公开(公告)号：US10118194B2

公开(公告)日：2018-11-06

申请号：US15507925

申请日：2015-09-02

Applicant: JFE STEEL CORPORATION

Inventor： Hirokazu Kobayashi ,  Yushi Harada

IPC: B05C11/02 ,  B05C11/06 ,  B05D3/12 ,  B05D7/24 ,  B05D1/28 ,  B05D3/00 ,  B05C1/08 ,  B05C11/10 ,  B05B1/14 ,  B05B13/02 ,  B05C9/04

Abstract: A slurry application device includes: a slurry supply unit configured to supply slurry to a surface of a traveling base material; a slurry application unit including a first roll body disposed at the downstream side in relation to the slurry supply unit and configured to press the first roll body against the slurry to apply the slurry onto the surface and to adjust an adhesion amount of the slurry such that a film thickness of the slurry becomes one time or more and two times or less of a target film thickness; and a slurry adhesion amount adjustment unit including a second roll body disposed at the downstream side in relation to the slurry application unit and configured to press the second roll body against the slurry to adjust the slurry adhesion amount such that the film thickness of the slurry becomes the target film thickness.

公开(公告)号：US20170282206A1

公开(公告)日：2017-10-05

申请号：US15507925

申请日：2015-09-02

Applicant: JFE STEEL CORPORATION

Inventor： Hirokazu Kobayashi ,  Yushi Harada

IPC: B05C11/06 ,  B05C1/08 ,  B05D3/00 ,  B05D1/28

CPC classification number: B05D3/12 ,  B05B1/14 ,  B05B13/0221 ,  B05C1/08 ,  B05C9/04 ,  B05C11/025 ,  B05C11/06 ,  B05C11/1005 ,  B05D1/28 ,  B05D3/00 ,  B05D7/24 ,  B05D2252/02

Abstract: A slurry application device includes: a slurry supply unit configured to supply slurry to a surface of a traveling base material; a slurry application unit including a first roll body disposed at the downstream side in relation to the slurry supply unit and configured to press the first roll body against the slurry to apply the slurry onto the surface and to adjust an adhesion amount of the slurry such that a film thickness of the slurry becomes one time or more and two times or less of a target film thickness; and a slurry adhesion amount adjustment unit including a second roll body disposed at the downstream side in relation to the slurry application unit and configured to press the second roll body against the slurry to adjust the slurry adhesion amount such that the film thickness of the slurry becomes the target film thickness.