公开(公告)号：US20130087287A1

公开(公告)日：2013-04-11

申请号：US13534446

申请日：2012-06-27

申请人： Min HUR ,  Jae Ok LEE ,  Woo Seok KANG ,  Dae-Hoon LEE ,  Kwan-Tae KIM ,  Young-Hoon SONG

发明人： Min HUR ,  Jae Ok LEE ,  Woo Seok KANG ,  Dae-Hoon LEE ,  Kwan-Tae KIM ,  Young-Hoon SONG

IPC分类号： B05C9/00

CPC分类号： H01J37/32844 ,  B01D53/32 ,  B01D53/70 ,  B01D2257/2047 ,  B01D2257/2066 ,  B01D2258/0216 ,  B01D2259/818 ,  C23C16/4412 ,  H01J37/32348 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32834 ,  H05H1/2406 ,  H05H2001/2462 ,  H05H2245/1215 ,  Y02C20/30 ,  Y02P70/605

摘要： Provided is a plasma reactor for removal of contaminants, which is installed between a process chamber and a vacuum pump and removes contaminants emitted from a process chamber. The plasma reactor includes: at least one dielectric body that forms a plasma generation space therein; a ground electrode connected to at least one end of the dielectric body; and at least one driving electrode fixed to an outer peripheral surface of the dielectric body, and connected to an AC power supply unit to receive an AC driving voltage. The ground electrode has a non-uniform diameter along the lengthwise direction of the plasma reactor.

摘要翻译： 提供了一种用于去除污染物的等离子体反应器，其被安装在处理室和真空泵之间并且去除从处理室排出的污染物。 等离子体反应器包括：在其中形成等离子体产生空间的至少一个绝缘体; 连接到电介质体的至少一端的接地电极; 以及至少一个驱动电极，其固定到所述电介质体的外周表面，并且连接到AC电源单元以接收AC驱动电压。 接地电极沿着等离子体反应器的长度方向具有不均匀的直径。

公开(公告)号：US20110089017A1

公开(公告)日：2011-04-21

申请号：US12905227

申请日：2010-10-15

申请人： Min HUR ,  Min-Suk Cha ,  Young-Hoon Song ,  Jae-Ok Lee ,  Dae-Hoon Lee ,  Kwan-Tae Kim

发明人： Min HUR ,  Min-Suk Cha ,  Young-Hoon Song ,  Jae-Ok Lee ,  Dae-Hoon Lee ,  Kwan-Tae Kim

IPC分类号： B01J19/12 ,  B01J19/08

CPC分类号： H01J37/3255 ,  B01D53/32 ,  B01D53/323 ,  B01D2257/20 ,  B01D2257/2066 ,  B01D2257/40 ,  B01D2257/708 ,  B01D2258/0216 ,  B01D2259/818 ,  H01J37/32091 ,  H01J37/32348 ,  H01J37/32541 ,  H01J37/32834 ,  H01J37/32844 ,  H05H1/2406 ,  H05H2001/2456 ,  H05H2001/2462 ,  H05H2245/121 ,  H05H2245/1215 ,  Y02C20/30 ,  Y02P70/605

摘要： The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode and a second ground electrode disposed at a distance from each other; a dielectric fixed between the first ground electrode and the second ground electrode; and at least one driving electrode disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit to receive a driving voltage therefrom.

摘要翻译： 本发明提供了一种用于在制造显示器或半导体的过程中减轻在低压工艺中产生的有害材料的等离子体反应器。 根据本发明的示例性实施例的用于减轻有害材料的等离子体反应器包括：第一接地电极和彼此间隔设置的第二接地电极; 固定在第一接地电极和第二接地电极之间的电介质; 以及设置在电介质的外表面上的至少一个驱动电极，与第一接地电极和第二接地电极间隔开并连接到AC电源单元以从其接收驱动电压。