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公开(公告)号：US07379155B2
公开(公告)日：2008-05-27
申请号：US10966108
申请日：2004-10-18
申请人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johaannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johaannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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公开(公告)号：US20110249246A1
公开(公告)日：2011-10-13
申请号：US13167314
申请日：2011-06-23
申请人： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译： 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号：US08934082B2
公开(公告)日：2015-01-13
申请号：US13167314
申请日：2011-06-23
申请人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译： 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号：US08004652B2
公开(公告)日：2011-08-23
申请号：US12078635
申请日：2008-04-02
申请人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译： 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号：US20080259292A1
公开(公告)日：2008-10-23
申请号：US12078635
申请日：2008-04-02
申请人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人： Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译： 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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6.发明授权Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck 有权用于支撑和/或热调理基底，支撑台和卡盘的装置，方法公开(公告)号：US07532310B2
公开(公告)日：2009-05-12
申请号：US10970658
申请日：2004-10-22
申请人： Jeroen Johannes Sophia Maria Mertens , Aschwin Lodewijk Hendricus Johannes Van Meer , Joost Jeroen Ottens , Edwin Van Gompel
发明人： Jeroen Johannes Sophia Maria Mertens , Aschwin Lodewijk Hendricus Johannes Van Meer , Joost Jeroen Ottens , Edwin Van Gompel
CPC分类号： H01L21/67109 , G03F7/707 , G03F7/70716 , G03F7/70875
摘要： An apparatus includes a support table for supporting a substrate. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.
摘要翻译： 一种装置包括用于支撑基板的支撑台。 支撑台包括在使用期间与衬底接触以支撑衬底的多个支撑突起。 支撑台包括多个传热突起，其在使用期间朝向基板延伸，而当基板由支撑突起支撑时，不接触基板。 用于与衬底交换热量的含气体的热交换间隙在传热突起和衬底之间延伸。
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公开(公告)号：US07196768B2
公开(公告)日：2007-03-27
申请号：US10972754
申请日：2004-10-26
申请人： Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
发明人： Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
CPC分类号： H01L21/67109 , G03F7/70341 , G03F7/707 , G03F7/70783 , G03F7/70875
摘要： A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.
摘要翻译： 光刻设备包括被构造为支撑衬底的衬底支撑件和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 衬底支撑件布置成沿着衬底的随后靶向目标部分的预定轨迹移动衬底。 衬底支撑件包括用于向衬底提供热稳定性的管道构造。 导管构造被布置成将支撑体中的热稳定化介质导管，并且基本上通过支撑基板的先前目标部分的基板支撑件的支撑目标部分的基板支撑件的一部分基本上导管介质，以便 以保持随后的目标靶部分热稳定。
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公开(公告)号：US20060082746A1
公开(公告)日：2006-04-20
申请号：US10966108
申请日：2004-10-18
申请人： Jeroen Johannes Mertens , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Antonius Van Der Net , Franciscus Johannes Teunissen , Patricius Aloysius Tinnemans , Martinus Cornelis Verhagen , Jacobus Johannus Leonardus Verspay , Edwin Van Gompel
发明人： Jeroen Johannes Mertens , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Antonius Van Der Net , Franciscus Johannes Teunissen , Patricius Aloysius Tinnemans , Martinus Cornelis Verhagen , Jacobus Johannus Leonardus Verspay , Edwin Van Gompel
IPC分类号： G03B27/42
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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公开(公告)号：US20060087637A1
公开(公告)日：2006-04-27
申请号：US10972754
申请日：2004-10-26
申请人： Joost Ottens , Jeroen Johannes Mertens , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
发明人： Joost Ottens , Jeroen Johannes Mertens , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Edwin Van Gompel
IPC分类号： G03B27/52
CPC分类号： H01L21/67109 , G03F7/70341 , G03F7/707 , G03F7/70783 , G03F7/70875
摘要： A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.
摘要翻译： 光刻设备包括被构造为支撑衬底的衬底支撑件和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 衬底支撑件布置成沿着衬底的随后靶向目标部分的预定轨迹移动衬底。 衬底支撑件包括用于向衬底提供热稳定性的管道构造。 导管构造被布置成将支撑体中的热稳定化介质导管，并且基本上通过支撑基板的先前目标部分的基板支撑件的支撑目标部分的基板支撑件的一部分基本上导管介质，以便 以保持随后的目标靶部分热稳定。
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