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公开(公告)号:US20240026693A1
公开(公告)日:2024-01-25
申请号:US18028697
申请日:2022-04-11
Applicant: Jae Ok LEE
Inventor: Jae Ok LEE
Abstract: The invention relates to a scaffold support (10) comprising: a bracket (20) fixed to the wall surface (3); a screw axis member (30) having one end coupled to the bracket (20) and a male screw portion (31); an outer pipe (40) in which the other end portion of the screw axis member (30) is inserted and has a female screw portion (42) being screw-coupled to the male screw portion (31) of the screw axis member (30); a pipe rotary shaft (50) on the center of the end surface (43) of the outer pipe (40) having a polygonal head (51).
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公开(公告)号:US20130087287A1
公开(公告)日:2013-04-11
申请号:US13534446
申请日:2012-06-27
Applicant: Min HUR , Jae Ok LEE , Woo Seok KANG , Dae-Hoon LEE , Kwan-Tae KIM , Young-Hoon SONG
Inventor: Min HUR , Jae Ok LEE , Woo Seok KANG , Dae-Hoon LEE , Kwan-Tae KIM , Young-Hoon SONG
IPC: B05C9/00
CPC classification number: H01J37/32844 , B01D53/32 , B01D53/70 , B01D2257/2047 , B01D2257/2066 , B01D2258/0216 , B01D2259/818 , C23C16/4412 , H01J37/32348 , H01J37/32541 , H01J37/32568 , H01J37/32834 , H05H1/2406 , H05H2001/2462 , H05H2245/1215 , Y02C20/30 , Y02P70/605
Abstract: Provided is a plasma reactor for removal of contaminants, which is installed between a process chamber and a vacuum pump and removes contaminants emitted from a process chamber. The plasma reactor includes: at least one dielectric body that forms a plasma generation space therein; a ground electrode connected to at least one end of the dielectric body; and at least one driving electrode fixed to an outer peripheral surface of the dielectric body, and connected to an AC power supply unit to receive an AC driving voltage. The ground electrode has a non-uniform diameter along the lengthwise direction of the plasma reactor.
Abstract translation: 提供了一种用于去除污染物的等离子体反应器,其被安装在处理室和真空泵之间并且去除从处理室排出的污染物。 等离子体反应器包括:在其中形成等离子体产生空间的至少一个绝缘体; 连接到电介质体的至少一端的接地电极; 以及至少一个驱动电极,其固定到所述电介质体的外周表面,并且连接到AC电源单元以接收AC驱动电压。 接地电极沿着等离子体反应器的长度方向具有不均匀的直径。
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