公开(公告)号：US20040227099A1

公开(公告)日：2004-11-18

申请号：US10778937

申请日：2004-02-13

Applicant: JEOL Ltd.

Inventor： Miyuki Matsuya

IPC: H01J003/14

CPC classification number: H01J37/28 ,  H01J37/153

Abstract: On a charged-particle optical system for achieving optimum aberration correction and obtaining a minimum probe diameter, the optical system focuses a beam of charged particles onto a surface of a specimen, and has four stages of multipole elements arranged along the optical axis of the beam, power supplies capable of supplying five or more independent octopole electric or magnetic potentials, and a control portion for correcting third-order aperture aberrations by adjusting the five or more independent octopole electric or magnetic potentials independently. The power supplies apply normal octopole electric or magnetic potentials to at least three of the four stages of multipole elements independently and apply skew octopole electric or magnetic potentials to at least two of the multipole elements independently.

Abstract translation: 在用于实现最佳像差校正并获得最小探针直径的带电粒子光学系统中，光学系统将带电粒子束聚焦到样品的表面上，并且具有沿着光束的光轴布置的四级多极元件 能够提供五个或更多个独立的八极杆电位或电位的电源，以及通过独立地调整五个或更多个独立的八极电势或磁电位来校正三次孔径像差的控制部分。 电源将独立的四极级元件中的至少三个的正常八极杆电或磁电势独立地应用于至少两个多极元件的偏置八极电势或磁势。

公开(公告)号：US20030098415A1

公开(公告)日：2003-05-29

申请号：US10281378

申请日：2002-10-25

Applicant: JEOL Ltd.

Inventor： Miyuki Matsuya ,  Kazuhiro Honda

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/153 ,  G01N23/225 ,  G21K1/087 ,  H01J37/265 ,  H01J37/28

Abstract: An aberration corrector comprises four stages of electrostatic quadrupole elements, two stages of electrostatic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central ones of the four stages of the electrostatic quadrupole elements on the electric potential distribution, an objective lens, a manual operation portion permitting a user to modify the accelerating voltage or the working distance, a power supply for supplying voltages to the four stages of electrostatic quadrupole elements, a power supply for exciting the two stages of magnetic quadrupole elements, a power supply for the objective lens, and a control portion for controlling the power supplies according to a manual operation or setting performed on the manual operation portion.

Abstract translation: 像差校正器包括四级静电四极元件，两级静电四极元件，用于叠加与由静电四极元件四级中的两个中心的电位分布类似的电位分布，该电位分布与电位分布相同， 物镜，允许用户修改加速电压或工作距离的手动操作部分，用于向四级静电四极元件提供电压的电源，用于激励两级磁四极元件的电源， 用于物镜的电源，以及用于根据在手动操作部分执行的手动操作或设置来控制电源的控制部分。

公开(公告)号：US20010032931A1

公开(公告)日：2001-10-25

申请号：US09798881

申请日：2001-03-02

Applicant: JEOL Ltd.

Inventor： Miyuki Matsuya

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/21 ,  G01N23/04 ,  H01J2237/216

Abstract: A charged particle beam instrument capable of reducing the spread of the probe diameter while maintaining the probe current constant. An electrical current Id is detected by a detection aperture to create a feedback signal. The feedback signal is supplied to a condenser lens control and to an objective lens control via a signal adjuster. The objective lens control portion controls the objective lens such that the charged particle probe is in focus.

Abstract translation: 一种带电粒子束仪器，能够在保持探针电流恒定的同时减小探头直径的扩展。 通过检测孔检测电流Id以产生反馈信号。 反馈信号通过信号调节器提供给聚光镜控制和物镜控制。 物镜控制部分控制物镜使得带电粒子探针被聚焦。

公开(公告)号：US20040036030A1

公开(公告)日：2004-02-26

申请号：US10603304

申请日：2003-06-25

Applicant: JEOL Ltd.

Inventor： Miyuki Matsuya ,  Fumio Hosokawa

IPC: H01J003/14

CPC classification number: H01J37/153 ,  H01J2237/12

Abstract: A charged-particle beam instrument with an aberration corrector which comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central quadrupole elements of the four stages of electrostatic quadrupole elements on this electric potential distribution, and four stages of electrostatic octopole elements for superimposing an electric octopole potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements.

Abstract translation: 具有像差校正器的带电粒子束仪器包括四级静电四极元件，两级磁四极元件，用于叠加与由静电四级中的两个中心四极元件产生的电势分布类似的磁势分布 该电位分布上的四极元件，以及四级静电八极元件，用于将电八极电位叠加在由四级静电四极元件产生的电位分布上。

公开(公告)号：US20030122076A1

公开(公告)日：2003-07-03

申请号：US10300670

申请日：2002-11-20

Applicant: JEOL Ltd.

Inventor： Miyuki Matsuya ,  Hiroyoshi Kazumori

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/153 ,  H01J2237/1516 ,  H01J2237/153 ,  H01J2237/1534

Abstract: Particle-beam apparatus is realized which is equipped with an aberration corrector capable of controlling the angular aperture of a particle beam after performing aberration correction. The corrector comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central stages of the electrostatic quadrupole elements, and four stages of electrostatic octupole elements for superimposing an octupole electric potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements. An objective lens is located downstream of the corrector. An objective aperture is located upstream of the corrector. An angular aperture control lens is located downstream of the objective aperture to control the angular aperture of the probe hitting a specimen surface.

Abstract translation: 实现了粒子束装置，其配备有能够在执行像差校正之后控制粒子束的角度孔径的像差校正器。 校正器包括四级静电四极元件，两级磁四极元件，用于叠加类似于由静电四极元件的两个中心级产生的电势分布的磁势分布，以及用于叠加静电四极元件的四级静电八极元件 由四级静电四极元件产生的电位分布上的八极电位。 物镜位于校正器的下游。 物镜孔位于校正器的上游。 角度孔径控制透镜位于物镜孔的下游，以控制探头撞击样品表面的角度孔径。