Strain sensor patterned on MEMS flex arms
    1.
    发明授权
    Strain sensor patterned on MEMS flex arms 失效
    应变传感器图案化在MEMS柔性臂上

    公开(公告)号:US07000459B2

    公开(公告)日:2006-02-21

    申请号:US10463775

    申请日:2003-06-17

    IPC分类号: G01B5/28

    CPC分类号: G11B5/5552 G01L1/2206

    摘要: A micromechanical assembly couples to a positioning member and to a body having an aerodynamic surface subject to aerodynamic forces. The micromechanical assembly comprises a substrate including a flexible beam joining a first substrate portion that is attachable to the positioning member to a second substrate portion that is attachable to the body. The substrate includes a substrate surface extending at least over the flexible beam. A lithographic pattern is formed on the substrate surface. The lithographic pattern includes at least a first impedance element that senses flexing of the flexible beam. Contact pads are coupled to the lithographic pattern for coupling to a flex measurement circuit.

    摘要翻译: 微机械组件连接到定位构件和耦合到具有经受空气动力的空气动力学表面的主体。 微机械组件包括基板,该基板包括将可附接到定位构件的第一基板部分连接到可附接到主体的第二基板部分的柔性梁。 衬底包括至少在柔性梁上延伸的衬底表面。 在基板表面上形成平版印刷图案。 光刻图案至少包括感应柔性光束弯曲的第一阻抗元件。 接触焊盘耦合到光刻图案以耦合到柔性测量电路。

    Laterally supported handle wafer for through-wafer reactive-ion etch micromachining
    2.
    发明授权
    Laterally supported handle wafer for through-wafer reactive-ion etch micromachining 失效
    用于通过晶片反应离子蚀刻微加工的侧面支撑的处理晶片

    公开(公告)号:US06733681B1

    公开(公告)日:2004-05-11

    申请号:US09707698

    申请日:2000-11-07

    IPC分类号: B81C100

    摘要: A method of handling a wafer for through-wafer plasma etching includes lateral support provided between a handle wafer and a product wafer without wafer bonding or an adhesive film using mating mechanical structures. The product wafer is easily separated from the handle wafer following etching without stripping or cleaning. Because the connection between the wafers is mechanical, not from an adhesive layer/bonded layer, a wafer can be etched, inspected, and subsequently continue to be etched without the hindrance of repeated bonding, separation, and cleaning. A non-bonded support for released devices following a through-etch process is also provided.

    摘要翻译: 用于晶圆等离子体蚀刻处理晶片的方法包括在晶片接合之间提供的手柄晶片和产品晶片之间的侧向支撑,或者使用配合机械结构的粘合膜。 在没有剥离或清洁的情况下,产品晶片在蚀刻之后容易地与处理晶片分离。 因为晶片之间的连接是机械的,而不是粘合层/接合层,所以可以蚀刻,检查晶片并且随后继续蚀刻晶片,而不会重复地进行接合,分离和清洁。 还提供了在通过蚀刻工艺之后的释放器件的非接合支撑。

    Moving coil micro actuator with reduced rotor mass

    公开(公告)号:US06614628B2

    公开(公告)日:2003-09-02

    申请号:US10051366

    申请日:2002-01-18

    IPC分类号: G11B556

    摘要: A disc drive has a disc rotatable about an axis, a slider carrying a transducing head for transducing data with a disc, and a dual stage actuation assembly supporting the slider to position the transducing head adjacent a selected radial track of the disc. The dual stage actuation assembly includes a movable actuator arm and a suspension assembly supported by the actuator arm. The suspension assembly includes a gimbal. The dual stage actuation assembly further includes a microactuator. The microactuator includes a stator having a top surface and a bottom surface wherein the gimbal is connected to the top surface of the stator. A rotor is operatively connected to the stator and the rotor supports the slider. A magnetic keeper structure is supported by the stator such that the rotor moves with respect to the magnetic keeper structure.

    Breakable tethers for microelectromechanical system devices utilizing reactive ion etching lag
    8.
    发明授权
    Breakable tethers for microelectromechanical system devices utilizing reactive ion etching lag 有权
    用于使用反应离子蚀刻滞后的微机电系统装置的可破坏的系绳

    公开(公告)号:US06387778B1

    公开(公告)日:2002-05-14

    申请号:US09649536

    申请日:2000-08-28

    IPC分类号: H01L21301

    CPC分类号: B81C1/00873 B81C2201/0132

    摘要: Utilizing reactive ion etching (RIE) lag, tethers are fabricated that reliably hold devices in place during processing and storage, yet are easily broken to remove the parts from the wafer as desired, without requiring excessive force that could damage the devices. The tethers are fabricated by slightly narrowing the periphery etch feature at several places. By adjusting the ratio of the main periphery width to the necked width at the tethers, the final thickness of the tether can be controlled to a small fraction of the wafer thickness, so that tethers defined by readily achievable feature sizes will reliably hold the parts in place until removal is desired. Since the tethers are now only a fraction of the wafer thickness, they will reliably break to release the part at a force level that will not damage the part.

    摘要翻译: 利用反应离子蚀刻(RIE)滞后,制造了在加工和存储期间可靠地将装置保持在适当位置的系链,但是容易断裂以根据需要从晶片中除去部件,而不需要可能损坏装置的过大的力。 系绳是通过在几个地方略微缩小周边蚀刻特征来制造的。 通过调节主臂周边宽度与系绳颈缩宽度的比例,可以将系绳的最终厚度控制在晶片厚度的一小部分,从而可以容易地达到的特征尺寸所限定的系绳将可靠地保持在 地方,直到需要去除。 由于系绳现在只是晶片厚度的一部分,它们将可靠地断裂,以不会损坏零件的力水平释放零件。

    Transducer-level microactuator with dual-axis control
    9.
    发明授权
    Transducer-level microactuator with dual-axis control 失效
    带双轴控制的传感器级微型致动器

    公开(公告)号:US06785086B1

    公开(公告)日:2004-08-31

    申请号:US09815679

    申请日:2001-03-23

    IPC分类号: G11B5596

    CPC分类号: G11B5/5552

    摘要: A slider for carrying and finely adjusting both a radial position and a flying height of a transducing head with respect to a track of a rotatable disc includes a stator portion carried by a support structure such as a flexure of a disc drive system. A plurality of springs extend from the stator portion and are flexible in a lateral direction (for radial positioning) and in a vertical direction (for flying height control). A rotor portion is connected to the stator portion by the plurality of springs. The rotor portion carries the transducing head. The stator portion includes a plurality of stator electrodes, and the rotor portion includes a plurality of rotor electrodes suspended between the stator electrodes. Selected voltages are applied to the stator electrodes and the rotor electrodes to create a selected force in the lateral and vertical directions for moving the rotor portion with respect to the stator portion to finely adjust the radial position and flying height of the transducing head.

    摘要翻译: 用于承载和精细地调节换能头相对于可旋转盘的轨道的径向位置和飞行高度的滑块包括由诸如盘驱动系统的弯曲的支撑结构承载的定子部分。 多个弹簧从定子部分延伸并且在横向方向(用于径向定位)和沿垂直方向(用于飞行高度控制)是柔性的。 转子部分通过多个弹簧连接到定子部分。 转子部分承载换能头。 定子部分包括多个定子电极,转子部分包括悬置在定子电极之间的多个转子电极。 所选择的电压被施加到定子电极和转子电极以在横向和垂直方向上产生选定的力,以使转子部分相对于定子部分移动,以微调头部的径向位置和飞行高度。