公开(公告)号：US12009188B2

公开(公告)日：2024-06-11

申请号：US17626496

申请日：2020-02-28

Applicant: JIANGSU LEUVEN INSTRUMENTS CO., LTD

Inventor： Haiyang Liu ,  Dongdong Hu ,  Xiaobo Liu ,  Na Li ,  Shiran Cheng ,  Song Guo ,  Zhihao Wu ,  Kaidong Xu

IPC: H01J37/32 ,  B08B9/00 ,  B08B13/00

CPC classification number: H01J37/32862 ,  B08B9/00 ,  B08B13/00 ,  H01J2237/334

Abstract: The present invention provides a rotatable faraday cleaning apparatus and a plasma processing system, said apparatus comprising a cavity cover, a motor, an eccentric wheel, a long-petalled assembly, a coupling window, a gas intake nozzle, a connecting rod, a short-petalled assembly, a first sector-shaped conductor, and a second sector-shaped conductor; the cavity cover is assembled on a reactor cavity main body, the coupling window is mounted on the cavity cover, the gas intake nozzle is provided on the coupling window, the first sector-shaped conductor is assembled on the gas intake nozzle, the second sector-shaped conductor is assembled on the gas intake nozzle, the long-petalled assembly is assembled on the gas intake nozzle, the short-petalled assembly is assembled on the gas intake nozzle, the connecting rod is assembled on the long-petalled assembly, the eccentric wheel is assembled on the connecting rod, and the motor is mounted on the eccentric wheel.

公开(公告)号：US11955323B2

公开(公告)日：2024-04-09

申请号：US17628224

申请日：2020-02-29

Applicant: JIANGSU LEUVEN INSTRUMENTS CO. LTD

Inventor： Na Li ,  Dongdong Hu ,  Xiaobo Liu ,  Haiyang Liu ,  Shiran Cheng ,  Song Guo ,  Zhihao Wu ,  Kaidong Xu

IPC: H01J37/32

CPC classification number: H01J37/32862 ,  H01J37/3244 ,  H01J2237/335

Abstract: The present invention provides a device for blocking plasma backflow in a process chamber to protect an air inlet structure, comprising an air inlet nozzle tightly connected to an air inlet flange. The inner cavity of the air inlet nozzle is provided with an air inlet guide body, wherein the air inlet guide body has an upper structure, a middle structure, and a lower structure, the upper, middle, and lower structures are an integrated structure, the upper, middle, and lower structures are all cylindrical, the cross-sectional diameter of the upper structure is smaller than that of the middle structure, a gas gathering area is arranged between the middle structure and the lower structure, and the middle structure and the lower structure are connected by the gas gathering area.

公开(公告)号：US11735400B2

公开(公告)日：2023-08-22

申请号：US17627129

申请日：2020-02-26

Applicant: JIANGSU LEUVEN INSTRUMENTS CO., LTD

Inventor： Haiyang Liu ,  Dongdong Hu ,  Xiaobo Liu ,  Na Li ,  Shiran Cheng ,  Song Guo ,  Zhihao Wu ,  Kaidong Xu

IPC: H01J37/32

CPC classification number: H01J37/32862 ,  H01J2237/3341

Abstract: Provided are a faraday cleaning device and a plasma processing system, the device comprising a reaction chamber, a bias electrode, a wafer, a chamber cover, a coupling window, an air inlet nozzle, a vertical coil, and a faraday layer, wherein the coupling window is installed at the upper end face of the chamber cover, the chamber cover is installed at the upper end face of the reaction chamber, the bias electrode is assembled inside the reaction chamber, the wafer is installed at the upper end face of the bias electrode, the air inlet nozzle is assembled inside the coupling window, the faraday layer is installed at the upper end face of the coupling window, and the vertical coil is assembled at the upper end face of the faraday layer.

公开(公告)号：US12112923B2

公开(公告)日：2024-10-08

申请号：US17292796

申请日：2019-09-18

Applicant: JIANGSU LEUVEN INSTRUMENTS CO. LTD

Inventor： Na Li ,  Shiran Cheng ,  Haiyang Liu ,  Zhaochao Chen ,  Yonggang Hou ,  Chengyi Wang ,  Dongdong Hu ,  Kaidong Xu

IPC: H01J37/32

CPC classification number: H01J37/32495 ,  H01J2237/334

Abstract: A reaction chamber lining including an annular side wall and a flange arranged on an upper portion of the side wall. An end face of the flange extends from the side wall in a radial direction, an outer edge of the flange extends in the radial direction to form fixing flanging parts, and a hole is in each of the fixing flanging parts. The side wall includes a rectangular slot, and a position of the rectangular slot corresponds to a position of a robotic arm access hole in a side wall of a reaction chamber. The side wall includes through holes and honeycomb-shaped apertures. A face joined to the bottom of the side wall includes a disc extending inwards in the radial direction, an extending end of the disc is fitted with an outer edge of an electrode assembly. A plurality of circles of slotted holes are in the disc.

公开(公告)号：US11837439B2

公开(公告)日：2023-12-05

申请号：US17628225

申请日：2020-02-26

Applicant: JIANGSU LEUVEN INSTRUMENTS CO. LTD

Inventor： Haiyang Liu ,  Xiaobo Liu ,  Xuedong Li ,  Na Li ,  Shiran Cheng ,  Song Guo ,  Dongdong Hu ,  Kaidong Xu

IPC: H01J37/32

CPC classification number: H01J37/321 ,  H01J37/32183 ,  H01J37/32477 ,  H01J37/32651 ,  H01J37/32862

Abstract: Disclosed in the present application is an inductively coupled plasma treatment system. Said system switches the connection between a radio frequency coil and a faraday shielding device by means of a switch switching radio frequency power. When a radio frequency power supply is connected to the radio frequency coil by means of a matched network, the radio frequency power is coupled into the radio frequency coil to perform plasma treatment process. When a radio frequency power supply is connected to a faraday shielding device by means of a matched network, the radio frequency power is coupled into the faraday shielding device to perform cleaning process on a dielectric window and an inner wall of a plasma treatment cavity.