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公开(公告)号：US11840751B2
公开(公告)日：2023-12-12
申请号：US17053293
申请日：2020-05-19
Applicant: DALIAN UNIVERSITY OF TECHNOLOGY
Inventor： Wei Zhang , Yanhui Li , Leiqiang Lai
CPC classification number: C22C29/14 , C01B35/04 , C21D1/42 , C21D1/74 , C22C1/11 , C22C30/00 , C22C45/00
Abstract: Boron-based amorphous alloys and a preparation method thereof is provided. The composition formula of the alloys is BaCobREcX1dX2eX3f, wherein RE is any one or more of La, Ce, Pr, Nd, Sm, Gd, Dy, Er and Y; X1 is any one or more of C, Si and Al; X2 is any one or two of Fe and Ni; X3 is any one or more of Zr, Nb, Mo, Hf, Ta and W; and a, b, c, d, e and f respectively represent atomic percent of each corresponding element in the formula, where: 45≤a≤55, 25≤b≤40, 10≤c≤20, 0≤d≤10, 45≤a+d≤55, 0≤e≤20, 25≤b+e≤40, 0≤f≤3, 10≤c+f≤20 and a+b+c+d+e+f=100. The preparation method of the boron-based amorphous alloy comprises: preparing master alloy ingots using an arc furnace or an induction melting furnace; and then obtaining amorphous ribbons with different thicknesses by a single copper roller melt-spinning equipment.
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公开(公告)号：US11832519B2
公开(公告)日：2023-11-28
申请号：US17637805
申请日：2020-09-16
Inventor： Kotaro Hirose , Masahiro Adachi , Tsunehiro Takeuchi
IPC: H10N10/851 , C22C28/00 , C22C45/00 , H10N10/857
CPC classification number: H10N10/851 , C22C28/00 , C22C45/00 , H10N10/857 , C22C2200/02
Abstract: A thermoelectric conversion material is constituted of a semiconductor that contains a constituent element and an additive element having a difference of 1 in the number of electrons in an outermost shell from the constituent element, the additive element having a concentration of not less than 0.01 at % and not more than 30 at %. The semiconductor has a microstructure including an amorphous phase and a granular crystal phase dispersed in the amorphous phase. The amorphous phase includes a first region in which the concentration of the additive element is a first concentration, and a second region in which the concentration of the additive element is a second concentration lower than the first concentration. The first concentration and the second concentration have a difference of not less than 15 at % and not more than 25 at % therebetween.
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公开(公告)号：US20230329242A1
公开(公告)日：2023-10-19
申请号：US18245649
申请日：2021-10-08
Applicant: KOLON INDUSTRIES, INC.
Inventor： Choongnyun Paul KIM
IPC: A01N59/26 , A01N59/20 , A01N59/16 , A01N59/14 , A01N59/00 , A01N25/12 , A01P1/00 , B22F9/08 , B22F1/08 , C22C30/02 , C22C45/00
CPC classification number: A01N59/26 , A01N59/20 , A01N59/16 , A01N59/14 , A01N59/00 , A01N25/12 , A01P1/00 , B22F9/082 , B22F1/08 , C22C30/02 , C22C45/00 , B22F2999/00 , B22F2998/10 , B22F2304/10 , C22C2200/02
Abstract: A composition for an alloy according to an aspect of the present disclosure is a composition for an alloy having antimicrobial activity, and may contain a first component composed of Fe and Ni, a second component composed of one or more selected from the group consisting of Cr, Co, Mo, and Cu, and a third component composed of one or more selected from the group consisting of Si, B, and P.
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公开(公告)号：US20190100007A1
公开(公告)日：2019-04-04
申请号：US16067788
申请日：2016-06-24
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , The State of Oregon State Board of Higher Education on behalf of Oregon State University
Inventor： James Elmer Abbott, Jr. , John M McGlone , Kristopher Olsen , Roberto A Pugliese , Greg Scott Long , Douglas A Keszler , John Wager
CPC classification number: B41J2/14129 , B41J2/1606 , B41J2/1646 , B41J2202/03 , C22C1/002 , C22C45/00 , C22C45/10 , C23C14/0036 , C23C14/08 , C23C14/185 , C23C28/04 , H01B1/02
Abstract: An amorphous thin metal film can include a combination of metals or metalloids including: 5 at % to 74 at % of a metalloid selected from the group of carbon, silicon, and boron; 5 at % to 74 at % of a first metal; 5 at % to 74 at % of a second metal; and 5 at % to 70 at % of a dopant. The first and second metals can be independently selected from the group of titanium, vanadium, chromium, iron, cobalt, nickel, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, hafnium, tantalum, tungsten, osmium, iridium, or platinum, wherein the first metal and the second metal can be different metals. The dopant can be selected from the group of oxygen, nitrogen, or combinations thereof. The metalloid, first metal, second metal, and dopant can account for at least 70 at % of the amorphous thin metal film.
