Seals for hydraulic assemblies
    4.
    发明授权

    公开(公告)号:US09816614B2

    公开(公告)日:2017-11-14

    申请号:US13546298

    申请日:2012-07-11

    摘要: A sealing device for a hydraulic assembly wherein hydraulic fluid is contained in working chamber (53) formed between body (52) and thrust member (51) of the assembly. The device comprises annular seal (63) with opposed sealing faces which are urged into sealing engagement between body (52) and thrust member (51) which have convergent sealing faces. The device may also have a pressure relief valve (100) tapped into the over-stroke end of chamber (53) to protect seal (63) from over-stroke damage comprising porous body (101) which allows fluid to bleed from chamber (53) and allows seal (63) to pass the tapping point without obstruction.

    Method of, and apparatus for, regulating the mass flow rate of a gas

    公开(公告)号:US09804010B2

    公开(公告)日:2017-10-31

    申请号:US14402468

    申请日:2013-05-23

    IPC分类号: G05D7/06 G01F1/78 G01F15/00

    摘要: There is provided a method of automatically controlling the mass flow rate of a gas through an orifice through which, in use, choked flow is arranged to occur. The method uses an electronic valve located downstream of a gas source, a piezoelectric oscillator in contact with the gas upstream of the orifice and downstream of the electronic valve and a temperature sensor. The method comprises: a) driving the piezoelectric crystal oscillator at a resonant frequency b) measuring the resonant frequency of the piezoelectric oscillator c) measuring the temperature of the gas; and d) controlling the electronic valve in response to the resonant frequency of the piezoelectric oscillator and the temperature of the gas in order to regulate the mass flow rate of gas through said orifice.

    Differential pressure type flowmeter and flow controller provided with the same
    7.
    发明授权
    Differential pressure type flowmeter and flow controller provided with the same 有权
    差压式流量计与流量控制器相同

    公开(公告)号:US09500503B2

    公开(公告)日:2016-11-22

    申请号:US14625200

    申请日:2015-02-18

    发明人: Hiroki Igarashi

    摘要: There is provided a differential pressure type flowmeter that includes an orifice provided in a main flow channel, a first pressure sensor configured to detect pressure of fluid on an upstream side of the orifice, a second pressure sensor configured to detect pressure of fluid on a downstream side of the orifice, a first pressure introduction flow channel configured to guide the fluid on the upstream side of the orifice to the first pressure sensor, and a second pressure introduction flow channel configured to guide the fluid on the downstream side of the orifice to the second pressure sensor, wherein a flow channel length and a flow channel diameter of the first pressure introduction flow channel coincide with those of the second pressure introduction flow channel, respectively, and a ratio of the flow channel length to the flow channel diameter is not less than 20 times and not more than 30 times.

    摘要翻译: 提供了一种差压式流量计,其包括设置在主流路中的孔口,构造成检测孔口上游侧的流体压力的第一压力传感器,构造成检测下游流体的压力的第二压力传感器 所述第一压力引入流动通道构造成将所述孔的上游侧的流体引导到所述第一压力传感器;以及第二压力引入流动通道,其被配置为将所述孔的下游侧上的流体引导到所述第一压力引导流动通道 第二压力传感器,其中第一压力引入流动通道的流动通道长度和流动通道直径分别与第二压力引入流动通道的流动通道长度和流动通道直径一致,并且流动通道长度与流动通道直径的比率不小于 超过20次,不超过30次。

    METHOD OF, AND APPARATUS FOR, REGULATING THE MASS FLOW RATE OF A GAS
    9.
    发明申请
    METHOD OF, AND APPARATUS FOR, REGULATING THE MASS FLOW RATE OF A GAS 有权
    用于调节气体质量流量的方法和装置

    公开(公告)号:US20150323361A1

    公开(公告)日:2015-11-12

    申请号:US14402468

    申请日:2013-05-23

    IPC分类号: G01F1/78 G05D7/06

    摘要: There is provided a method of automatically controlling the mass flow rate of a gas through an orifice through which, in use, choked flow is arranged to occur. The method uses an electronic valve located downstream of a gas source, a piezoelectric oscillator in contact with the gas upstream of the orifice and downstream of the electronic valve and a temperature sensor. The method comprises: a) driving the piezoelectric crystal oscillator at a resonant frequency b) measuring the resonant frequency of the piezoelectric oscillator c) measuring the temperature of the gas; and d) controlling the electronic valve in response to the resonant frequency of the piezoelectric oscillator and the temperature of the gas in order to regulate the mass flow rate of gas through said orifice.

    摘要翻译: 提供了一种通过孔口自动控制气体的质量流量的方法,通过该孔口在使用中排列发生阻塞流动。 该方法使用位于气源的下游的电子阀,与孔的上游和电子阀下游的气体接触的压电振子和温度传感器。 该方法包括:a)以谐振频率驱动压电晶体振荡器; b)测量压电振荡器的谐振频率; c)测量气体的温度; 以及d)响应于压电振荡器的谐振频率和气体的温度来控制电子阀,以便调节通过所述孔口的气体的质量流量。

    SYSTEMS AND METHODS FOR PROVIDING GASES TO A PROCESS CHAMBER
    10.
    发明申请
    SYSTEMS AND METHODS FOR PROVIDING GASES TO A PROCESS CHAMBER 有权
    用于向气室提供气体的系统和方法

    公开(公告)号:US20150303035A1

    公开(公告)日:2015-10-22

    申请号:US14753738

    申请日:2015-06-29

    摘要: A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.

    摘要翻译: 用于向处理室提供多个处理气体的气体供应系统包括多个质量流量控制器,每个质量流量控制器被布置成接收多个处理气体的相应子集。 各个子集中的每一个包括多于一个的处理气体,并且至少一个处理气体被提供给多个质量流量控制器中的一个以上。 各个阀布置在多个质量流量控制器中的每一个的上游,以选择性地向质量流量控制器提供相应的子集。 多个质量流量控制器的第一数量少于要供应到处理室的多个处理气体的总数。 第一数量等于在任何一个时间在处理室中使用的多种处理气体的最大数量。