公开(公告)号：US20250076761A1

公开(公告)日：2025-03-06

申请号：US18951794

申请日：2024-11-19

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Hajime INAMI ,  Tsuyoshi FURUKAWA ,  Noboru OTSUKA ,  Kensuke MIYAO

IPC: G03F7/029 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group; one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z1+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group including a cyclic structure; Rf21 and Rf22 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z2+ represents a monovalent radiation-sensitive onium cation.

公开(公告)号：US20250085629A1

公开(公告)日：2025-03-13

申请号：US18953228

申请日：2024-11-20

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Hajime INAMI ,  Tsuyoshi FURUKAWA ,  Noboru OTSUKA ,  Kensuke MIYAO

IPC: G03F7/029 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit having an acid-dissociable group, and an alcohol-based solvent having a boiling point of 90° C. or higher. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group, one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group, m1 is an integer of 1 to 3; m2 is an integer of 0 to 8; and Z1+ represents a monovalent radiation-sensitive onium cation.

公开(公告)号：US20140134331A1

公开(公告)日：2014-05-15

申请号：US14159444

申请日：2014-01-21

Applicant: JSR CORPORATION

Inventor： Tatsuya SAKAI ,  Hideki NISHIMURA ,  Masahiro YAMAMOTO ,  Hisashi NAKAGAWA ,  Ryuuichi SAITOU ,  Hideyuki AOKI ,  Tsuyoshi FURUKAWA

IPC: C23C16/06

CPC classification number: C23C16/06 ,  C23C16/18 ,  H01L21/28556 ,  H01L21/32051 ,  H01L21/76843 ,  H01L21/76877

Abstract: Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium.

Abstract translation: 提供一种用金属体制造衬底的方法。 该方法提供优异的成膜性（反射率和粘附性），易于在大的基板上使用，并且可以以低成本进行。 该方法包括以下步骤：（A）将络合物加热至第一温度以产生复合物的蒸气; 和（B）使蒸气与加热到不高于第一温度的第二温度的基底接触，以形成含有复合物的中心金属的金属体，或者以未组合的形式或作为其化合物（不包括 该复合物）在基材的表面的至少一部分上。 步骤（B）中的第二温度低于络合物的分解温度。 复合体的中心金属是铝或钛。

公开(公告)号：US20240393688A1

公开(公告)日：2024-11-28

申请号：US18796665

申请日：2024-08-07

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Taiichi FURUKAWA ,  Tsuyoshi FURUKAWA ,  Hajime INAMI

IPC: G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by formula (1) and a structural unit different from the structural unit (I); an onium salt represented by formula (i); and a solvent. In formula (1), RK1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, L1 is an alkanediyl group having 1 to 5 carbon atoms, and Rf1 is a fluorinated hydrocarbon group having 2 to 10 carbon atoms and 5 to 7 fluorine atoms. In formula (i), Ra1 is a substituted or unsubstituted monovalent organic group having 1 to 40 carbon atoms with no fluorine atom or fluorinated hydrocarbon group attached to an atom adjacent to the sulfur atom, and X+ is a monovalent onium cation.

公开(公告)号：US20240393687A1

公开(公告)日：2024-11-28

申请号：US18795534

申请日：2024-08-06

Applicant: JSR CORPORATION

Inventor： Fuyuki EGAWA ,  Taiichi FURUKAWA ,  Tsuyoshi FURUKAWA ,  Hajime INAMI ,  Ryuichi NEMOTO

IPC: G03F7/039 ,  C08F220/28 ,  C08F220/36 ,  G03F7/004 ,  G03F7/038

Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by a formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by a formula (α); and a solvent. RK1 is a hydrogen atom, a fluorine atom, or the like, L1 is an alkanediyl group, and Rf1 is a fluorinated hydrocarbon group. RW is a monovalent organic group having 3 to 40 carbon atoms that contains a cyclic structure, Rfa and Rfb are each independently a fluorine atom or the like, R11 and R12 are each independently a hydrogen atom, a fluorine atom, or the like, n1 is an integer of 1 to 4, n2 is an integer of 0 to 4, no carbonyl group is present between a sulfur atom of the sulfonic acid ion and the cyclic structure of RW, and Z+ is a monovalent onium cation.

公开(公告)号：US20210318613A9

公开(公告)日：2021-10-14

申请号：US16897326

申请日：2020-06-10

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Ken MARUYAMA ,  Kazuki KASAHARA ,  Tsuyoshi FURUKAWA ,  Natsuko KINOSHITA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C08F212/14 ,  C08F220/18

Abstract: A radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and a compound represented by formula (2). The polymer includes a first structural unit including a phenolic hydroxyl group, a second structural unit including a group represented by formula (1), and a third structural unit including an acid-labile group. In the formula (1), R1, R2, R3, R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms, wherein at least one of R1, R2, R3, R4, R5, and R6 represents a fluorine atom or a fluorinated hydrocarbon group; RA represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to a part other than the group represented by the formula (1).

公开(公告)号：US20250076762A1

公开(公告)日：2025-03-06

申请号：US18951861

申请日：2024-11-19

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Hajime INAMI ,  Tsuyoshi FURUKAWA ,  Noboru OTSUKA ,  Kensuke MIYAO

IPC: G03F7/029 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and Z+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group; one of Rf21 and Rf22 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; Ar is a monovalent organic group including an aromatic ring; R5, R6, R7, and R8 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or a monovalent organic group; and X is a single bond or a divalent hetero atom-containing group.

公开(公告)号：US20250076760A1

公开(公告)日：2025-03-06

申请号：US18952057

申请日：2024-11-19

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Hajime INAMI ,  Tsuyoshi FURUKAWA ,  Noboru OTSUKA ,  Kensuke MIYAO

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/28 ,  C08F220/36 ,  G03F7/00 ,  G03F7/038 ,  G03F7/039

Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and one of Rf11 and Rf12 is a fluorine atom, and the other is a hydrogen atom, a fluorine atom, or a monovalent fluorinated hydrocarbon group. R4 is a monovalent organic group in which neither a fluorine atom nor a fluorinated hydrocarbon group is bonded to an atom adjacent to the sulfur atom.

公开(公告)号：US20250013150A1

公开(公告)日：2025-01-09

申请号：US18882982

申请日：2024-09-12

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Kota FURUICHI ,  Ryosuke NAKAMURA ,  Tsuyoshi FURUKAWA

IPC: G03F7/004 ,  C07C69/75 ,  C07C309/12 ,  C07C309/17 ,  C07C309/27 ,  C07D207/416 ,  C07D307/00 ,  C07D307/94 ,  C07D311/00 ,  C07D313/06 ,  C07D321/06 ,  C07D327/04 ,  C07D327/06 ,  G03F7/039 ,  G03F7/32

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L1 represents an ester group, —CO—NR3—, a (thio)ether group, or a sulfonyl group. R4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R5s. L2 represents a single bond or a divalent linking group.