Full Wafer Processing By Multiple Passes Through A Combinatorial Reactor
    1.
    发明申请
    Full Wafer Processing By Multiple Passes Through A Combinatorial Reactor 审中-公开
    通过组合反应器多次通过全晶片处理

    公开(公告)号:US20150056780A1

    公开(公告)日:2015-02-26

    申请号:US14506166

    申请日:2014-10-03

    CPC classification number: H01L21/76 H01L21/02 H01L21/306 H01L21/67017

    Abstract: Overlapping combinatorial processing can offer more processed regions, better particle performance and simpler process equipment. In overlapping combinatorial processing, one or more regions are processed in series with some degrees of overlapping between regions. In some embodiments, overlapping combinatorial processing can be used in conjunction with non-overlapping combinatorial processing and non-combinatorial processing to develop and investigate materials and processes for device processing and manufacturing.

    Abstract translation: 重叠组合处理可以提供更多的处理区域,更好的粒子性能和更简单的工艺设备。 在重叠组合处理中,一个或多个区域与区域之间的一些重叠程度串联处理。 在一些实施例中,重叠的组合处理可以结合非重叠的组合处理和非组合处理来使用,以开发和研究用于设备处理和制造的材料和过程。

    In-Situ Cleaning Assembly
    2.
    发明申请
    In-Situ Cleaning Assembly 审中-公开
    原位清洗组件

    公开(公告)号:US20140090668A1

    公开(公告)日:2014-04-03

    申请号:US14096282

    申请日:2013-12-04

    CPC classification number: H01L21/67057 H01L21/67051 H01L21/6719

    Abstract: A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.

    Abstract translation: 提供清洁室。 清洁室包括容纳卡盘的基座部分和固定到基部的盖子。 支撑组件连接到盖,并且支撑组件包括与底板间隔开的顶板,顶板具有限定穿过其中的多个开口,并且底板具有穿过其中限定的多个开口。 清洁室包括延伸穿过顶板和底板的多个开口的相应对的多个杯。 多个杯被配置为密封衬底的表面,其中多个杯的每个杯独立地由底板支撑。

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