公开(公告)号：US20240393687A1

公开(公告)日：2024-11-28

申请号：US18795534

申请日：2024-08-06

Applicant: JSR CORPORATION

Inventor： Fuyuki EGAWA ,  Taiichi FURUKAWA ,  Tsuyoshi FURUKAWA ,  Hajime INAMI ,  Ryuichi NEMOTO

IPC: G03F7/039 ,  C08F220/28 ,  C08F220/36 ,  G03F7/004 ,  G03F7/038

Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by a formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by a formula (α); and a solvent. RK1 is a hydrogen atom, a fluorine atom, or the like, L1 is an alkanediyl group, and Rf1 is a fluorinated hydrocarbon group. RW is a monovalent organic group having 3 to 40 carbon atoms that contains a cyclic structure, Rfa and Rfb are each independently a fluorine atom or the like, R11 and R12 are each independently a hydrogen atom, a fluorine atom, or the like, n1 is an integer of 1 to 4, n2 is an integer of 0 to 4, no carbonyl group is present between a sulfur atom of the sulfonic acid ion and the cyclic structure of RW, and Z+ is a monovalent onium cation.