DISPLAY DEVICE
    1.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20240074248A1

    公开(公告)日:2024-02-29

    申请号:US18495815

    申请日:2023-10-27

    IPC分类号: H10K59/122 H10K59/80

    摘要: According to one embodiment, a display device comprises a first lower electrode, a rib including a first pixel aperture, a partition including a lower portion on the rib and an upper portion protruding from a side surface of the lower portion, a first upper electrode, and a first organic layer between the first lower electrode and the first upper electrode. The lower portion includes a bottom layer and a stem layer on the bottom layer. The bottom layer is formed of a material which has a smaller etching rate to a mixed acid containing phosphoric acid, nitric acid, and acetic acid than the stem layer and which is conductive.

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230413645A1

    公开(公告)日:2023-12-21

    申请号:US18327904

    申请日:2023-06-02

    IPC分类号: H10K59/80 H10K71/20

    摘要: According to one embodiment, a display device includes a lower electrode, a rib including a pixel aperture, a partition including a lower portion on the rib and an upper portion protruding from a side surface of the lower portion, an upper electrode facing the lower electrode, an organic layer between the electrodes, and a sealing layer covering a display element and the partition. The rib includes a first rib layer and a second rib layer which covers the first rib layer. The sealing layer and the first rib layer are formed of a first inorganic material. The second rib layer is formed of a second inorganic material different from the first inorganic material.

    DISPLAY DEVICE MANUFACTURING METHOD AND DISPLAY DEVICE

    公开(公告)号:US20230284509A1

    公开(公告)日:2023-09-07

    申请号:US18175549

    申请日:2023-02-28

    IPC分类号: H10K59/80 H10K71/20

    摘要: According to one embodiment, a display device manufacturing method comprises forming a lower electrode including a first metal layer and a conductive oxide layer which covers the first metal layer and which has a thickness of 15 nm or more and 50 nm or less, forming a rib covering at least a part of the lower electrode and including a pixel aperture which exposes the conductive oxide layer, forming a second metal layer above the rib and the conductive oxide layer exposed through the pixel aperture, and patterning the second metal layer by etching including wet etching to form a partition on the rib.

    DISPLAY DEVICE
    4.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20240224617A1

    公开(公告)日:2024-07-04

    申请号:US18607569

    申请日:2024-03-18

    摘要: According to one embodiment, a display device comprises a first lower electrode, a rib including a first pixel aperture, a partition including a lower portion on the rib and an upper portion protruding from a side surface of the lower portion, a first upper electrode, and a first organic layer between the first lower electrode and the first upper electrode. The lower portion includes a bottom layer and a stem layer on the bottom layer. The bottom layer is formed of a material which has a smaller etching rate to a mixed acid containing phosphoric acid, nitric acid, and acetic acid than the stem layer and which is conductive.

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20240206241A1

    公开(公告)日:2024-06-20

    申请号:US18522318

    申请日:2023-11-29

    摘要: According to one embodiment, a display device includes a lower electrode, a rib including a pixel aperture, a partition which includes a conductive bottom portion on the rib, a stem portion on the bottom portion, and a top portion on the stem portion, an organic layer which covers the lower electrode through the pixel aperture, and an upper electrode which covers the organic layer and is in contact with the bottom portion. The bottom portion and the top portion protrude from a side surface of the stem portion. A first protrusion length of the bottom portion from the side surface is greater than or equal to 0.2 μm and less than or equal to 0.7 μm.

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20240206284A1

    公开(公告)日:2024-06-20

    申请号:US18522293

    申请日:2023-11-29

    IPC分类号: H10K59/80 H10K71/16 H10K71/60

    摘要: According to one embodiment, a display device includes a lower electrode, a rib, a partition including bottom, stem and top portions, an organic layer covering the lower electrode, an upper electrode covering the organic layer and contacting the bottom portion, and a sealing layer continuously covering the partition and a thin film including the organic layer and the upper electrode. The bottom portion is formed of a molybdenum-tungsten alloy. A height from a lower surface of the bottom portion to an upper surface of the stem portion is less than or equal to 500 nm. A thickness of the sealing layer is less than or equal to 1.5 μm. A thickness of the bottom portion is greater than or equal to 50 nm.

    DISPLAY DEVICE
    7.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20230403886A1

    公开(公告)日:2023-12-14

    申请号:US18329594

    申请日:2023-06-06

    摘要: According to one embodiment, a display device includes a lower electrode, a rib formed of an inorganic insulating material and including an aperture overlapping the lower electrode, a partition including a lower portion and an upper portion, an organic layer provided on the lower electrode in the aperture, an upper electrode provided on the organic layer, a cap layer provided on the upper electrode, and a sealing layer. An edge of the aperture includes a first linear portion, a second linear portion and a curved portion connected to the first linear portion and the second linear portion. An angle between the first linear portion and the second linear portion is greater than or equal to 90°.

    MANUFACTURING METHOD OF DISPLAY DEVICE
    8.
    发明公开

    公开(公告)号:US20230255097A1

    公开(公告)日:2023-08-10

    申请号:US18165978

    申请日:2023-02-08

    IPC分类号: H10K71/60 H10K71/00 H10K71/20

    摘要: According to one embodiment, a manufacturing method of a display device includes providing a processing substrate in which a lower electrode is formed on a stage inside a chamber, forming a first insulating layer overlapping the lower electrode in a state where a first distance is formed between the stage and a counter-electrode, and subsequently forming a second insulating layer on the first insulating layer in a state where a second distance greater than the first distance is formed between the stage and the counter-electrode, forming a rib by patterning the first insulating layer and the second insulating layer, forming a partition, forming an organic layer, forming an upper electrode, forming a cap layer, and forming a sealing layer.

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230240117A1

    公开(公告)日:2023-07-27

    申请号:US18158474

    申请日:2023-01-24

    IPC分类号: H10K59/80 H10K71/00 H10K59/35

    摘要: According to one embodiment, a display device includes a lower electrode, a rib including an aperture overlapping the lower electrode, a partition on the rib, an upper electrode which is in contact with the partition, an organic layer between the lower electrode and the upper electrode, and a sealing layer above the upper electrode. The partition includes a lower portion provided on the rib, and an upper portion provided on the lower portion and including an end portion protruding from a side surface of the lower portion. The upper portion contains at least one of a conductive oxide and titanium.

    DISPLAY DEVICE
    10.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20240008316A1

    公开(公告)日:2024-01-04

    申请号:US18343759

    申请日:2023-06-29

    IPC分类号: H10K59/122 H10K59/80

    摘要: According to one embodiment, a display device comprises a first lower electrode, a rib including a first pixel aperture, a partition including a lower portion on the rib and an upper portion protruding from a side surface of the lower portion, a first upper electrode, and a first organic layer between the first lower electrode and the first upper electrode. The lower portion includes a bottom layer and a stem layer on the bottom layer. The bottom layer is formed of a material which has a smaller etching rate to a mixed acid containing phosphoric acid, nitric acid, and acetic acid than the stem layer and which is conductive.