公开(公告)号：US11952448B2

公开(公告)日：2024-04-09

申请号：US17386054

申请日：2021-07-27

Applicant: Xerox Corporation

Inventor： Karen A. Moffat ,  Sepehr M. Tehrani ,  Kimberly D. Nosella ,  Raysa Rodriguez Diaz ,  Richard P. N. Veregin ,  Cuong Vong

IPC: C08F220/28 ,  B33Y70/10 ,  C08F220/18 ,  C08F224/00 ,  G03G9/097 ,  C08F20/26 ,  C08F20/28 ,  C08F24/00

CPC classification number: C08F220/282 ,  B33Y70/10 ,  C08F220/1806 ,  C08F224/00 ,  G03G9/09758 ,  C08F20/26 ,  C08F20/28 ,  C08F24/00

Abstract: Compositions are provided which may comprise a plurality of organic additive particles, the particles comprising a polymerization product of reactants comprising a dioxane/dioxolane monomer and a vinyl co-monomer, wherein the dioxane/dioxolane monomer is an ester of (meth)acrylic acid with an alcohol comprising a dioxane moiety, an ester of (meth)acrylic acid with an alcohol comprising a dioxolane moiety, or both. Toner and additive manufacturing compositions comprising the organic additive particles are also provided.

公开(公告)号：US20240059809A1

公开(公告)日：2024-02-22

申请号：US18471482

申请日：2023-09-21

Applicant: TOSOH CORPORATION

Inventor： Shohei YUMINO ,  Tomoya SHIMONO ,  Kota SAKAGUCHI ,  Tomonari NAGAI ,  Kazunari IWANAGA ,  Masao TANABIKI ,  Toru DOI

IPC: C08F24/00

CPC classification number: C08F24/00

Abstract: The present invention relates to resin particles including a residue unit represented by the following general formula (1) and having a volume average particle diameter equal to or more than 5 μm and equal to or less than 2000 μm, and a method for producing thereof. Furthermore the present invention relates to a fluororesin comprising a residue unit represented by a general formula (1) and having a weight average molecular weight Mw in a range of 5×104 to 3×105, and a yellow index of a heat-melted molded product (thickness 3 mm) after 24 h at 280° C. of equal to or less than 6, and a method for producing thereof.




In the formula (1), Rf1, Rf2, Rf3, and Rf4 are each independently one of the groups consisting of a fluorine atom, a linear perfluoroalkyl group having 1 to 7 carbon atoms, a branched perfluoroalkyl group having 3 to 7 carbon atoms, or a cyclic perfluoroalkyl group having 3 to 7 carbon atoms. The perfluoroalkyl group may have an ethereal oxygen atom. Further, Rf1, Rf2, Rf3, and Rf4 may be linked to one another to form a ring having 4 or more and 8 or less carbon atoms, and the ring may include an ethereal oxygen atom.

公开(公告)号：US10007184B2

公开(公告)日：2018-06-26

申请号：US15254929

申请日：2016-09-01

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Li Cui ,  Charlotte A. Cutler ,  Suzanne M. Coley ,  Owendi Ongayi ,  Christopher P. Sullivan ,  Paul J. LaBeaume ,  Shintaro Yamada ,  Mingqi Li ,  James F. Cameron

IPC: G03F7/42 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  C08F16/10 ,  C08F24/00 ,  C08G77/04 ,  C09D5/20 ,  C09D183/04 ,  C08G63/08 ,  C08F20/14 ,  C08F20/30 ,  C08F20/06

CPC classification number: G03F7/11 ,  C08F16/10 ,  C08F20/06 ,  C08F20/10 ,  C08F20/14 ,  C08F20/30 ,  C08F24/00 ,  C08F220/14 ,  C08F220/20 ,  C08F220/34 ,  C08F222/06 ,  C08F222/40 ,  C08F230/08 ,  C08F2220/1825 ,  C08F2220/1858 ,  C08F2220/1891 ,  C08F2220/282 ,  C08F2220/283 ,  C08F2220/325 ,  C08F2800/10 ,  C08G63/08 ,  C08G77/04 ,  C08G77/20 ,  C08G77/80 ,  C09D5/20 ,  C09D183/04 ,  G03F7/0752 ,  G03F7/161 ,  G03F7/20 ,  G03F7/30 ,  G03F7/422 ,  G03F7/423 ,  C08K5/19 ,  C08L33/14

Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

公开(公告)号：US09873787B2

公开(公告)日：2018-01-23

申请号：US15216265

申请日：2016-07-21

Applicant: DENKA COMPANY LIMITED

Inventor： Tetsuo Noguchi ,  Takeshi Ohtsuka ,  Masanori Matsumoto ,  Yuichi Shindo

IPC: C08L35/02 ,  C08J5/18 ,  C08F212/08 ,  C08F220/10 ,  C08F222/02 ,  C09J133/06 ,  C08F24/00 ,  C08L33/08 ,  C08L33/12 ,  G02B1/04 ,  C08L25/14

CPC classification number: C08L35/02 ,  C08F24/00 ,  C08F212/08 ,  C08F220/10 ,  C08F222/02 ,  C08J5/18 ,  C08J2333/00 ,  C08J2333/12 ,  C08J2335/02 ,  C08J2433/12 ,  C08J2435/02 ,  C08L25/14 ,  C08L33/06 ,  C08L33/08 ,  C08L33/12 ,  C09J133/06 ,  G02B1/04 ,  C08F220/14 ,  C08F222/08

Abstract: A copolymer for improving heat resistance of a methacrylic resin which can achieve preservation of excellent transparency of the methacrylic resin and improvement in heat resistance, and can provide a molded product having excellent appearance, by adding the copolymer to the methacrylic resin, is provided. According to the present invention, a copolymer for improving heat resistance of a methacrylic resin, including: 45 to 85 mass % of an aromatic vinyl monomer unit; 5 to 45 mass % of a (meth)acrylic acid ester monomer unit; and 10 to 20 mass % of an unsaturated dicarboxylic acid anhydride monomer unit; wherein the copolymer has a total light transmittance of 88% or more, the total light transmittance being measured in accordance with ASTM D1003 for a sample with 2 mm-thickness, is provided.

公开(公告)号：US09796812B2

公开(公告)日：2017-10-24

申请号：US14939160

申请日：2015-11-12

Applicant: THE UNIVERSITY OF TOKYO ,  FUJIFILM Corporation

Inventor： Takafumi Hosokawa ,  Toshihide Yoshitani ,  Shingo Ito ,  Kyoko Nozaki ,  Ryo Nakano

IPC: C08G63/08 ,  C08F24/00 ,  C09D133/06 ,  C09D167/04

CPC classification number: C08G63/08 ,  C08F24/00 ,  C09D133/06 ,  C09D167/04

Abstract: Provided is a polymer obtained by homopolymerizing a lactone monomer. The polymer contains a structural unit having a lactone ring containing three or more carbon atoms, wherein at least one of the carbon atoms, except for C of —C(═O)O—, of the lactone ring forms a part of a main chain; and wherein at least one of the carbon atoms, except for C of —C(═O)O—, which forms the lactone ring and is other than the carbon atom(s) forming a part of the main chain is bridged with an atom of the main chain.

公开(公告)号：US20170073438A1

公开(公告)日：2017-03-16

申请号：US15363169

申请日：2016-11-29

Applicant: SIRRUS, INC.

Inventor： Bernard M. Malofsky ,  Adam G. Malofsky ,  Tanmoy Dey ,  Jeffrey M. Sullivan

IPC: C08F20/28 ,  C09J133/16 ,  C08L33/16 ,  C08L21/00 ,  C09D133/14 ,  C09J133/14 ,  C08L33/14 ,  C08F20/30 ,  C08F20/38 ,  C09D135/02 ,  C09J135/02 ,  C08L35/02 ,  C08F22/20 ,  C08K3/00 ,  C08K5/00 ,  C09D133/16

