公开(公告)号：US20250085629A1

公开(公告)日：2025-03-13

申请号：US18953228

申请日：2024-11-20

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Hajime INAMI ,  Tsuyoshi FURUKAWA ,  Noboru OTSUKA ,  Kensuke MIYAO

IPC: G03F7/029 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit having an acid-dissociable group, and an alcohol-based solvent having a boiling point of 90° C. or higher. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group, one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group, m1 is an integer of 1 to 3; m2 is an integer of 0 to 8; and Z1+ represents a monovalent radiation-sensitive onium cation.

公开(公告)号：US20220177424A1

公开(公告)日：2022-06-09

申请号：US17679262

申请日：2022-02-24

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Katsuaki Nishikori ,  Ryosuke Nakamura ,  Takuhiro Taniguchi

IPC: C07C381/12 ,  G03F7/20 ,  G03F7/38 ,  G03F7/16 ,  G03F7/038 ,  G03F7/32

Abstract: A radiation-sensitive resin composition contains: an onium salt compound represented by formula (1); a resin containing a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent organic group having a cyclic structure, or a chain hydrocarbon group having 2 or more carbon atoms. X is an oxygen atom, a sulfur atom, or —NRα—. Rα is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Z+ is a monovalent onium cation.

公开(公告)号：US20230400765A1

公开(公告)日：2023-12-14

申请号：US18198971

申请日：2023-05-18

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Nozomi SAKANO

IPC: G03F7/004 ,  C08F220/28 ,  C08F220/36 ,  C08F220/38 ,  C08F220/18 ,  C07C381/12 ,  C07D211/62 ,  C07D211/60 ,  C07D207/16 ,  C07D327/06 ,  C07C309/12 ,  C07D405/12 ,  C07D493/10

CPC classification number: G03F7/0045 ,  C08F220/283 ,  C08F220/365 ,  C08F220/382 ,  C08F220/1807 ,  C07C381/12 ,  C07D493/10 ,  C07D211/60 ,  C07D207/16 ,  C07D327/06 ,  C07C309/12 ,  C07D405/12 ,  C07D211/62

Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1). R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; R2 and R3 are each independently a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R2 and R3 taken together represent a cyclic structure having 3 to 20 ring atoms; R4 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms and L1 is a divalent linking group having 1 to 40 carbon atoms, or R4 and L1 taken together represent a group including a heterocyclic structure having 3 to 20 ring atoms; Rf1 and Rf2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms.

公开(公告)号：US20220334479A1

公开(公告)日：2022-10-20

申请号：US17847253

申请日：2022-06-23

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO

IPC: G03F7/029 ,  G03F7/004 ,  G03F7/20

Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1′); a resin including a structural unit having an acid-dissociable group; and a solvent. EA is a substituted or unsubstituted (α+β)-valent organic group having 1 to 40 carbon atoms; Z+ is a monovalent radiation-sensitive onium cation; and α and β are each independently 1 or 2.

公开(公告)号：US20220299873A1

公开(公告)日：2022-09-22

申请号：US17829531

申请日：2022-06-01

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Ryotaro TANAKA ,  Taiichi FURUKAWA ,  Katsuaki NISHIKORI ,  Hiromitsu NAKASHIMA

IPC: G03F7/039 ,  G03F7/038 ,  C07C69/734 ,  C07D307/00 ,  C07C69/736 ,  C07C69/96 ,  C08F220/28 ,  C08F220/38 ,  C08F220/36 ,  C08F212/14 ,  C08F220/30

Abstract: A radiation-sensitive resin composition includes: a first polymer including a structural unit including an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), A represents an oxygen atom or a sulfur atom; a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2; X represents a single bond or a divalent organic group having 1 to 20 carbon atoms; and R1 represents a monovalent organic group including a fluorine atom.

公开(公告)号：US20250164877A1

公开(公告)日：2025-05-22

申请号：US19034826

申请日：2025-01-23

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Kensuke MIYAO ,  Satoshi OKAZAKI

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/32

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are the same or different, and a plurality of R2 are the same or different. M+ represents a monovalent cation.

公开(公告)号：US20240393688A1

公开(公告)日：2024-11-28

申请号：US18796665

申请日：2024-08-07

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Taiichi FURUKAWA ,  Tsuyoshi FURUKAWA ,  Hajime INAMI

IPC: G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by formula (1) and a structural unit different from the structural unit (I); an onium salt represented by formula (i); and a solvent. In formula (1), RK1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, L1 is an alkanediyl group having 1 to 5 carbon atoms, and Rf1 is a fluorinated hydrocarbon group having 2 to 10 carbon atoms and 5 to 7 fluorine atoms. In formula (i), Ra1 is a substituted or unsubstituted monovalent organic group having 1 to 40 carbon atoms with no fluorine atom or fluorinated hydrocarbon group attached to an atom adjacent to the sulfur atom, and X+ is a monovalent onium cation.

公开(公告)号：US20240393687A1

公开(公告)日：2024-11-28

申请号：US18795534

申请日：2024-08-06

Applicant: JSR CORPORATION

Inventor： Fuyuki EGAWA ,  Taiichi FURUKAWA ,  Tsuyoshi FURUKAWA ,  Hajime INAMI ,  Ryuichi NEMOTO

IPC: G03F7/039 ,  C08F220/28 ,  C08F220/36 ,  G03F7/004 ,  G03F7/038

Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by a formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by a formula (α); and a solvent. RK1 is a hydrogen atom, a fluorine atom, or the like, L1 is an alkanediyl group, and Rf1 is a fluorinated hydrocarbon group. RW is a monovalent organic group having 3 to 40 carbon atoms that contains a cyclic structure, Rfa and Rfb are each independently a fluorine atom or the like, R11 and R12 are each independently a hydrogen atom, a fluorine atom, or the like, n1 is an integer of 1 to 4, n2 is an integer of 0 to 4, no carbonyl group is present between a sulfur atom of the sulfonic acid ion and the cyclic structure of RW, and Z+ is a monovalent onium cation.

公开(公告)号：US20230393469A1

公开(公告)日：2023-12-07

申请号：US18235420

申请日：2023-08-18

Applicant: JSR CORPORATION

Inventor： Nozomi SAKANO ,  Ryuichi NEMOTO

IPC: G03F7/038 ,  C08F212/14 ,  C08F220/18 ,  C07D317/72 ,  C07D493/10 ,  C07D317/24 ,  C08F220/30 ,  C08F220/28 ,  G03F7/039

CPC classification number: G03F7/038 ,  C08F212/22 ,  C08F220/1807 ,  C07D317/72 ,  G03F7/039 ,  C07D317/24 ,  C08F220/303 ,  C08F220/283 ,  C07D493/10

Abstract: A radiation-sensitive resin composition includes a resin including a structural unit represented by formula (1), a radiation-sensitive acid generator, and a solvent. R1 is a hydrogen atom, a fluorine atom, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R4 is a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R5 and R6 each independently represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R7 and R8 each independently represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R9 and R10 each independently represent a monovalent organic group having 1 to 10 carbon atoms, or the like.

公开(公告)号：US20250076761A1

公开(公告)日：2025-03-06

申请号：US18951794

申请日：2024-11-19

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Hajime INAMI ,  Tsuyoshi FURUKAWA ,  Noboru OTSUKA ,  Kensuke MIYAO

IPC: G03F7/029 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group; one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z1+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group including a cyclic structure; Rf21 and Rf22 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z2+ represents a monovalent radiation-sensitive onium cation.