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公开(公告)号：US08521461B2
公开(公告)日：2013-08-27
申请号：US13436705
申请日：2012-03-30
IPC分类号： G01F1/12
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A processing system for delivering a process gas to a reaction chamber using a recipe having a recipe flow rate is provided. The processing system includes a gas flow delivery system configured for delivering the process gas, wherein said gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one sensor. The processing system also includes a programmed computing device configured for applying a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.
摘要翻译： 提供了一种使用具有配方流量的食谱将处理气体输送到反应室的处理系统。 处理系统包括配置用于输送处理气体的气体流量输送系统，其中由质量流量控制器（MFC）控制到气孔的所述气体流量输送系统。 先前通过对气体进行加压来计算预测流量。 预先计算的预测流量通过至少一个传感器测量气体的一组上游压力值。 处理系统还包括编程计算装置，其被配置为施加一组校准因子的校准因子以确定预测流量，所述校准因子是该组上游压力值的平均值与一组的平均值的比率 的金上游压力值。
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公开(公告)号：US20110029268A1
公开(公告)日：2011-02-03
申请号：US12887218
申请日：2010-09-21
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one pressure sensor. The method also includes applying, using a programmed computing device, a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.
摘要翻译： 提供了一种使用具有配方流量的食谱将处理气体输送到等离子体处理系统的反应室的方法。 该方法包括通过由质量流量控制器（MFC）控制的气体输送系统将工艺气体输送到孔口。 先前通过对气体进行加压来计算预测流量。 进一步预先计算的预测流量通过至少一个压力传感器测量气体的一组上游压力值。 该方法还包括使用编程的计算设备应用一组校准因子的校准因子来确定预测流量，校准因子是该组上游压力值的平均值与一组的平均值之比 的金上游压力值。
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公开(公告)号：US20080115560A1
公开(公告)日：2008-05-22
申请号：US11938171
申请日：2007-11-09
IPC分类号： G01F25/00
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A method for determining an actual gas flow rate in a reaction chamber of a plasma processing system is provided. The method includes delivering gas fay a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, which is located upstream from the reaction chamber. The method also includes pressurizing the gas to create a choked flow condition within the orifice. The method further includes measuring a set of upstream pressure values of the gas via a set of pressure sensors. The method yet also includes applying a calibration factor of a set of calibration factors to determine the actual flow rate. The calibration factor is a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values, which is associated with an indicated flow rate for an MFC.
摘要翻译： 提供了一种用于确定等离子体处理系统的反应室中的实际气体流量的方法。 该方法包括将由质量流量控制器（MFC）控制的气体输送系统输送到位于反应室上游的孔口。 该方法还包括对气体进行加压以在孔口内产生阻塞流动状态。 该方法还包括经由一组压力传感器测量气体的一组上游压力值。 该方法还包括应用一组校准因子的校准因子来确定实际流量。 校准因子是一组上游压力值的平均值与一组黄金上游压力值的平均值的比值，其与MFC的指示流速相关联。
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4.发明授权公开(公告)号：US07881886B1
公开(公告)日：2011-02-01
申请号：US11938168
申请日：2007-11-09
IPC分类号： G01F25/00
CPC分类号： G01F1/36 , Y10T137/0368 , Y10T137/0379 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761
摘要： A method for determining an actual gas flow rate as gas flows through a gas flow delivery system is provided. The method includes sending the gas through the gas flow delivery system into a gas conduit, wherein a section of the gas conduit is widened to form an orifice. The method also includes pressurizing the gas to create a choked flow condition within the orifice of the gas conduit. The method further includes measuring upstream pressure of the gas via a set of pressure sensors. The method yet also includes calculating the actual flow rate based on the upstream pressure of the orifice of the gas conduit.
摘要翻译： 提供了一种用于当气体流过气体输送系统时确定实际气体流速的方法。 该方法包括将气体通过气流输送系统送入气体管道，其中气体管道的一部分被加宽以形成孔口。 该方法还包括对气体进行加压以在气体管道的孔口内产生阻塞流动状态。 该方法还包括经由一组压力传感器测量气体的上游压力。 该方法还包括基于气体管道的孔口的上游压力来计算实际流量。
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公开(公告)号：US07822570B2
公开(公告)日：2010-10-26
申请号：US11938171
申请日：2007-11-09
IPC分类号： G01F1/12
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A method for determining an actual gas flow rate in a reaction chamber of a plasma processing system is provided. The method includes delivering gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, which is located upstream from the reaction chamber. The method also includes pressurizing the gas to create a choked flow condition within the orifice. The method further includes measuring a set of upstream pressure values of the gas via a set of pressure sensors. The method yet also includes applying a calibration factor of a set of calibration factors to determine the actual flow rate. The calibration factor is a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values, which is associated with an indicated flow rate for an MFC.
摘要翻译： 提供了一种用于确定等离子体处理系统的反应室中的实际气体流量的方法。 该方法包括通过由质量流量控制器（MFC）控制的气体输送系统将气体输送到位于反应室上游的孔口。 该方法还包括对气体进行加压以在孔口内产生阻塞流动状态。 该方法还包括经由一组压力传感器测量气体的一组上游压力值。 该方法还包括应用一组校准因子的校准因子来确定实际流量。 校准因子是一组上游压力值的平均值与一组金黄上游压力值的平均值的比值，其与MFC的指示流速相关联。
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公开(公告)号：US08150646B2
公开(公告)日：2012-04-03
申请号：US12887218
申请日：2010-09-21
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one pressure sensor. The method also includes applying, using a programmed computing device, a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.
