摘要:
Novel molds and methods for Bulk Metallic Glass (BMG) molding using carbon templates obtained from pyrolyzed materials are provided. The method employs the Carbon MEMS (C-MEMS) technique to derive molds of different geometries and dimensions. The resultant carbon structures are stable at very high temperatures and have sufficient mechanical strength to be used as master molds for the thermoplastic forming of BMGs.
摘要:
A method of processing BMGs in a non-ideal environment (such as air) to create a uniform and smooth surface is provided. By utilizing the contact-line movement and an engineered flow pattern during TPF the method is able to create complex BMG parts that exhibit uniform smooth appearance or even can be atomically smooth. In addition, to mending surface imperfections, this method also eliminates void formation inside the material, allows for the creation of precise patterns of homogeneous appearance, and forms improved mechanical locks between different materials and a BMG.
摘要:
The present invention relates to materials, methods and apparatuses for performing imprint lithography using amorphous metallic materials. The amorphous metallic materials can be employed as imprint media and thermoplastic forming processes are applied during the pattern transfer procedure to produce micron scale and nanoscale patterns in the amorphous metallic layer. The pattern transfer is in the form of direct mask embossing or through a serial nano-indentation process. A rewriting process is also disclosed, which involves an erasing mechanism that is accomplished by means of a second thermoplastic forming process. The amorphous metallic materials may also be used directly as an embossing mold in imprint lithography to allow high volume imprint nano-manufacturing. This invention also comprises of a method of smoothening surfaces under the action of the surface tension alone.
摘要:
A method of processing BMGs in a non-ideal environment (such as air) to create a uniform and smooth surface is provided. By utilizing the contact-line movement and an engineered flow pattern during TPF the method is able to create complex BMG parts that exhibit uniform smooth appearance or even can be atomically smooth. In addition, to mending surface imperfections, this method also eliminates void formation inside the material, allows for the creation of precise patterns of homogeneous appearance, and forms improved mechanical locks between different materials and a BMG.
摘要:
The present invention relates to materials, methods and apparatuses for performing imprint lithography using amorphous metallic materials. The amorphous metallic materials can be employed as imprint media and thermoplastic forming processes are applied during the pattern transfer procedure to produce micron scale and nanoscale patterns in the amorphous metallic layer. The pattern transfer is in the form of direct mask embossing or through a serial nano-indentation process. A rewriting process is also disclosed, which involves an erasing mechanism that is accomplished by means of a second thermoplastic forming process. The amorphous metallic materials may also be used directly as an embossing mold in imprint lithography to allow high volume imprint nano-manufacturing. This invention also comprises of a method of smoothening surfaces under the action of the surface tension alone.