System and apparatus of separating remaining powder of hull
    1.
    发明授权
    System and apparatus of separating remaining powder of hull 有权
    分离船体残留粉末的系统和装置

    公开(公告)号:US08211372B2

    公开(公告)日:2012-07-03

    申请号:US12708239

    申请日:2010-02-18

    IPC分类号: G21C1/00 G21F9/00

    摘要: An apparatus and system for separating remaining powder of hulls includes a first remaining powder separating unit to be supplied with hulls of a spent nuclear fuel subjected to a high-temperature oxidation, and to include a first brush for separating remaining powder of the hulls; a hull alignment unit to be supplied with the hulls from the first remaining powder separating unit, and to align the hulls; a second remaining powder separating unit to be supplied with the aligned hulls from the hull alignment unit, and to include a second brush for separating remaining powder adhered on an inner peripheral surface of the hulls; and a third remaining powder separating unit to be supplied with the hulls from the second remaining powder separating unit, and to separate the remaining powder remaining on the inner/outer peripheral surface of the hulls by using air.

    摘要翻译: 用于分离船体的剩余粉末的装置和系统包括供给经受高温氧化的废核燃料的船体的第一剩余粉末分离单元,并且包括用于分离船体的剩余粉末的第一刷; 船体对准单元,其从第一剩余粉末分离单元提供船体,并对准船体; 第二剩余粉末分离单元,其从船体对准单元提供对准的船体,并且包括用于分离附着在船体的内周表面上的残留粉末的第二刷; 以及第三剩余粉末分离单元,从第二剩余粉末分离单元供给船体,并通过使用空气分离残留在船体的内外表面上的剩余粉末。

    SYSTEM AND APPARATUS OF SEPARATING REMAINING POWER OF HULL
    2.
    发明申请
    SYSTEM AND APPARATUS OF SEPARATING REMAINING POWER OF HULL 有权
    分离船体剩余能力的系统和装置

    公开(公告)号:US20100272616A1

    公开(公告)日:2010-10-28

    申请号:US12708239

    申请日:2010-02-18

    IPC分类号: B01J19/00

    摘要: An apparatus and system for separating remaining powder of hulls includes a first remaining powder separating unit to be supplied with hulls of a spent nuclear fuel subjected to a high-temperature oxidation, and to include a first brush for separating remaining powder of the hulls; a hull alignment unit to be supplied with the hulls from the first remaining powder separating unit, and to align the hulls; a second remaining powder separating unit to be supplied with the aligned hulls from the hull alignment unit, and to include a second brush for separating remaining powder adhered on an inner peripheral surface of the hulls; and a third remaining powder separating unit to be supplied with the hulls from the second remaining powder separating unit, and to separate the remaining powder remaining on the inner/outer peripheral surface of the hulls by using air.

    摘要翻译: 用于分离船体的剩余粉末的装置和系统包括供给经受高温氧化的废核燃料的船体的第一剩余粉末分离单元,并且包括用于分离船体的剩余粉末的第一刷; 船体对准单元,其从第一剩余粉末分离单元提供船体,并对准船体; 第二剩余粉末分离单元,其从船体对准单元提供对准的船体,并且包括用于分离附着在船体的内周表面上的残留粉末的第二刷; 以及第三剩余粉末分离单元,从第二剩余粉末分离单元供给船体,并通过使用空气分离残留在船体的内外表面上的剩余粉末。

    Apparatus for cable management synchronized with telescopic motion
    3.
    发明授权
    Apparatus for cable management synchronized with telescopic motion 有权
    电缆管理装置与伸缩运动同步

    公开(公告)号:US08550267B2

    公开(公告)日:2013-10-08

    申请号:US13326440

    申请日:2011-12-15

    IPC分类号: B66C17/00

    CPC分类号: B66C17/06 B66C13/14

    摘要: Disclosed herein is an apparatus for cable management synchronized with telescopic motion. The apparatus is configured such that cables for transmitting power or signals to a manipulator provided on a lower end of a telescopic tube and for receiving signals therefrom are wound or unwound in response to expansion or contraction of the telescopic tube. Moreover, the apparatus is configured such that the cables are prevented from being displaced from the correct positions, a noise is prevented from being generated, and the tension of each cable is adjusted even when it is in the clamped state.

