公开(公告)号：US07576859B2

公开(公告)日：2009-08-18

申请号：US11854075

申请日：2007-09-12

申请人： Takuma Okamuro ,  Motonori Okumura ,  Mutsuhiko Ota ,  Kazutoshi Goto ,  Isao Yanagisawa ,  Yasuo Inaoka

发明人： Takuma Okamuro ,  Motonori Okumura ,  Mutsuhiko Ota ,  Kazutoshi Goto ,  Isao Yanagisawa ,  Yasuo Inaoka

IPC分类号： G01B11/00 ,  B41J29/393

CPC分类号： G01B11/272 ,  B41J2/161 ,  B41J2/1623 ,  B41J29/393 ,  B41J2002/14362

摘要： An alignment apparatus, which is used when positioning and joining a plurality of workpieces relative to each other, each workpiece having a plurality of alignment marks for alignment, the alignment apparatus includes: a transparent mask provided with reference marks with which the alignment marks are aligned; a mirror disposed between the mask and the workpiece; an optical unit having an optical axis pointed in a direction of the mirror via the reference mark from a side of the mask opposite to the mirror, the optical unit enabling the reference mark and a virtual image of the reference mark reflected in the mirror to be observed simultaneously; andan adjusting unit for making optical axis adjustment of the optical axis, based on the observation by the optical unit, such that a real image of the reference mark and the virtual image of the reference mark reflected in the mirror are superposed.

摘要翻译： 一种对准装置，其在多个工件相对于彼此定位和接合时使用，每个工件具有多个用于对准的对准标记，所述对准装置包括：具有对准标记对准的参考标记的透明掩模 ; 设置在掩模和工件之间的反射镜; 光学单元，其光轴经过基准标记从掩模的与反射镜相反的一侧指向反射镜的方向，光学单元使参考标记和反射镜中参考标记的虚像成为 同时观察; 以及调整单元，用于基于光学单元的观察来进行光轴的光轴调节，使得反射在反射镜中的基准标记的实际图像和参考标记的虚像被叠加。

公开(公告)号：US07602490B2

公开(公告)日：2009-10-13

申请号：US11851999

申请日：2007-09-07

申请人： Yasuo Inaoka ,  Motonori Okumura ,  Mutsuhiko Ota ,  Kazutoshi Goto ,  Isao Yanagisawa ,  Takuma Okamuro

发明人： Yasuo Inaoka ,  Motonori Okumura ,  Mutsuhiko Ota ,  Kazutoshi Goto ,  Isao Yanagisawa ,  Takuma Okamuro

IPC分类号： G01B11/00

CPC分类号： G01B11/272 ,  B41J2/161 ,  B41J2/1623 ,  B41J2002/14362

摘要： The invention provides a liquid ejecting head alignment apparatus that is used for positional determination and adhesion of nozzle plates and a fixation member, each of the nozzle plates having nozzle openings through which each of a plurality of liquid ejecting heads ejects liquid and further having alignment marks for positional alignment, the fixation member holding the nozzle-plate side of the plurality of liquid ejecting heads. The liquid ejecting head alignment apparatus according to the invention includes: a mask made of a transparent material, the mask having reference marks each of which is aligned with the corresponding alignment mark; a spacer jig that is provided between the fixation member and the mask in such a manner that the reference marks and the alignment marks are opposed to each other with a space being left therebetween, one surface of the spacer jig being in contact with the fixation member; and a bifocal microscope having an optical axis and two optical systems that shares the optical axis, the optical axis being oriented from a face of the mask that is opposite to the spacer jig side thereof toward the alignment mark via the reference mark and the space, one of the optical systems being capable of focusing on the reference mark, and the other thereof being capable of focusing on the alignment mark.

