公开(公告)号：US20140161979A1

公开(公告)日：2014-06-12

申请号：US14177151

申请日：2014-02-10

Applicant: Industrial Technology Research Institute

Inventor： Chung-Shin WU ,  Pei-Sun SHENG ,  Wei-Tse HSU

IPC: C23C18/02 ,  B05D1/18 ,  B05D3/02

CPC classification number: C23C18/02 ,  B05D1/18 ,  B05D3/0218 ,  C23C18/12 ,  C23C18/1204 ,  C23C18/1291 ,  C23C18/1601 ,  C23C18/1614 ,  C23C18/1619 ,  C23C18/163 ,  C23C18/1633 ,  C23C18/54

Abstract: Chemical bath deposition (CBD) apparatuses and fabrication methods for compound thin films are presented. A chemical bath deposition apparatus includes a chemical bath reaction container, a substrate chuck for fixing a substrate arranged face-down toward the bottom of the chemical bath reaction container, multiple solution containers connecting to a reaction solution mixer and further connection to the chemical bath reaction container, and a temperature control system including a first heater controlling the temperature of the chemical bath reaction container, a second heater controlling the temperature of the substrate chuck, and a third heater controlling the temperature of the multiple solution containers.

Abstract translation: 介绍化学浴沉积（CBD）装置及复合薄膜的制造方法。 化学浴沉积装置包括化学浴反应容器，用于固定朝向药液反应容器的底部布置的基板的基板卡盘，连接到反应溶液混合器的多个溶液容器，并进一步连接到化学浴反应 容器和温度控制系统，其包括控制化学浴反应容器的温度的第一加热器，控制基板卡盘的温度的第二加热器和控制多个溶液容器的温度的第三加热器。