-
公开(公告)号:US20210352835A1
公开(公告)日:2021-11-11
申请号:US17306570
申请日:2021-05-03
发明人: Andreas BIRKNER
摘要: A method for processing substrates, in particular wafers, masks or flat panel displays, with a semi-conductor industry machine, wherein a computer-supported process is used to determine the presence and/or position and/or orientation of the substrate. Further, a system designed to execute the method. The computer-supported process includes an artificial neural network.
-
2.
公开(公告)号:US20240357784A1
公开(公告)日:2024-10-24
申请号:US18762917
申请日:2024-07-03
发明人: Andreas BIRKNER
CPC分类号: H05K13/0818 , G06N3/08 , H05K13/0015 , H05K13/0812
摘要: A method for processing substrates, in particular wafers, masks or flat panel displays, with a semi-conductor industry machine, wherein a computer-supported process is used to determine the presence and/or position and/or orientation of the substrate. Further, a system designed to execute the method. The computer-supported process includes an artificial neural network.
-
公开(公告)号:US20180155126A1
公开(公告)日:2018-06-07
申请号:US15568348
申请日:2016-03-09
发明人: Ingo WEISKE , Arndt EVERS , Han HARTGERS , Andreas BIRKNER , Guido VAN LOON
IPC分类号: B65G1/02
CPC分类号: B65G1/026 , G03F7/70 , H01L21/67709 , H01L21/67733
摘要: The invention relates to a maintenance apparatus for a clean room or for systems in the clean room comprising a system component which can be moved horizontally and vertically. The system component is suspended on magnetic rails.
-
公开(公告)号:US20170267504A1
公开(公告)日:2017-09-21
申请号:US15449415
申请日:2017-03-03
发明人: Andreas BIRKNER , Simon SCHADT , Arndt EVERS
CPC分类号: B66F7/00 , B66F9/10 , B66F9/12 , H01L21/67742
摘要: A maintenance apparatus, in particular for lifting and moving components of a system for processing semiconductor devices. The apparatus comprises a beam and an arm with means for lifting a component, the arm being mounted to the beam via a connecting unit and so as to be pivotable in a horizontal plane, wherein the connecting unit is displaceable along the beam, and wherein the arm is displaceable perpendicularly to the beam, and wherein a load accommodation means is provided on the pivotable arm.
-
-
-