摘要翻译： 本发明提供一种液体喷射头对准装置，其用于喷嘴板和固定部件的位置确定和粘附，每个喷嘴板具有喷嘴开口，多个喷液头中的每一个喷射口喷射液体并且还具有对准标记 用于位置对准，固定构件保持多个液体喷射头的喷嘴板侧。 根据本发明的液体喷射头对准装置包括：由透明材料制成的掩模，所述掩模具有与对应的对准标记对准的参考标记; 间隔夹具，其设置在所述固定构件和所述掩模之间，使得所述基准标记和所述对准标记在其间留有空间的情况下彼此相对，所述间隔夹具的一个表面与所述固定构件接触 ; 以及具有光轴和共享光轴的两个光学系统的双焦显微镜，所述光轴通过所述基准标记和所述空间朝向所述对准标记从所述掩模的与所述间隔物夹具侧相反的面取向， 光学系统中的一个能够聚焦在参考标记上，另一个能够聚焦在对准标记上。

公开(公告)号：US08800147B2

公开(公告)日：2014-08-12

申请号：US11854800

申请日：2007-09-13

申请人： Isao Yanagisawa ,  Yasuo Inaoka ,  Takuma Okamuro ,  Kazutoshi Goto

发明人： Isao Yanagisawa ,  Yasuo Inaoka ,  Takuma Okamuro ,  Kazutoshi Goto

IPC分类号： B41J29/393

CPC分类号： B41J29/393

摘要： An alignment method includes: disposing an alignment mark provided to a positioned member and a reference mark provided to a surface of an alignment mask so that the alignment mark and the reference mark can face each other; capturing an image from the other surface side of the alignment mask, which is the opposite surface of the alignment mask from the surface where the reference mark is disposed, the image concurrently showing the alignment mark and the reference mark; performing a surface treatment on at least a region of the positioned member side of the alignment mask, which is captured as the image, rather than on the reference mark side thereof, the surface treatment providing a high contrast ratio to each alignment mark and reference mark on the captured image; and thereafter aligning the alignment mark with the reference mark, while checking the image.

摘要翻译： 对准方法包括：设置提供给定位构件的对准标记和设置到对准掩模的表面的参考标记，使得对准标记和参考标记可以彼此面对; 从对准掩模的与配置基准标记的表面相反的表面的对准掩模的另一个表面侧拍摄图像，同时示出对准标记和参考标记的图像; 在作为图像被捕获的对准掩模的定位构件侧的至少一个区域上进行表面处理，而不是在其参考标记侧，对每个对准标记和参考标记提供高对比度的表面处理 拍摄图像; 然后在校对图像的同时将对准标记与基准标记对齐。

公开(公告)号：US07643144B2

公开(公告)日：2010-01-05

申请号：US11855644

申请日：2007-09-14

申请人： Takuma Okamuro ,  Motonori Okumura ,  Mutsuhiko Ota ,  Kazutoshi Goto ,  Isao Yanagisawa ,  Yasuo Inaoka

发明人： Takuma Okamuro ,  Motonori Okumura ,  Mutsuhiko Ota ,  Kazutoshi Goto ,  Isao Yanagisawa ,  Yasuo Inaoka

IPC分类号： G01B11/00 ,  B41J29/393

CPC分类号： B41J2/161 ,  B41J2/14233 ,  B41J2/1623 ,  B41J2/1635 ,  B41J2002/14362

摘要： An adjusting unit for making positional adjustment of the optical axis adjustment mask, based on the observation by the one optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed, and for making optical axis adjustment of the other optical axis, based on the observation by the other optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed.

摘要翻译： 一种调整单元，用于基于所述一个光学单元的观察来进行所述光轴调节掩模的位置调整，使得所述一个位置或另一个位置处的参考标记以及与其对应的光轴调整对准标记相叠加， 并且基于另一光学单元的观察来进行另一光轴的光轴调整，使得在一个位置或另一位置处的参考标记和与其位置对应的光轴调整对准标记重叠。

