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公开(公告)号：US08879045B2
公开(公告)日：2014-11-04
申请号：US12963980
申请日：2010-12-09
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70191 , G03F7/70308
摘要： A method utilizes a dynamically controllable optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. The electric field is controlled by a feedback/control signal from a feedback system that includes a detector positioned proximate an image plane in the system. The optical element can be positioned in various places within the system depending on what light characteristics need to be adjusted, for example after an illumination system or after a light patterning system. In this manner, the optical element, under control of the dynamic electric field, can dynamically change its propagation characteristics to dynamically change either a beam of illumination from the illumination system or a patterned beam of radiation from the patterning system, such that they exhibit desired light characteristics.
摘要翻译： 一种方法利用一种动态可控的光学元件，其接收电场，该电场在光学元件内的至少一个方向上改变折射率。 折射率的变化赋予通过光学元件的辐射束的变化。 电场由来自反馈系统的反馈/控制信号控制，该反馈系统包括位于系统内的图像平面附近的检测器。 根据需要调整的光特性，例如在照明系统之后或在光图案化系统之后，光学元件可以位于系统内的各种位置。 以这种方式，光学元件在动态电场的控制下可以动态地改变其传播特性，以动态地改变来自照明系统的照明光束或来自图案化系统的图案化的辐射束，使得它们表现出期望的 光特性。
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2.发明申请Spatial Light Modulator Using an Integrated Circuit Actuator and Method of Making and Using Same 有权使用集成电路执行器的空间光调制器及其制作和使用方法公开(公告)号：US20080231937A1
公开(公告)日：2008-09-25
申请号：US12132341
申请日：2008-06-03
IPC分类号： G02B26/08
CPC分类号： G02B26/0858 , Y10S359/90
摘要： A spatial light modulator (SLM) includes an integrated circuit actuator that can be fabricated using photolithography or other similar techniques. The actuator includes actuator elements, which can be made from piezoelectric materials. An electrode array is coupled to opposite walls of each of the actuator elements is an electrode array. Each array of electrodes can have one or more electrode sections. The array of reflective devices forms the SLM.
摘要翻译： 空间光调制器（SLM）包括可以使用光刻或其它类似技术制造的集成电路致动器。 致动器包括可由压电材料制成的致动器元件。 电极阵列连接到电极阵列中每个致动器元件的相对壁。 每个电极阵列可以具有一个或多个电极部分。 反射装置的阵列形成SLM。
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公开(公告)号：US20110075236A1
公开(公告)日：2011-03-31
申请号：US12963980
申请日：2010-12-09
IPC分类号： G02B26/02
CPC分类号： G03F7/70291 , G03F7/70191 , G03F7/70308
摘要： A method utilizes a dynamically controllable optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. The electric field is controlled by a feedback/control signal from a feedback system that includes a detector positioned proximate an image plane in the system. The optical element can be positioned in various places within the system depending on what light characteristics need to be adjusted, for example after an illumination system or after a light patterning system. In this manner, the optical element, under control of the dynamic electric field, can dynamically change its propagation characteristics to dynamically change either a beam of illumination from the illumination system or a patterned beam of radiation from the patterning system, such that they exhibit desired light characteristics.
摘要翻译： 一种方法利用一种动态可控的光学元件，其接收电场，该电场在光学元件内的至少一个方向上改变折射率。 折射率的变化赋予通过光学元件的辐射束的变化。 电场由来自反馈系统的反馈/控制信号控制，该反馈系统包括位于系统内的图像平面附近的检测器。 根据需要调整的光特性，例如在照明系统之后或在光图案化系统之后，光学元件可以位于系统内的各种位置。 以这种方式，光学元件在动态电场的控制下可以动态地改变其传播特性，以动态地改变来自照明系统的照明光束或来自图案化系统的图案化的辐射束，使得它们表现出期望的 光特性。
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公开(公告)号：US07876420B2
公开(公告)日：2011-01-25
申请号：US11005222
申请日：2004-12-07
CPC分类号： G03F7/70291 , G03F7/70191 , G03F7/70308
摘要： A system and method utilize a dynamically controllable optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. The electric field is controlled by a feedback/control signal from a feedback system that includes a detector positioned proximate an image plane in the system. The optical element can be positioned in various places within the system depending on what light characteristics need to be adjusted, for example after an illumination system or after a light patterning system. In this manner, the optical element, under control of the dynamic electric field, can dynamically change its propagation characteristics to dynamically change either a beam of illumination from the illumination system or a patterned beam of radiation from the patterning system, such that they exhibit desired light characteristics.