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公开(公告)号：US20180265390A1
公开(公告)日：2018-09-20
申请号：US15985550
申请日：2018-05-21
Applicant: CANON KABUSHIKI KAISHA
Inventor： Sei-ichi Hata , Satoko Midorikawa , Hirotaka Fukushima
CPC classification number: C03B11/086 , C03B40/00 , C03B2215/03 , C03B2215/12 , C03B2215/16 , C03B2215/31 , C03B2215/32 , C03B2215/34 , C22C5/04 , C22C27/02 , C22C30/00 , C22C45/00 , C22C45/10 , Y02P40/57
Abstract: An amorphous alloy contains Ni and Nb and has a composition including at least one of: a composition containing Nb with a content in the range of 35.6 atomic % to 75.1 atomic %, Ir with a content in the range of 7.2 atomic % to 52.3 atomic %, and Ni with a content in the range of 4.0 atomic % to 48.5 atomic %; a composition containing Nb with a content in the range of 19.6 atomic % to 80.9 atomic %, Re with a content in the range of 7.4 atomic % to 59.2 atomic %, and Ni with a content in the range of 4.1 atomic % to 56.9 atomic %; and a composition containing Nb with a content in the range of 7.5 atomic % to 52.9 atomic %, W with a content in the range of 16.4 atomic % to 47.0 atomic %, and Ni with a content in the range of 22.0 atomic % to 53.3 atomic %.
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Patent Agency Ranking
公开(公告)号：US20180065173A1
公开(公告)日：2018-03-08
申请号：US15694298
申请日：2017-09-01
Applicant: Glassimetal Technology, Inc.
Inventor： Chase Crewdson , Joseph P. Schramm , Marios D. Demetriou , William L. Johnson
CPC classification number: B22D17/2038 , B22D25/06 , C22C45/00
Abstract: A rapid discharge heating and forming apparatus is provided. The apparatus includes a source of electrical energy and at least two electrodes configured to interconnect the source of electrical energy to a metallic glass sample. The apparatus also includes a shaping tool disposed in forming relation to the metallic glass sample. The source of electrical energy and the at least two electrodes are configured to deliver a quantum of electrical energy to the metallic glass sample to heat the metallic glass sample. The shaping tool is configured to apply a deformational force to shape the heated sample to an article. The at least two electrodes have a yield strength of at least 200 MPa, a Young's modulus that is at least 25% higher than the metallic glass sample, and an electrical resistivity that is lower than the metallic glass sample by a factor of at least 3.
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公开(公告)号：US09849504B2
公开(公告)日：2017-12-26
申请号：US14690269
申请日：2015-04-17
Applicant: Apple Inc.
Inventor： Joseph C. Poole , Theodore A. Waniuk , Jeffrey L. Mattlin , Michael S. Nashner , Christopher D. Prest
Abstract: A metallic glass part is provided. The metallic glass part includes an alloy core and a metallic glass shell surrounding the alloy core. The alloy core provides compressive force on the metallic glass shell at an interface between the alloy core and the metallic glass shell.
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公开(公告)号：US09845523B2
公开(公告)日：2017-12-19
申请号：US14216565
申请日：2014-03-17
Applicant: Glassimetal Technology, Inc.
Inventor： Joseph P. Schramm , Jong Hyun Na , Marios D. Demetriou , David S. Lee , William L. Johnson
IPC: C21D1/54 , C22C45/00 , C21D1/40 , C22F1/00 , C22F1/10 , C22B4/06 , C22C1/00 , C22C45/04 , A61L27/04
CPC classification number: C22C45/00 , A61L27/04 , C21D1/40 , C21D2201/03 , C22B4/06 , C22C1/002 , C22C45/001 , C22C45/04 , C22F1/002 , C22F1/10
Abstract: The disclosure is directed to a method of forming high-aspect-ratio metallic glass articles that are substantially free of defects and cosmetic flaws by means of rapid capacitive discharge forming. Metallic glass alloys that are stable against crystallization for at least 100 ms at temperatures where the viscosity is in the range of 100 to 104 Pa-s are considered as suitable for forming such high-aspect-ratio articles.
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公开(公告)号：US20170259331A1
公开(公告)日：2017-09-14
申请号：US15607452
申请日：2017-05-27
Applicant: DONGGUAN EONTEC CO., LTD
Inventor： Haifeng ZHANG , Huameng FU , Zhengwang ZHU , Aimin WANG , Hong LI , Hongwei ZHANG , Yangde LI , Weirong LI , Tiezhuang TANG , Jiedan YANG
IPC: B22D41/005 , B22D27/15 , B22D17/00 , B22D17/02
Abstract: A method for forming an amorphous alloy part, including: placing a master alloy on a melting platform; heating and melting the master alloy under vacuum to yield an alloy melt; stopping heating and allowing the alloy melt to cool to a temperature between a glass transition temperature and a liquidus temperature thereof; and press-forming and cooling the alloy melt, to form the amorphous alloy part.
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公开(公告)号：US20170241004A1
公开(公告)日：2017-08-24
申请号：US15591745
申请日：2017-05-10
Applicant: C. Hafner Gmbh + Co. KG
Inventor： Jochen Heinrich , Heinz-Günter Schenzel
CPC classification number: C22F1/002 , A44C27/003 , C22C5/04 , C22C45/00 , C22C45/003 , C22C2200/02 , C22F1/14 , G04B37/22
Abstract: An amorphously solidifying noble metal alloy has the following composition of AaBbCc, wherein: A represents at least one noble metal from a group of platinum and palladium; B represents at least one element from a group of Al, Au, Ag and Cu; and C represents at least one element from a group of Ga and Ge. The mass fraction a lies in a region of 45-60 mass percent. The mass fraction b lies in the region of 39-55 mass percent. The mass fraction c lies in the region of 0-13 mass percent. Where platinum and palladium are both present, the amorphous noble metal alloy does not have aluminum as the sole alloy component from group B. The above mass fractions a, b and c, aside from typical admixtures, impurities and alloy tolerances, add up to 100 mass percent.
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