公开(公告)号：US20080062218A1

公开(公告)日：2008-03-13

申请号：US11852744

申请日：2007-09-10

申请人： Isao Yanagisawa ,  Yasuo Inaoka ,  Takuma Okamuro

发明人： Isao Yanagisawa ,  Yasuo Inaoka ,  Takuma Okamuro

IPC分类号： B41J29/393

CPC分类号： B41J29/393 ,  B41J25/34 ,  B41J2002/14362 ,  B41J2202/19 ,  Y10T29/49401 ,  Y10T29/53261 ,  Y10T29/53265

摘要： An alignment jig for a liquid-jet head, which is used when positioning and joining a nozzle plate and a fixing member, the nozzle plate having nozzle orifices for jetting a liquid of the liquid-jet head and an alignment mark for alignment, the fixing member being adapted to hold a plurality of the liquid-jet heads, the alignment jig comprising a mask which is a transparent member provided with a reference mark for alignment with the alignment mark, the reference mark being formed within the mask.

摘要翻译： 用于喷射头的定位夹具，其在定位和接合喷嘴板和固定构件时使用，喷嘴板具有用于喷射喷液头的液体的喷嘴孔和用于对准的对准标记，固定 构件适于容纳多个液体喷射头，所述对准夹具包括掩模，所述掩模是设置有用于与所述对准标记对准的参考标记的透明构件，所述参考标记形成在所述掩模内。

公开(公告)号：US08069564B2

公开(公告)日：2011-12-06

申请号：US11852744

申请日：2007-09-10

申请人： Isao Yanagisawa ,  Yasuo Inaoka ,  Takuma Okamuro

发明人： Isao Yanagisawa ,  Yasuo Inaoka ,  Takuma Okamuro

IPC分类号： B21D53/76 ,  B23P19/00 ,  B23P17/00

CPC分类号： B41J29/393 ,  B41J25/34 ,  B41J2002/14362 ,  B41J2202/19 ,  Y10T29/49401 ,  Y10T29/53261 ,  Y10T29/53265

摘要： An alignment jig for a liquid-jet head, which is used when positioning and joining a nozzle plate and a fixing member, the nozzle plate having nozzle orifices for jetting a liquid of the liquid-jet head and an alignment mark for alignment, the fixing member being adapted to hold a plurality of the liquid-jet heads, the alignment jig comprising a mask which is a transparent member provided with a reference mark for alignment with the alignment mark, the reference mark being formed within the mask.

摘要翻译： 用于喷射头的定位夹具，其在定位和接合喷嘴板和固定构件时使用，喷嘴板具有用于喷射喷液头的液体的喷嘴孔和用于对准的对准标记，固定 构件适于容纳多个液体喷射头，所述对准夹具包括掩模，所述掩模是设置有用于与所述对准标记对准的参考标记的透明构件，所述参考标记形成在所述掩模内。

公开(公告)号：US20090185184A1

公开(公告)日：2009-07-23

申请号：US12355635

申请日：2009-01-16

申请人： Yasuo Inaoka ,  Takuma Okamuro

发明人： Yasuo Inaoka ,  Takuma Okamuro

IPC分类号： G01B11/00

CPC分类号： B41J2/145 ,  B41J2202/19

摘要： An alignment apparatus includes a mask 410 which has a reference mark 401 at which an alignment mark 22 of an ink jet recording head 220 is positioned and a bifocal microscope 500 which has a first optical system 501 having an optical axis L1 and a second optical system 502 having an optical axis L2 and in which the first optical system 501 can focus on the reference mark 401 and the second optical system 502 can focus on the alignment mark 22. The bifocal microscope 500 is provided with optical axis adjustment means 520 which adjusts a direction of a reflection face of a second mirror 509 so that the optical axes L1 and L2 coincident with each other are incident to the reference mark 401 and the alignment mark 22.

摘要翻译： 对准装置包括具有基准标记401的掩模410，喷墨记录头220的对准标记22位于该掩模410和具有光轴L1的第一光学系统501和第二光学系统的双焦显微镜500 502，其中第一光学系统501可以聚焦在参考标记401上，并且第二光学系统502可以聚焦在对准标记22上。双焦显微镜500设置有光轴调节装置520，其调节 第二反射镜509的反射面的方向使得光轴L1和L2彼此一致，入射到参考标记401和对准标记22。