公开(公告)号：US12222658B2

公开(公告)日：2025-02-11

申请号：US17849776

申请日：2022-06-27

Applicant: JEOL Ltd.

Inventor： Hirofumi Miyao ,  Noriyuki Kobayashi

IPC: G03F7/00 ,  H01J37/20 ,  H01J37/31 ,  H01J37/317

Abstract: A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section—for detecting a relative positional deviation which occurs between the guide shaft and the drive member and which affects the thickness dimensions of the fluid films; and a state decision section for making a decision on the condition of the apparatus itself based on the positional deviation detected by the detection section and outputting information responsive to the decision.

公开(公告)号：US20150303027A1

公开(公告)日：2015-10-22

申请号：US14624881

申请日：2015-02-18

Applicant: JEOL Ltd.

Inventor： Noriyuki Kobayashi ,  Yoshiaki Takizawa

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.

Abstract translation: 带电粒子束光刻系统（100）通过将带电粒子束（L）引导到衬底上来描绘衬底（2）上的图案。 系统（100）包括其上设置有基板（2）的基板台（10）和基板盖（20）。 盖（20）具有在平面内观察时覆盖基板（2）的外周部的框架部（22）。 框架部分（22）具有设置在平台（10）上的第一部分（22a）和能够通过运输部分（40）装载和卸载在台架（10）上的第二部分（22b）。 当第二部分（22b）装载在平台（10）上时，它被电接地。

公开(公告)号：US09362085B2

公开(公告)日：2016-06-07

申请号：US14624881

申请日：2015-02-18

Applicant: JEOL Ltd.

Inventor： Noriyuki Kobayashi ,  Yoshiaki Takizawa

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.

Abstract translation: 带电粒子束光刻系统（100）通过将带电粒子束（L）引导到衬底上来描绘衬底（2）上的图案。 系统（100）包括其上设置有基板（2）的基板台（10）和基板盖（20）。 盖（20）具有在平面内观察时覆盖基板（2）的外周部的框架部（22）。 框架部分（22）具有设置在平台（10）上的第一部分（22a）和能够通过运输部分（40）装载和卸载在台架（10）上的第二部分（22b）。 当第二部分（22b）装载在平台（10）上时，它被电接地。

公开(公告)号：US20220413396A1

公开(公告)日：2022-12-29

申请号：US17849776

申请日：2022-06-27

Applicant: JEOL Ltd.

Inventor： Hirofumi Miyao ,  Noriyuki Kobayashi

IPC: G03F7/20 ,  H01J37/317 ,  H01J37/20

Abstract: A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section—for detecting a relative positional deviation which occurs between the guide shaft and the drive member and which affects the thickness dimensions of the fluid films; and a state decision section for making a decision on the condition of the apparatus itself based on the positional deviation detected by the detection section and outputting information responsive to the decision.

公开(公告)号：US20220406560A1

公开(公告)日：2022-12-22

申请号：US17844120

申请日：2022-06-20

Applicant: JEOL Ltd.

Inventor： Ryuichi Kusakabe ,  Noriyuki Kobayashi

IPC: H01J37/20

Abstract: There is provided an electron beam inspection system which can enhance the safety of the whole system if servo valves are deactivated in the event of a power failure or an emergency stop. The electron beam inspection system has a beam source, a stage mechanism, and a pump. The stage mechanism has a guide shaft, a slider, a first servo valve, a second servo valve, a first exhaust pipe, a second exhaust pipe, and an exhaust valve. The slider is movably supported to the guide shaft via a hydrostatic bearing and has a first pressure subchamber and a second pressure subchamber. The exhaust valve is mounted in the first exhaust pipe. When the servo valves are in operation, the exhaust valve is opened. When supply of electric power to the servo valves is ceased, the exhaust valve is closed.