PATTERNING PROCESS
    2.
    发明申请
    PATTERNING PROCESS 审中-公开
    绘图过程

    公开(公告)号:US20090126589A1

    公开(公告)日:2009-05-21

    申请号:US11916982

    申请日:2006-06-06

    IPC分类号: B41F1/18

    摘要: A patterning process, including applying pressure to and removing pressure from one or more regions of a substance to transform a phase of one or more regions of the substance, the transformed one or more regions having respective predetermined shapes representing a predetermined pattern. The patterning process can be used to form nanoscale patterns in substances without requiring the use of photoresist or conventional optical or electron-beam lithography, thus avoiding the limitations of those techniques.

    摘要翻译: 一种图案化工艺,包括向物质的一个或多个区域施加压力并从中去除压力,以转化物质的一个或多个区域的相位,变换的一个或多个区域具有表示预定图案的各自的预定形状。 图案化工艺可用于在物质中形成纳米尺度图案,而不需要使用光致抗蚀剂或常规光学或电子束光刻,从而避免了这些技术的限制。