公开(公告)号：US11340528B2

公开(公告)日：2022-05-24

申请号：US16710277

申请日：2019-12-11

Applicant: JSR CORPORATION

Inventor： Sosuke Osawa ,  Kosuke Terayama ,  Hajime Inami ,  Kanako Ueda ,  Atsuto Nishii

IPC: G03F7/004 ,  G03F7/11 ,  G03F7/028 ,  G03F7/032 ,  C08F220/18 ,  G03F7/20 ,  G03F7/16 ,  G03F7/039

Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.

公开(公告)号：US20230416422A1

公开(公告)日：2023-12-28

申请号：US18244460

申请日：2023-09-11

Applicant: JSR CORPORATION

Inventor： Hiroki NAKATSU ,  Shuhei Yamada ,  Shinya Abe ,  Takashi Tsuji ,  Kanako Ueda ,  Hiroyuki Miyauchi

IPC: C08F28/06 ,  C08F24/00

CPC classification number: C08F28/06 ,  C08F24/00

Abstract: A composition includes: a polymer including a repeating unit represented by formula (1); and a solvent. In the formula (1), Ar1 is a divalent group including an aromatic ring having 10 to 40 ring atoms; and R0 is a monovalent group including a heteroaromatic ring which includes a sulfur atom as a ring-forming atom.