公开(公告)号：US20250013150A1

公开(公告)日：2025-01-09

申请号：US18882982

申请日：2024-09-12

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Kota FURUICHI ,  Ryosuke NAKAMURA ,  Tsuyoshi FURUKAWA

IPC: G03F7/004 ,  C07C69/75 ,  C07C309/12 ,  C07C309/17 ,  C07C309/27 ,  C07D207/416 ,  C07D307/00 ,  C07D307/94 ,  C07D311/00 ,  C07D313/06 ,  C07D321/06 ,  C07D327/04 ,  C07D327/06 ,  G03F7/039 ,  G03F7/32

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L1 represents an ester group, —CO—NR3—, a (thio)ether group, or a sulfonyl group. R4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R5s. L2 represents a single bond or a divalent linking group.