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    Position measuring system and method therefor
    5.
    发明授权
    Position measuring system and method therefor 失效
    位置测量系统及其方法

    公开(公告)号：US5563608A

    公开(公告)日：1996-10-08

    申请号：US281215

    申请日：1994-07-27

    申请人： Ryobun Tachita ,  Ken Ikeda ,  Akihisa Kawasaki ,  Izumi Sato

    发明人： Ryobun Tachita ,  Ken Ikeda ,  Akihisa Kawasaki ,  Izumi Sato

    IPC分类号： G01C21/30 ,  G01S1/00 ,  G01S5/14 ,  G01S19/29 ,  H04B7/185 ,  G01S5/02

    CPC分类号： G01S19/13 ,  G01C21/30 ,  G01S19/42

    摘要： In a position measuring system, a position of a moving body is derived when data is sufficient for such derivation. On the other hand, when data is insufficient for such derivation, an area which may include the position of the moving body is derived. Accordingly, a user correctly evaluates reliability of information which is displayed. In a position measuring method, a measurement error of the derived position is evaluated. Further, a moving error evaluation is performed to evaluate an increase of the error. By changing the measurement error of the derived position, the area which includes the position of the moving body with high reliability can be displayed to the user.

    摘要翻译： 在位置测量系统中，当数据足够用于这种推导时，导出移动体的位置。 另一方面，当这种推导的数据不足时，导出可包括移动体的位置的区域。 因此，用户正确评估所显示的信息的可靠性。 在位置测量方法中，评估导出位置的测量误差。 此外，执行移动误差评估以评估误差的增加。 通过改变导出位置的测量误差，可以向使用者显示包括移动体的高可靠性位置的区域。

    VERTICAL HEAT TREATMENT APPARATUS
    7.
    发明申请
    VERTICAL HEAT TREATMENT APPARATUS 审中-公开
    垂直热处理设备

    公开(公告)号：US20120240857A1

    公开(公告)日：2012-09-27

    申请号：US13239541

    申请日：2011-09-22

    申请人： Yuichiro Morozumi ,  Izumi Sato

    发明人： Yuichiro Morozumi ,  Izumi Sato

    IPC分类号： C23C16/46

    CPC分类号： H01L21/67109 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/67303

    摘要： A vertical heat treatment apparatus includes a reaction tube surrounded by a heating part and including a substrate holder to hold substrates; and a process gas feed part having gas ejection openings to feed a process gas onto the substrates. The reaction tube has an exhaust opening at a position opposite to the gas ejection openings relative to the center of the reaction tube. The substrate holder includes circular holding plates stacked in layers and each having substrate placement regions; and support rods supporting the holding plates and provided in a circumferential direction of the holding plates to penetrate through the holding plates with the outside positions of the support rods being at the same radial position as the outer edges of the holding plates or at a radial position inside the outer edges of the holding plates relative to the center of the reaction tube.

    摘要翻译： 立式热处理设备包括由加热部分包围的反应管，并包括用于保持基板的基板保持件; 以及具有气体喷射口的工艺气体供给部，用于将工艺气体供给到基板上。 反应管在与气体喷射口相对的位置处具有相对于反应管中心的排气口。 衬底保持器包括层叠并且各自具有衬底放置区域的圆形保持板; 以及支撑杆，其支撑保持板并且在保持板的圆周方向上设置成穿过保持板，其中支撑杆的外部位置处于与保持板的外边缘相同的径向位置或径向位置 在保持板的外边缘内相对于反应管的中心。