公开(公告)号：US20250164877A1

公开(公告)日：2025-05-22

申请号：US19034826

申请日：2025-01-23

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Kensuke MIYAO ,  Satoshi OKAZAKI

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/32

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are the same or different, and a plurality of R2 are the same or different. M+ represents a monovalent cation.

公开(公告)号：US20250004375A1

公开(公告)日：2025-01-02

申请号：US18829747

申请日：2024-09-10

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Yudai ABE ,  Kazuya KIRIYAMA

IPC: G03F7/039 ,  G03F7/22

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), A1 represents a (m+n+2)-valent aromatic ring group. Both —OH and —COO− are bound to a common benzene ring in A1. Atom to which —OH is bound is located next to an atom to which —COO31 is bound. R1 represents a monovalent group comprising a cyclic (thio)acetal structure. m is an integer of ≥0. n is an integer of ≥0. M+ represents a monovalent organic cation.

公开(公告)号：US20240319597A1

公开(公告)日：2024-09-26

申请号：US18678331

申请日：2024-05-30

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Michihiro MITA ,  Masayuki MIYAKE

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/322 ,  G03F7/325

Abstract: A radiation-sensitive resin composition includes: a compound A represented by formula (I); a resin B including a structural unit having an acid-dissociable group; a radiation-sensitive acid generator other than the compound A; and a solvent. R1 is an (m+m′)-valent organic group and comprises a cyclopropane ring skeleton, a cyclobutane ring skeleton, or both; X1 is a group represented by formula (1-1) or a group represented by formula (1-2); X2 is a group represented by formula (2-1) or a group represented by formula (2-2); Y+ is a monovalent onium cation; m is an integer of 1 to 2, and m′ is an integer of 0 to 1. * represents a bond to another group.