摘要翻译： 提供了一种使用具有配方流量的食谱将处理气体输送到等离子体处理系统的反应室的方法。 该方法包括通过由质量流量控制器（MFC）控制的气体输送系统将工艺气体输送到孔口。 先前通过对气体进行加压来计算预测流量。 进一步预先计算的预测流量通过至少一个压力传感器测量气体的一组上游压力值。 该方法还包括使用编程的计算设备应用一组校准因子的校准因子来确定预测流量，校准因子是该组上游压力值的平均值与一组的平均值之比 的金上游压力值。
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公开(公告)号：US20120247581A1
公开(公告)日：2012-10-04
申请号：US13436705
申请日：2012-03-30
IPC分类号： F16K21/00
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A processing system for delivering a process gas to a reaction chamber using a recipe having a recipe flow rate is provided. The processing system includes a gas flow delivery system configured for delivering the process gas, wherein said gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one sensor. The processing system also includes a programmed computing device configured for applying a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.
摘要翻译： 提供了一种使用具有配方流量的食谱将处理气体输送到反应室的处理系统。 处理系统包括配置用于输送处理气体的气体流量输送系统，其中由质量流量控制器（MFC）控制到气孔的所述气体流量输送系统。 先前通过对气体进行加压来计算预测流量。 预先计算的预测流量通过至少一个传感器测量气体的一组上游压力值。 处理系统还包括编程计算装置，其被配置为施加一组校准因子的校准因子以确定预测流量，所述校准因子是该组上游压力值的平均值与一组的平均值的比率 的金上游压力值。
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公开(公告)号：US07835874B2
公开(公告)日：2010-11-16
申请号：US12104438
申请日：2008-04-17
申请人： Vernon Wong , Richard J. Meinecke
发明人： Vernon Wong , Richard J. Meinecke
IPC分类号： G01F17/00
CPC分类号： G01F1/34 , G01F7/005 , G01F17/00 , G01F22/02 , G01F25/0038 , G01F25/0053
摘要： A gas flow rate verification apparatus is provided for shared use in a multiple tool semiconductor processing platform. The gas flow rate verification apparatus is defined to measure a pressure rate of rise and temperature within a test volume for determination of a corresponding gas flow rate. The apparatus includes first and second volumes, wherein the second volume is larger than the first volume. The apparatus also includes first and second pressure measurement devices, wherein the second pressure measurement device is capable of measuring higher pressures. Based on the target gas flow rate to be measured, either the first or second volume can be selected as the test volume, and either the first or second pressure measurement device can be selected to measure the pressure in the test volume. Configurability of the apparatus enables accurate measurement of gas flow rates over a broad range and in an time efficient manner.
摘要翻译： 气体流量验证装置被提供用于在多个工具半导体处理平台中共享使用。 气体流量验证装置被定义为测量测试体积内的升高和温度的压力，以确定相应的气体流量。 该装置包括第一和第二体积，其中第二体积大于第一体积。 该装置还包括第一和第二压力测量装置，其中第二压力测量装置能够测量更高的压力。 基于要测量的目标气体流量，可以选择第一或第二体积作为测试体积，并且可以选择第一或第二压力测量装置来测量测试体积中的压力。 该装置的可配置性使得能够在宽范围内以及以时间有效的方式精确测量气体流量。
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公开(公告)号：US20080195332A1
公开(公告)日：2008-08-14
申请号：US12104438
申请日：2008-04-17
申请人： Vernon Wong , Richard J. Meinecke
发明人： Vernon Wong , Richard J. Meinecke
CPC分类号： G01F1/34 , G01F7/005 , G01F17/00 , G01F22/02 , G01F25/0038 , G01F25/0053
摘要： A gas flow rate verification apparatus is provided for shared use in a multiple tool semiconductor processing platform. The gas flow rate verification apparatus is defined to measure a pressure rate of rise and temperature within a test volume for determination of a corresponding gas flow rate. The apparatus includes first and second volumes, wherein the second volume is larger than the first volume. The apparatus also includes first and second pressure measurement devices, wherein the second pressure measurement device is capable of measuring higher pressures. Based on the target gas flow rate to be measured, either the first or second volume can be selected as the test volume, and either the first or second pressure measurement device can be selected to measure the pressure in the test volume. Configurability of the apparatus enables accurate measurement of gas flow rates over a broad range and in an time efficient manner.
摘要翻译： 气体流量验证装置被提供用于在多个工具半导体处理平台中共享使用。 气体流量验证装置被定义为测量测试体积内的升高和温度的压力，以确定相应的气体流量。 该装置包括第一和第二体积，其中第二体积大于第一体积。 该装置还包括第一和第二压力测量装置，其中第二压力测量装置能够测量更高的压力。 基于要测量的目标气体流量，可以选择第一或第二体积作为测试体积，并且可以选择第一或第二压力测量装置来测量测试体积中的压力。 该装置的可配置性使得能够在宽范围内以及以时间有效的方式精确测量气体流量。
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