    摘要翻译: 本文公开了一种与伸缩运动同步的电缆管理装置。 该装置被配置为使得响应于伸缩管的膨胀或收缩而将功率或信号传输到设置在伸缩管的下端上并用于接收信号的机械手的电缆被卷绕或退绕。 此外,该装置被配置为使得防止电缆从正确的位置移位,防止产生噪声,并且即使当它处于夹紧状态时也调节每根电缆的张力。

    APPARATUS FOR CABLE MANAGEMENT SYNCHRONIZED WITH TELESCOPIC MOTION
    4.
    发明申请
    APPARATUS FOR CABLE MANAGEMENT SYNCHRONIZED WITH TELESCOPIC MOTION 有权
    电缆管理装置与电缆运动同步

    公开(公告)号:US20120153091A1

    公开(公告)日:2012-06-21

    申请号:US13326440

    申请日:2011-12-15

    CPC分类号: B66C17/06 B66C13/14

    摘要: Disclosed herein is an apparatus for cable management synchronized with telescopic motion. The apparatus is configured such that cables for transmitting power or signals to a manipulator provided on a lower end of a telescopic tube and for receiving signals therefrom are wound or unwound in response to expansion or contraction of the telescopic tube. Moreover, the apparatus is configured such that the cables are prevented from being displaced from the correct positions, a noise is prevented from being generated, and the tension of each cable is adjusted even when it is in the clamped state.

    摘要翻译: 本文公开了一种与伸缩运动同步的电缆管理装置。 该装置被配置为使得响应于伸缩管的膨胀或收缩而将功率或信号传输到设置在伸缩管的下端上并用于接收信号的机械手的电缆被卷绕或退绕。 此外,该装置被配置为使得防止电缆从正确的位置移位,防止产生噪声,并且即使当它处于夹紧状态时也调节每根电缆的张力。

    Swing angle measuring apparatus for swing free operation of crane
    5.
    发明授权
    Swing angle measuring apparatus for swing free operation of crane 失效
    起重机摆动角度测量装置

    公开(公告)号:US5729339A

    公开(公告)日:1998-03-17

    申请号:US633340

    申请日:1996-04-17

    CPC分类号: G01D5/30 B66C13/063

    摘要: A swing angle measuring apparatus generates feedback signals for closed loop regulation of a load swinging motion in operation of a crane. The swing angle measuring apparatus measures two-dimensional swing angles, and includes a rope fixed to a hoisting device, two laser displacement sensors, laser reflecting plates, and a rectangular box attached to a hoisting device. Two steel reflecting plates are installed on the periphery of the fixed rope. Two laser displacement sensors are installed in a rectangular box such that the heading of the sensors are configured to perpendicularly intersect the faces of the laser reflecting plates. The configuration of the displacement sensors and the reflecting plates can be reversed. The rectangular box is attached to the hoisting device, and the laser reflecting plates are placed at an offset distance away from the face of the laser displacement sensors, at which a sensor signal of 0 volts is obtained. The swing angle of the rope or cable is determined from the distance between the laser displacement sensors and the laser reflecting plates.

    摘要翻译: 摆动角度测量装置在起重机的操作中产生用于闭环调节负载摆动运动的反馈信号。 摆动角度测量装置测量二维摆动角度,包括固定在提升装置上的绳索,两个激光位移传感器,激光反射板和连接在提升装置上的矩形盒。 两根钢制反射板安装在固定绳索的周围。 两个激光位移传感器安装在矩形盒中,使得传感器的标题被配置为垂直于激光反射板的表面相交。 位移传感器和反射板的结构可以相反。 矩形盒连接到提升装置,并且激光反射板被放置在偏离激光位移传感器的表面的偏移距离处,在那里获得0伏的传感器信号。 绳索或缆索的摆动角度由激光位移传感器和激光反射板之间的距离决定。

    Apparatus for gringing a semiconductor wafer while removing dust
therefrom
    6.
    发明授权
    Apparatus for gringing a semiconductor wafer while removing dust therefrom 失效
    用于在从其中除去灰尘的同时磨碎半导体晶片的装置

    公开(公告)号:US5545076A

    公开(公告)日:1996-08-13

    申请号:US440920

    申请日:1995-05-15

    摘要: An apparatus for polish-grinding a semiconductor wafer which assuredly removes contaminant dusts from the polished wafer includes a grinding device for polishing a surface of the wafer. The grinding device has a chuck table on which the wafer is laid, a grinding wheel for grindingly polishing the wafer, and means for supplying water to the wafer. The means for supplying water provides water to region of contact between the grinding wheel and the wafer. The apparatus also includes a cleaning device for cleaning any remaining dust on the wafer, having a spin chuck table for rotating the polished wafer, means for supplying a detergent to the polished wafer. The means for supplying the detergent injects the detergent on the surfaces of the polished wafer. The apparatus also includes a controller for controlling the grinding device and the cleaning device. Accordingly, the apparatus according to the present invention can prevent dust from being suctioned to the front side of a wafer, and can remove dust during and after a wafer-grinding process.

