公开(公告)号：US20160187777A1

公开(公告)日：2016-06-30

申请号：US15064920

申请日：2016-03-09

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Ryuichi SAITO ,  Kenji FUJITA ,  Shunsuke KURITA ,  Tatsuya SAKAI

IPC: G03F7/11 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/308 ,  C09D1/00 ,  H01L21/311

Abstract: A composition includes a metal compound and a solvent. The metal compound includes: a plurality of metal atoms of titanium, tantalum, zirconium, tungsten or a combination thereof; oxygen atoms each crosslinking the metal atoms; and polydentate ligands each coordinating to the metal atom. An absolute molecular weight of the metal compound as determined by static light scattering is no less than 8,000 and no greater than 50,000. A pattern-forming method includes applying the composition on an upper face side of a substrate to form an inorganic film. A resist pattern is formed on an upper face side of the inorganic film. The inorganic film and the substrate are dry-etched, by each separate etching operation, using the resist pattern as a mask such that the substrate has a pattern.

Abstract translation: 组合物包括金属化合物和溶剂。 金属化合物包括：钛，钽，锆，钨的多个金属原子或其组合; 氧原子各自交联金属原子; 和多齿配体，各配位于金属原子上。 通过静态光散射确定的金属化合物的绝对分子量不小于8000，不大于50,000。 图案形成方法包括在基材的上表面侧涂布组合物以形成无机膜。 在无机膜的上表面侧形成抗蚀剂图案。 通过每次单独的蚀刻操作，使用抗蚀剂图案作为掩模来使无机膜和衬底被干蚀刻，使得衬底具有图案。