公开(公告)号：US20220229367A1

公开(公告)日：2022-07-21

申请号：US17713278

申请日：2022-04-05

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Satoshi OKAZAKI ,  Taiichi FURUKAWA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: A radiation-sensitive resin composition includes: a first polymer including a structural unit which includes an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. R1 represents a monovalent organic group having 1 to 20 carbon atoms; R2 represents a monovalent organic group having 1 to 20 carbon atoms; X represents a divalent organic group having 1 to 20 carbon atoms; and Y represents a divalent hydrocarbon group having 1 to 20 carbon atoms. The divalent organic group represented by X, the monovalent organic group represented by R2, or both has a fluorine atom.

公开(公告)号：US20190391488A1

公开(公告)日：2019-12-26

申请号：US16552339

申请日：2019-08-27

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Satoshi OKAZAKI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C59/11 ,  C07C381/12 ,  C07D307/33 ,  C07D307/00 ,  C07C59/115 ,  C07C59/105 ,  C07C59/13 ,  C07C69/14

Abstract: A radiation-sensitive resin composition contains: a polymer having an acid-labile group, a radiation-sensitive acid generator, a compound represented by the following formula (1), and a solvent. In the formula (1), X represents an oxygen atom or a sulfur atom; R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R2 to R5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and optionally two or more of R2 to R5 taken together represent an alicyclic structure having 3 to 20 ring atoms or an aliphatic heterocyclic structure having 3 to 20 ring atoms together with the carbon atom to which the two or more of R2 to R5 bond; Zn+ represents a cation having a valency of n; and n is an integer of 1 to 3.

公开(公告)号：US20250164877A1

公开(公告)日：2025-05-22

申请号：US19034826

申请日：2025-01-23

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Kensuke MIYAO ,  Satoshi OKAZAKI

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/32

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are the same or different, and a plurality of R2 are the same or different. M+ represents a monovalent cation.