    摘要翻译: 一种用于抛光研磨半导体晶片的设备,其可靠地从抛光晶片中去除污染物粉尘包括用于抛光晶片表面的研磨装置。 研磨装置具有夹在其上放置晶片的卡盘台,用于研磨晶片的砂轮,以及向晶片供水的装置。 用于供水的装置为砂轮和晶片之间的接触区域提供水。 该设备还包括清洁装置,用于清洁晶片上剩余的灰尘,具有用于旋转抛光晶片的旋转夹盘,用于向抛光晶片供应洗涤剂的装置。 用于供应洗涤剂的装置将洗涤剂注入抛光晶片的表面上。 该设备还包括用于控制研磨装置和清洁装置的控制器。 因此,根据本发明的装置可以防止灰尘被吸引到晶片的前侧,并且可以在晶片研磨过程中和之后去除灰尘。

    Method for manufacturing a semiconductor device
    7.
    发明授权
    Method for manufacturing a semiconductor device 失效
    半导体器件的制造方法

    公开(公告)号:US06596633B2

    公开(公告)日:2003-07-22

    申请号:US09955500

    申请日:2001-09-17

    IPC分类号: H01L2144

    摘要: The semiconductor device comprises a silicon substrate, a first metal pattern layer which is deposited on the silicon substrate, an inter metal dielectric which is deposited on the silicon substrate including the first metal pattern layer and on which a connection hole is formed to partially expose the upper surface of the first metal pattern layer, a second metal pattern layer which is deposited on the inter metal dielectric and electrically interconnected to the first metal pattern layer by the connection hole, and a passivation layer which coats the silicon substrate including the second metal pattern layer and has an opening to partially expose the second metal pattern layer for electrically connecting the semiconductor device to external circuitry. The first metal pattern layer comprises a Ti/TiN layer, an Al layer, and a TiN layer, and the second metal pattern layer comprises a Ti layer and an Al layer. The passivation layer coats a portion of the second metal pattern layer, the portion being disposed on an inner portion of the connection hole. The present invention has some advantages in that it prevents the cutting of the Al layer on the concave corner of the second metal pattern layer and the exfoliating of the second metal pattern layer from the first metal pattern layer.

    摘要翻译: 半导体器件包括硅衬底,沉积在硅衬底上的第一金属图案层,沉积在包括第一金属图案层的硅衬底上的金属间电介质,并且其上形成有连接孔以部分地暴露 第一金属图案层的上表面,沉积在金属间电介质上并通过连接孔电连接到第一金属图案层的第二金属图案层,以及涂覆包括第二金属图案的硅基板的钝化层 并且具有用于部分地暴露第二金属图案层的开口,用于将半导体器件电连接到外部电路。 第一金属图案层包括Ti / TiN层,Al层和TiN层,第二金属图案层包括Ti层和Al层。 钝化层涂覆第二金属图案层的一部分,该部分设置在连接孔的内部。 本发明具有防止第二金属图案层的凹角上的Al层的切割和第二金属图案层从第一金属图案层剥离的一些优点。

    Interconnect structure with a passivation layer and chip pad
    8.
    发明授权
    Interconnect structure with a passivation layer and chip pad 有权
    半导体装置及其制造方法

    公开(公告)号:US06303999B1

    公开(公告)日:2001-10-16

    申请号:US09209644

    申请日:1998-12-10

    IPC分类号: H01L2348

    摘要: The semiconductor device includes a silicon substrate, a first metal pattern layer which is deposited on the silicon substrate, and an inter metal dielectric which is deposited on the silicon substrate including the first metal pattern layer and on which a connection hole is formed to partially expose the upper surface of the first metal pattern layer, the connection hole having concave corner portion formed on a side thereof. A second metal pattern layer is deposited on the inter metal dielectric and electriacally interconnects to the first metal pattern layer by the connection hole. A passivation layer coats the silicon substrate including the second metal pattern layer and the concave corner portion and has an opening to partially expose the second metal pattern layer for electrically connecting the semiconductor device to external circuitry. The passivation layer extends beyond the concave corner portion such that when the passivation layer is etched, the concave corner portion remains coated with the passivation layer to thereby protect the concave corner portion from damage due to subsequent processes. The first metal pattern layer comprises a Ti/TiN layer, an Al layer, and a TiN layer, and the second metal pattern layer comprises a Ti layer and an Al layer.

    摘要翻译: 半导体器件包括硅衬底,沉积在硅衬底上的第一金属图案层和沉积在包括第一金属图案层的硅衬底上的金属间电介质,并且其上形成有连接孔以部分地暴露 第一金属图案层的上表面,连接孔具有形成在其一侧的凹角部。 第二金属图案层沉积在金属间介电层上,并通过连接孔电连接到第一金属图案层。 钝化层涂覆包括第二金属图案层和凹角部分的硅衬底,并且具有用于部分地暴露第二金属图案层的开口,用于将半导体器件电连接到外部电路。 钝化层延伸超过凹角部分,使得当钝化层被蚀刻时,凹角部分保持涂覆有钝化层,从而保护凹角部分免受后续处理的损害。 第一金属图案层包括Ti / TiN层,Al层和TiN层,第二金属图案层包括Ti层和Al层。