公开(公告)号：US20140011360A1

公开(公告)日：2014-01-09

申请号：US14027500

申请日：2013-09-16

Applicant: JSR CORPORATION

Inventor： Yuuji NAMIE ,  Tomohisa Konno ,  Masayuki Motonari ,  Hirotaka Shida ,  Akihiro Takemura

IPC: H01L21/306 ,  C09G1/02

CPC classification number: H01L21/30625 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/3212

Abstract: A chemical mechanical polishing aqueous dispersion of the invention includes (A) a first water-soluble polymer having a weight average molecular weight of 500,000 to 2,000,000 and including a heterocyclic ring in its molecule, (B) a second water-soluble polymer or its salt having a weight average molecular weight of 1000 to 10,000 and including one group selected from a carboxyl group and a sulfonic group, (C) an oxidizing agent, and (D) abrasive grains, and has a pH of 7 to 12.

Abstract translation: 本发明的化学机械研磨用水系分散体包含（A）重均分子量为500,000〜2000000的第一水溶性聚合物，其分子中含有杂环，（B）第二水溶性聚合物或其盐 重均分子量为1000〜10000，包括选自羧基和磺酸基的一个基团，（C）氧化剂和（D）磨粒，pH为7〜12。