Semiconductor Device and Method of Manufacturing the Same

    公开(公告)号:US20240055490A1

    公开(公告)日:2024-02-15

    申请号:US18226321

    申请日:2023-07-26

    摘要: The present application relates to a semiconductor device, including: a field electrode in a needle-shaped field electrode trench extending from a frontside of a semiconductor body into the semiconductor body; a lower metallization layer on the frontside of the semiconductor body and electrically connected to the field electrode; an insulating layer on the lower metallization layer; an upper metallization layer on the insulating layer, and a first interconnect electrically connecting the lower metallization layer to the upper metallization layer. The first interconnect is laterally offset to the field electrode trench. The lower metallization layer is not connected to the upper metallization layer in a region vertically above the field electrode trench.