CPC classification number: C08F20/28 ,  C07C45/75 ,  C07C49/794 ,  C07C49/796 ,  C07C49/798 ,  C07C49/80 ,  C07C67/03 ,  C07C67/30 ,  C07C69/604 ,  C07C69/738 ,  C07C2601/14 ,  C07D307/46 ,  C07D307/54 ,  C07D333/22 ,  C07D333/24 ,  C08F20/14 ,  C08F20/30 ,  C08F20/38 ,  C08F20/68 ,  C08F22/20 ,  C08F24/00 ,  C08F28/06 ,  C08F116/36 ,  C08F128/06 ,  C08F222/1006 ,  C08F222/14 ,  C08K3/013 ,  C08K5/0008 ,  C08L21/00 ,  C08L33/14 ,  C08L33/16 ,  C08L35/02 ,  C09D4/00 ,  C09D129/12 ,  C09D133/14 ,  C09D133/16 ,  C09D135/02 ,  C09D141/00 ,  C09J133/06 ,  C09J133/14 ,  C09J133/16 ,  C09J135/02 ,  Y02P20/127 ,  C07C69/593

Abstract: The present invention provides methylene beta-ketoester monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-ketoester monomer. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

Abstract translation: 本发明提供亚甲基β-酮酯单体，其制备方法，以及由其形成的组合物和产品。 在制备本发明的亚甲基β-酮酯的方法中，β-酮酯与改性的Knoevenagel反应中的甲醛源反应，任选地在酸性或碱性催化剂存在下，任选地在酸性或碱性 非酸性溶剂，形成反应络合物。 反应络合物可以是低聚物。 将反应复合物进行进一步处理，其可以通过与能量转移装置接触而蒸发，以分离β-酮酯单体。 本发明还包括由本发明的亚甲基β-酮酯单体形成的组合物和产品，包括基于单体的产品（例如油墨，粘合剂，涂料，密封剂或反应性模塑）和基于聚合物的产品（例如纤维，薄膜，片材 ，医用聚合物，复合聚合物和表面活性剂）。

公开(公告)号：US09527795B2

公开(公告)日：2016-12-27

申请号：US14352406

申请日：2012-10-18

Applicant: Sirrus, Inc.

Inventor： Bernard M. Malofsky ,  Adam G. Malofsky ,  Tanmoy Dey ,  Jeffrey M. Sullivan

IPC: C07C69/604 ,  C07D333/24 ,  C07C69/738 ,  C07D307/54 ,  C07C49/794 ,  C07C49/80 ,  C07C49/798 ,  C07C67/03 ,  C09J133/06 ,  C07C45/75 ,  C07C49/796 ,  C07D307/46 ,  C07D333/22 ,  C08F116/36 ,  C08F128/06 ,  C09D129/12 ,  C09D141/00 ,  C07C67/30 ,  C08F20/28 ,  C08F20/68 ,  C08F24/00 ,  C08F28/06 ,  C08F222/14 ,  C08F222/10

CPC classification number: C08F20/28 ,  C07C45/75 ,  C07C49/794 ,  C07C49/796 ,  C07C49/798 ,  C07C49/80 ,  C07C67/03 ,  C07C67/30 ,  C07C69/604 ,  C07C69/738 ,  C07D307/46 ,  C07D307/54 ,  C07D333/22 ,  C07D333/24 ,  C08F20/14 ,  C08F20/30 ,  C08F20/38 ,  C08F20/68 ,  C08F22/20 ,  C08F24/00 ,  C08F28/06 ,  C08F116/36 ,  C08F128/06 ,  C08F222/1006 ,  C08F222/14 ,  C08K3/013 ,  C08K5/0008 ,  C08L21/00 ,  C08L33/14 ,  C08L33/16 ,  C08L35/02 ,  C09D4/00 ,  C09D129/12 ,  C09D133/14 ,  C09D133/16 ,  C09D135/02 ,  C09D141/00 ,  C09J133/06 ,  C09J133/14 ,  C09J133/16 ,  C09J135/02 ,  Y02P20/127

Abstract: The present invention provides methylene beta-ketoester monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-ketoester monomer. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

