the second layer (i.e., the gain TFT is stacked in a layer above the access TFT). Stacked TFT based 2T memory cells allow increasing density of memory cells in a memory array having a given footprint area, or, conversely, reducing the footprint area of the memory array with a given memory cell density.