Charged-Particle Beam Lithographic System
    1.
    发明申请
    Charged-Particle Beam Lithographic System 有权
    带电粒子光刻系统

    公开(公告)号:US20150303027A1

    公开(公告)日:2015-10-22

    申请号:US14624881

    申请日:2015-02-18

    Applicant: JEOL Ltd.

    Abstract: A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.

    Abstract translation: 带电粒子束光刻系统(100)通过将带电粒子束(L)引导到衬底上来描绘衬底(2)上的图案。 系统(100)包括其上设置有基板(2)的基板台(10)和基板盖(20)。 盖(20)具有在平面内观察时覆盖基板(2)的外周部的框架部(22)。 框架部分(22)具有设置在平台(10)上的第一部分(22a)和能够通过运输部分(40)装载和卸载在台架(10)上的第二部分(22b)。 当第二部分(22b)装载在平台(10)上时,它被电接地。

    Charged-particle beam lithographic system
    2.
    发明授权
    Charged-particle beam lithographic system 有权
    带电粒子光刻系统

    公开(公告)号:US09362085B2

    公开(公告)日:2016-06-07

    申请号:US14624881

    申请日:2015-02-18

    Applicant: JEOL Ltd.

    Abstract: A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.

    Abstract translation: 带电粒子束光刻系统(100)通过将带电粒子束(L)引导到衬底上来描绘衬底(2)上的图案。 系统(100)包括其上设置有基板(2)的基板台(10)和基板盖(20)。 盖(20)具有在平面内观察时覆盖基板(2)的外周部的框架部(22)。 框架部分(22)具有设置在平台(10)上的第一部分(22a)和能够通过运输部分(40)装载和卸载在台架(10)上的第二部分(22b)。 当第二部分(22b)装载在平台(10)上时,它被电接地。

Patent Agency Ranking