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    VERTICAL HEAT TREATMENT APPARATUS
    1.
    发明申请
    VERTICAL HEAT TREATMENT APPARATUS 审中-公开
    垂直热处理设备

    公开(公告)号：US20120240857A1

    公开(公告)日：2012-09-27

    申请号：US13239541

    申请日：2011-09-22

    申请人： Yuichiro Morozumi ,  Izumi Sato

    发明人： Yuichiro Morozumi ,  Izumi Sato

    IPC分类号： C23C16/46

    CPC分类号： H01L21/67109 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/67303

    摘要： A vertical heat treatment apparatus includes a reaction tube surrounded by a heating part and including a substrate holder to hold substrates; and a process gas feed part having gas ejection openings to feed a process gas onto the substrates. The reaction tube has an exhaust opening at a position opposite to the gas ejection openings relative to the center of the reaction tube. The substrate holder includes circular holding plates stacked in layers and each having substrate placement regions; and support rods supporting the holding plates and provided in a circumferential direction of the holding plates to penetrate through the holding plates with the outside positions of the support rods being at the same radial position as the outer edges of the holding plates or at a radial position inside the outer edges of the holding plates relative to the center of the reaction tube.

    摘要翻译： 立式热处理设备包括由加热部分包围的反应管，并包括用于保持基板的基板保持件; 以及具有气体喷射口的工艺气体供给部，用于将工艺气体供给到基板上。 反应管在与气体喷射口相对的位置处具有相对于反应管中心的排气口。 衬底保持器包括层叠并且各自具有衬底放置区域的圆形保持板; 以及支撑杆，其支撑保持板并且在保持板的圆周方向上设置成穿过保持板，其中支撑杆的外部位置处于与保持板的外边缘相同的径向位置或径向位置 在保持板的外边缘内相对于反应管的中心。

    SUPPORT STRUCTURE, PROCESSING CONTAINER STRUCTURE AND PROCESSING APPARATUS
    2.
    发明申请
    SUPPORT STRUCTURE, PROCESSING CONTAINER STRUCTURE AND PROCESSING APPARATUS 审中-公开
    支撑结构，加工容器结构和加工设备

    公开(公告)号：US20110303152A1

    公开(公告)日：2011-12-15

    申请号：US13159954

    申请日：2011-06-14

    申请人： Shinji ASARI ,  Izumi Sato ,  Yuichiro Morozumi

    发明人： Shinji ASARI ,  Izumi Sato ,  Yuichiro Morozumi

    IPC分类号： C23C16/46 ,  C23C16/458

    CPC分类号： H01L21/67303 ,  H01L21/67109 ,  H01L21/67309

    摘要： A support structure for supporting a plurality of objects to be processed and to be disposed in a processing container structure in which a processing gas flows horizontally from one side to the opposite side, includes a top plate section; a bottom section; and a plurality of support posts connecting the top plate section and the bottom section, wherein a plurality of support portions for supporting the objects to be processed are formed in each support post at a predetermined pitch along the longitudinal direction, and the distance between the topmost support portion of the support portions of each support post and the top plate section as well as the distance between the lowermost support portion of the support portions of each support post and the bottom section are set not more than the pitch of the support portions. The support structure can prevent the occurrence of a turbulent gas flow in the top and bottom areas of the processing container structure.

    摘要翻译： 一种支撑结构，用于支撑待处理的多个物体并且被布置在处理气体从一侧向相对侧流动的处理容器结构中，包括顶板部分; 底部; 以及连接顶板部和底部的多个支撑柱，其中，用于支撑待处理物体的多个支撑部分沿着纵向方向以预定间距形成在每个支撑柱中，并且最上面的距离 每个支撑柱和顶板部分的支撑部分的支撑部分以及每个支撑柱的支撑部分的最下部支撑部分与底部之间的距离设定为不大于支撑部分的间距。 支撑结构可以防止处理容器结构的顶部和底部区域中产生紊流气流。

    Processing apparatus and film forming method
    3.
    发明授权
    Processing apparatus and film forming method 有权
    加工设备和成膜方法

    公开(公告)号：US09103029B2

    公开(公告)日：2015-08-11

    申请号：US13161874

    申请日：2011-06-16

    申请人： Yu Wamura ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

    发明人： Yu Wamura ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

    IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  H01L21/673

    CPC分类号： C23C16/4412 ,  C23C16/45546 ,  C23C16/52 ,  H01L21/67303

    摘要： A processing apparatus for processing objects, includes: a processing container structure having a bottom opening and including a processing container having a processing space for housing the objects, the container having a nozzle housing area on one side of the processing space and a slit-like exhaust port on the opposite side of the processing space from the nozzle housing area; a lid for closing the bottom opening of the processing container structure; a support structure for supporting the objects and which can be inserted into and withdrawn from the processing container structure; a gas introduction means including a gas nozzle housed in the nozzle housing area; an exhaust means including a plurality of exhaust systems for exhausting the atmosphere in the processing container structure; a heating means for heating the objects; and a control means for controlling the gas introduction means, the exhaust means and the heating means.

