公开(公告)号：US08852967B2

公开(公告)日：2014-10-07

申请号：US13721534

申请日：2012-12-20

申请人： Intermolecular, Inc.

发明人： George Mirth

IPC分类号： H01L21/66 ,  C23F1/00 ,  H01L21/67

CPC分类号： H01L21/67063 ,  H01L21/6708 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/68771 ,  H01L22/12 ,  H01L22/26

摘要： A multiple channel site-isolated reactor system and method are described. The system contains a reactor block with a plurality of reactors. Input lines are coupled to each reactor to provide a fluid to the respective reactors. A sealing element associated with each reactor contacts a surface of a substrate disposed below the reactor block, which defines isolated regions on the surface of the substrate. A dissolution rate monitor extends into each reactor to monitor a rate of real-time dissolution of one or more layers on the surface of the substrate when it is disposed proximate to the surface of the substrate.

摘要翻译： 描述了多通道位置分离的反应器系统和方法。 该系统包含具有多个反应器的反应器块。 输入线连接到每个反应器以向相应的反应器提供流体。 与每个反应器相关联的密封元件接触设置在反应器块下方的基板的表面，其限定了基板表面上的隔离区域。 溶解速率监测器延伸到每个反应器中，以便当它靠近衬底的表面设置时，监测衬底表面上的一个或多个层的实时溶解的速率。

公开(公告)号：US08906709B1

公开(公告)日：2014-12-09

申请号：US14138797

申请日：2013-12-23

申请人： Intermolecular, Inc.

发明人： Khaled Ahmed ,  Frank Greer ,  George Mirth ,  Zhi-Wen Sun

IPC分类号： H01L21/66

CPC分类号： H01L22/12 ,  H01L21/6708 ,  H01L21/67253 ,  H01L22/20

摘要： Provided are methods of high productivity combinatorial (HPC) inspection of semiconductor substrates. A substrate includes two layers of dissimilar materials interfacing each other, such as a stack of a silicon bottom layer and an indium gallium arsenide top layer. The dissimilar materials have one or more of thermal, structural, and lattice mismatches. As a part of the inspection, the top layer is etched in a combinatorial manner. Specifically, the top layer is divided into multiple different site-isolated regions. One such region may be etched using different process conditions from another region. Specifically, etching temperature, etching duration and/or etchant composition may vary among the site-isolated regions. After combinatorial etching, each region is inspected to determine its etch-pit density (EPD) value. These values may be then analyzed to determine an overall EPD value for the substrate, which may involve discarding EPD values for over-etched and under-etched regions.

摘要翻译： 提供了半导体衬底的高生产率组合（HPC）检验方法。 衬底包括彼此相互接合的两层不同材料，例如硅底层和砷化铟镓顶层的叠层。 不同材料具有热，结构和晶格失配中的一种或多种。 作为检查的一部分，顶层以组合方式蚀刻。 具体来说，顶层被分成多个不同的位置隔离区域。 可以使用与另一区域不同的工艺条件来蚀刻一个这样的区域。 具体地，蚀刻温度，蚀刻持续时间和/或蚀刻剂组成可以在位置隔离区域之间变化。 在组合蚀刻之后，检查每个区域以确定其蚀刻坑密度（EPD）值。 然后可以分析这些值以确定衬底的整体EPD值，这可能涉及丢弃过蚀刻和欠蚀刻区域的EPD值。

公开(公告)号：US09174323B2

公开(公告)日：2015-11-03

申请号：US13671478

申请日：2012-11-07

申请人： Intermolecular, Inc.

发明人： Kim Van Berkel ,  Aaron T. Francis ,  Frank C. Ma ,  George Mirth

IPC分类号： B24B37/26 ,  B24B37/10

CPC分类号： B24B37/26 ,  B24B37/10

摘要： Polishing and cleaning techniques are combinatorially processed and evaluated. A polishing system can include a reactor assembly having multiple reaction chambers, with at least a reaction chamber including a rotatable polishing head, slurry and chemical distribution, chemical and water rinse, and slurry and fluid removal. Different downward forces can be applied to the polishing heads for evaluating optimum process conditions. Channels in the polishing pads can redistribute slurry and chemical to the polishing area.

摘要翻译： 抛光和清洁技术被组合处理和评估。 抛光系统可以包括具有多个反应室的反应器组件，其中至少一个反应室包括可旋转的抛光头，浆料和化学分布，化学和水冲洗以及淤浆和流体的去除。 可以向抛光头施加不同的向下的力以评估最佳工艺条件。 抛光垫中的通道可以将浆料和化学品重新分配到抛光区域。

公开(公告)号：US20140179030A1

公开(公告)日：2014-06-26

申请号：US13721534

申请日：2012-12-20

申请人： INTERMOLECULAR, INC.

发明人： George Mirth

IPC分类号： H01L21/66 ,  H01L21/67

CPC分类号： H01L21/67063 ,  H01L21/6708 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/68771 ,  H01L22/12 ,  H01L22/26

摘要： A multiple channel site-isolated reactor system and method are described. The system contains a reactor block with a plurality of reactors. Input lines are coupled to each reactor to provide a fluid to the respective reactors. A sealing element associated with each reactor contacts a surface of a substrate disposed below the reactor block, which defines isolated regions on the surface of the substrate. A dissolution rate monitor extends into each reactor to monitor a rate of real-time dissolution of one or more layers on the surface of the substrate when it is disposed proximate to the surface of the substrate.

摘要翻译： 描述了多通道位置分离的反应器系统和方法。 该系统包含具有多个反应器的反应器块。 输入线连接到每个反应器以向相应的反应器提供流体。 与每个反应器相关联的密封元件接触设置在反应器块下方的基板的表面，其限定了基板表面上的隔离区域。 溶解速率监测器延伸到每个反应器中，以便当它靠近衬底的表面设置时，监测衬底表面上的一个或多个层的实时溶解的速率。

公开(公告)号：US20140127974A1

公开(公告)日：2014-05-08

申请号：US13671478

申请日：2012-11-07

申请人： INTERMOLECULAR, INC.

发明人： Kim Van Berkel ,  Aaron T. Francis ,  Frank C. Ma ,  George Mirth

IPC分类号： B24B37/00 ,  B24B37/10 ,  B24B37/26

CPC分类号： B24B37/26 ,  B24B37/10

摘要： Polishing and cleaning techniques are combinatorially processed and evaluated. A polishing system can include a reactor assembly having multiple reaction chambers, with at least a reaction chamber including a rotatable polishing head, slurry and chemical distribution, chemical and water rinse, and slurry and fluid removal. Different downward forces can be applied to the polishing heads for evaluating optimum process conditions. Channels in the polishing pads can redistribute slurry and chemical to the polishing area.

摘要翻译： 抛光和清洁技术被组合处理和评估。 抛光系统可以包括具有多个反应室的反应器组件，其中至少一个反应室包括可旋转的抛光头，浆料和化学分布，化学和水冲洗以及淤浆和流体的去除。 可以向抛光头施加不同的向下的力以评估最佳工艺条件。 抛光垫中的通道可以将浆料和化学品重新分配到抛光区域。