Abstract translation: 本发明提供亚甲基β-酮酯单体，其制备方法，以及由其形成的组合物和产品。 在制备本发明的亚甲基β-酮酯的方法中，β-酮酯与改性的Knoevenagel反应中的甲醛源反应，任选地在酸性或碱性催化剂存在下，任选地在酸性或碱性 非酸性溶剂，形成反应络合物。 反应络合物可以是低聚物。 将反应复合物进行进一步处理，其可以通过与能量转移装置接触而蒸发，以分离β-酮酯单体。 本发明还包括由本发明的亚甲基β-酮酯单体形成的组合物和产品，包括基于单体的产品（例如油墨，粘合剂，涂料，密封剂或反应性模塑）和基于聚合物的产品（例如纤维，薄膜，片材 ，医用聚合物，复合聚合物和表面活性剂）。

公开(公告)号：US09429843B2

公开(公告)日：2016-08-30

申请号：US14598549

申请日：2015-01-16

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Hatakeyama ,  Koji Hasegawa

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C08F24/00 ,  C08F28/02 ,  C08F28/06

CPC classification number: G03F7/0397 ,  C08F24/00 ,  C08F28/02 ,  C08F28/06 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/085 ,  G03F7/20 ,  G03F7/30

Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of caramel furanone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

Abstract translation: 提供了一种正性抗蚀剂组合物，其包含聚合物，其包含具有被酸不稳定基团取代的羧基或酚羟基的重复单元和焦糖呋喃酮酯的重复单元，并且具有1,000-500,000的Mw。 抗蚀剂组合物具有抑制酸扩散和高分辨率的令人满意的效果，并且在曝光后形成良好轮廓和最小边缘粗糙度的图案。

公开(公告)号：US09296842B2

公开(公告)日：2016-03-29

申请号：US13967961

申请日：2013-08-15

Applicant: MITSUBISHI RAYON CO., LTD.

Inventor： Atsushi Yasuda ,  Tomoya Oshikiri ,  Daisuke Matsumoto ,  Keisuke Katou ,  Shinichi Maeda

IPC: C08F24/00 ,  C08F297/02 ,  C08F2/00 ,  G03F7/039 ,  G03F7/004 ,  G03F7/085

CPC classification number: C08F24/00 ,  C08F2/00 ,  C08F297/026 ,  C08F2500/06 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/085

Abstract: A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is −3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers.

Abstract translation: 通过聚合两种或更多种类型的单体获得的共聚物，其中在通过将通过凝胶渗透色谱法（GPC）获得的洗脱曲线中除以相对于共聚物的峰的洗脱液分离得到的分数，按分级顺序分成8个馏分，使得 每个级分具有相同的体积，所有共聚物中包含的共聚物的单体组成比与所有共聚物的单体组成比之间的差异在任何衍生自所述共聚物的任何结构单元中为-3摩尔％至+3摩尔％ 各自的单体。

公开(公告)号：US20150323865A1

公开(公告)日：2015-11-12

申请号：US14697901

申请日：2015-04-28

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Masayoshi Sagehashi ,  Takayuki Fujiwara ,  Koji Hasegawa ,  Ryosuke Taniguchi

IPC: G03F7/038 ,  C07D307/935 ,  G03F7/32 ,  C07D495/04 ,  C08F224/00 ,  C08F228/06 ,  C07D307/83 ,  C07D493/04

CPC classification number: G03F7/0397 ,  C07D307/83 ,  C07D307/935 ,  C07D491/048 ,  C07D493/04 ,  C07D493/08 ,  C07D493/18 ,  C07D493/22 ,  C07D495/04 ,  C07D495/14 ,  C07D495/18 ,  C07D495/22 ,  C07D519/00 ,  C08F2/44 ,  C08F24/00 ,  C08F28/06 ,  C08F220/28 ,  C08F220/30 ,  C08F220/36 ,  C08F224/00 ,  C08F228/02 ,  C08F228/06 ,  C08F2220/283 ,  C08F2220/303 ,  C08F2220/365 ,  C08L33/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/325

Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, k1=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.

Abstract translation: 用于抗蚀剂的聚合物可从具有式（1）的单体获得，其中R 1为H，CH 3或CF 3，R 2和R 3各自为H或一价烃基，X 1为二价烃基，k 1 = 0或1， Z形成5或6元脂环。 包含该聚合物的抗蚀剂组合物是稳定的，并且在碱性显影和有机溶剂显影期间显示高溶解度对比度，受控的酸扩散和低粗糙度。