公开(公告)号：US20230230801A1

公开(公告)日：2023-07-20

申请号：US18099127

申请日：2023-01-19

Applicant: JEOL Ltd.

Inventor： Yuichiro Ohori ,  Keiji Tajima

IPC: H01J37/304 ,  H01J37/305 ,  H01J37/10 ,  H01J37/21

CPC classification number: H01J37/304 ,  H01J37/10 ,  H01J37/21 ,  H01J37/305 ,  H01J2237/0492 ,  H01J2237/2448 ,  H01J2237/30483 ,  H01J2237/31749

Abstract: An FIB system includes an ion source for producing the ion beam, a lens system which includes an objective lens and which is operative to focus the ion beam onto a sample such that secondary electrons are produced from the sample, a detector for detecting the secondary electrons, and a controller for controlling the lens system. The controller operates i) to provide control so that a focus of the ion beam is varied by directing the ion beam onto the sample, ii) to measure a signal intensity from the secondary electrons produced from the sample during the variation of the strength of the objective lens, iii) to adjust the focus of the ion beam, iv) to acquire a secondary electron image containing an image of a trace of a spot, and v) to correct the deviation of the field of view of the ion beam.