MICRO-COLUMN WITH DOUBLE ALIGNER
    1.
    发明申请
    MICRO-COLUMN WITH DOUBLE ALIGNER 有权
    具有双重对准的微柱

    公开(公告)号:US20140239190A1

    公开(公告)日:2014-08-28

    申请号:US14184931

    申请日:2014-02-20

    CPC classification number: H01J37/1471 H01J2237/1205 H01J2237/1516

    Abstract: Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam.

    Abstract translation: 本文公开了具有双重对准器的微柱。 微柱被配置成使得当限制孔的孔的轴线与粒子束的原始路径间隔开时,可以有效地补偿粒子束的路径,使得粒子束的路径 通过双重对准器与限制孔径的孔径对准。 微柱包括源透镜。 源透镜包括补偿粒子束的路径的至少两个对准器层。

    ULTRA-MINIATURIZED ELECTRON OPTICAL MICROCOLUMN
    2.
    发明申请
    ULTRA-MINIATURIZED ELECTRON OPTICAL MICROCOLUMN 有权
    超微型电子光电微孔

    公开(公告)号:US20140224997A1

    公开(公告)日:2014-08-14

    申请号:US14180350

    申请日:2014-02-13

    Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

    Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源,引起来自电子发射源的电子的引出电极,响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标,加速由引出电极发射的电子的加速电极,限制电极使用由加速电极加速的电子来调节电子束的量和尺寸,以及 偏转器偏转电子束朝向目标。

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