    摘要翻译： 一种用于处理物体的处理装置，包括：处理容器结构，其具有底部开口并且包括具有用于容纳物体的处理空间的处理容器，所述容器在处理空间的一侧具有喷嘴容纳区域和狭缝状 排气口在处理空间的与喷嘴外壳区域相反的一侧; 用于封闭处理容器结构的底部开口的盖子; 支撑结构，用于支撑物体并且可以插入处理容器结构中并从处理容器结构中取出; 气体引入装置，包括容纳在喷嘴容纳区域中的气体喷嘴; 排气装置，包括用于排出处理容器结构中的气氛的多个排气系统; 用于加热物体的加热装置; 以及用于控制气体引入装置，排气装置和加热装置的控制装置。

    PROCESSING APPARATUS AND FILM FORMING METHOD
    4.
    发明申请
    PROCESSING APPARATUS AND FILM FORMING METHOD 有权
    加工设备和薄膜成型方法

    公开(公告)号：US20110312188A1

    公开(公告)日：2011-12-22

    申请号：US13161874

    申请日：2011-06-16

    申请人： Yu WAMURA ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

    发明人： Yu WAMURA ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

    IPC分类号： C23C16/455 ,  H01L21/30 ,  H01L21/306

    CPC分类号： C23C16/4412 ,  C23C16/45546 ,  C23C16/52 ,  H01L21/67303

    摘要： A processing apparatus for processing objects, includes: a processing container structure having a bottom opening and including a processing container having a processing space for housing the objects, the container having a nozzle housing area on one side of the processing space and a slit-like exhaust port on the opposite side of the processing space from the nozzle housing area; a lid for closing the bottom opening of the processing container structure; a support structure for supporting the objects and which can be inserted into and withdrawn from the processing container structure; a gas introduction means including a gas nozzle housed in the nozzle housing area; an exhaust means including a plurality of exhaust systems for exhausting the atmosphere in the processing container structure; a heating means for heating the objects; and a control means for controlling the gas introduction means, the exhaust means and the heating means.

    摘要翻译： 一种用于处理物体的处理装置，包括：处理容器结构，其具有底部开口并且包括具有用于容纳物体的处理空间的处理容器，所述容器在处理空间的一侧具有喷嘴容纳区域和狭缝状 排气口在处理空间的与喷嘴外壳区域相反的一侧; 用于封闭处理容器结构的底部开口的盖子; 支撑结构，用于支撑物体并且可以插入处理容器结构中并从处理容器结构中取出; 气体引入装置，包括容纳在喷嘴容纳区域中的气体喷嘴; 排气装置，包括用于排出处理容器结构中的气氛的多个排气系统; 用于加热物体的加热装置; 以及用于控制气体引入装置，排气装置和加热装置的控制装置。

    Position measuring system and method therefor
    9.
    发明授权
    Position measuring system and method therefor 失效
    位置测量系统及其方法

    公开(公告)号：US5563608A

    公开(公告)日：1996-10-08

    申请号：US281215

    申请日：1994-07-27

    申请人： Ryobun Tachita ,  Ken Ikeda ,  Akihisa Kawasaki ,  Izumi Sato

    发明人： Ryobun Tachita ,  Ken Ikeda ,  Akihisa Kawasaki ,  Izumi Sato

    IPC分类号： G01C21/30 ,  G01S1/00 ,  G01S5/14 ,  G01S19/29 ,  H04B7/185 ,  G01S5/02

    CPC分类号： G01S19/13 ,  G01C21/30 ,  G01S19/42

    摘要： In a position measuring system, a position of a moving body is derived when data is sufficient for such derivation. On the other hand, when data is insufficient for such derivation, an area which may include the position of the moving body is derived. Accordingly, a user correctly evaluates reliability of information which is displayed. In a position measuring method, a measurement error of the derived position is evaluated. Further, a moving error evaluation is performed to evaluate an increase of the error. By changing the measurement error of the derived position, the area which includes the position of the moving body with high reliability can be displayed to the user.

    摘要翻译： 在位置测量系统中，当数据足够用于这种推导时，导出移动体的位置。 另一方面，当这种推导的数据不足时，导出可包括移动体的位置的区域。 因此，用户正确评估所显示的信息的可靠性。 在位置测量方法中，评估导出位置的测量误差。 此外，执行移动误差评估以评估误差的增加。 通过改变导出位置的测量误差，可以向使用者显示包括移动体的高可靠性位置的区域。