摘要翻译： 一种系统和方法利用一种动态可控的光学元件，其接收电场，该电场在光学元件内的至少一个方向上改变折射率。 折射率的变化赋予通过光学元件的辐射束的变化。 电场由来自反馈系统的反馈/控制信号控制，该反馈系统包括位于系统内的图像平面附近的检测器。 根据需要调整的光特性，例如在照明系统之后或在光图案化系统之后，光学元件可以位于系统内的各种位置。 以这种方式，光学元件在动态电场的控制下可以动态地改变其传播特性，以动态地改变来自照明系统的照明光束或来自图案化系统的图案化的辐射束，使得它们表现出期望的 光特性。
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5.发明授权Spatial light modulator using an integrated circuit actuator and method of making and using same 有权使用集成电路致动器的空间光调制器及其制造和使用方法公开(公告)号：US07525718B2
公开(公告)日：2009-04-28
申请号：US12132341
申请日：2008-06-03
CPC分类号： G02B26/0858 , Y10S359/90
摘要： A spatial light modulator (SLM) includes an integrated circuit actuator that can be fabricated using photolithography or other similar techniques. The actuator includes actuator elements, which can be made from piezoelectric materials. An electrode array is coupled to opposite walls of each of the actuator elements is an electrode array. Each array of electrodes can have one or more electrode sections. The array of reflective devices forms the SLM.
摘要翻译： 空间光调制器（SLM）包括可以使用光刻或其它类似技术制造的集成电路致动器。 致动器包括可由压电材料制成的致动器元件。 电极阵列连接到电极阵列中每个致动器元件的相对壁。 每个电极阵列可以具有一个或多个电极部分。 反射装置的阵列形成SLM。
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公开(公告)号：US07142353B2
公开(公告)日：2006-11-28
申请号：US10972582
申请日：2004-10-26
IPC分类号： G02F1/00
CPC分类号： G02F1/3551 , G02F1/0018 , G03F7/70141 , G03F7/70258
摘要： A system and method utilize an optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. A material used to form the optical element exhibits characteristics, such that wavelengths of the beam of radiation above about 155 nanometers are transmitted through the optical element with little or not absorption or attenuation.
摘要翻译： 系统和方法利用接收电场的光学元件，该电场在光学元件内的至少一个方向上改变折射率。 折射率的变化赋予通过光学元件的辐射束的变化。 用于形成光学元件的材料表现出特性，使得在大约155纳米之上的辐射束的波长几乎没有吸收或衰减地透过光学元件。
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7.发明授权System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position 有权通过改变照明器中的光的角分布来改善光刻装置中的线宽控制的系统和方法作为场位置的函数公开(公告)号：US06888615B2
公开(公告)日：2005-05-03
申请号：US10127505
申请日：2002-04-23
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70091
摘要： Electromagnetic energy is emitted from an illumination source of a lithography device. A portion of the emitted electromagnetic energy passes through an illumination optics module. The illumination optics module includes a one-dimensional optical transform element having a pupil plane. An aperture device having an adjustable aperture is located proximate to the pupil plane so that a portion of the electromagnetic energy received by the one-dimensional optical transform element passes through the aperture of the aperture device. The angular distribution of the electromagnetic energy passing through the illumination optics module is adjusted as a function of illumination field position using the aperture device, thereby improving line width control in the lithography device.
摘要翻译： 从光刻设备的照明源发射电磁能。 发射的电磁能的一部分通过照明光学模块。 照明光学模块包括具有光瞳平面的一维光学变换元件。 具有可调节孔径的孔径装置位于瞳孔平面附近，使得由一维光学变换元件接收的电磁能量的一部分通过孔径装置的孔。 通过照明光学模块的电磁能的角度分布作为使用孔径装置的照明场位置的函数进行调整，从而改善光刻装置中的线宽度控制。
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8.发明授权System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control 有权使用具有预数值孔径控制的照明系统在光刻设备中改善线宽度控制的系统和方法公开(公告)号：US06784976B2
公开(公告)日：2004-08-31
申请号：US10127506
申请日：2002-04-23
IPC分类号： G03B2754
CPC分类号： G03F7/70091 , G03F7/70141 , G03F7/70625
摘要： A system and method for improving line width control in a lithography device are presented. Electromagnetic energy is emitted from an illumination source and passed through illumination optics. The illumination optics include a partial coherence adjuster having a first and second optical element. The first optical element is used for changing the partial coherence of incident electromagnetic energy in a predetermined manner to compensate for horizontal and vertical line biases of the lithography device. The second optical element is used for changing the angular distribution of electromagnetic energy incident upon the first optical element. Together, the two optical elements are used to vary the partial coherence of the electromagnetic energy emitted by the illumination source, as a function of illumination field position, and improve line width control. Adjustment of the second optical element allows for correction of time-dependant line width variances.
摘要翻译： 提出了一种用于改善光刻设备中的线宽度控制的系统和方法。 电磁能从照明源发射并通过照明光学器件。 照明光学器件包括具有第一和第二光学元件的部分相干调节器。 第一光学元件用于以预定方式改变入射电磁能的部分相干性，以补偿光刻设备的水平和垂直线偏移。 第二光学元件用于改变入射在第一光学元件上的电磁能的角分布。 两个光学元件一起用于改变由照射源发射的电磁能量的部分相干性，作为照明场位置的函数，并且改善线宽度控制。 第二光学元件的调整允许校正时间相关的线宽方差。
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