摘要:
A mother glass for a liquid crystal display and a method of fabricating a liquid crystal display using the same are disclosed. The mother glass includes a plurality of cell areas where a plurality of thin films is formed on a substrate, a dummy area disposed outside the plurality of cell areas on the substrate, and a passivation layer. The passivation layer is coated on substantially an overall portion of the plurality of cell areas, and formed in a straight line-like band form along a transverse direction in the dummy area to isolate the cell areas from each other in a longitudinal direction.
摘要:
A mother glass for a liquid crystal display and a method of fabricating a liquid crystal display using the same are disclosed. The mother glass includes a plurality of cell areas where a plurality of thin films is formed on a substrate, a dummy area disposed outside the plurality of cell areas on the substrate, and a passivation layer. The passivation layer is coated on substantially an overall portion of the plurality of cell areas, and formed in a straight line-like band form along a transverse direction in the dummy area to isolate the cell areas from each other in a longitudinal direction.
摘要:
A crystal liquid display and a method of manufacturing the same are disclosed. The liquid crystal display includes upper and lower substrates facing each other, a thin film transistor, a pixel electrode, and a passivation layer. The thin film transistor is provided at an intersection of a gate line and a data line on the lower substrate, and the gate line and the data line cross at right angles. The pixel electrode is provided in a pixel area defined by the gate line and the data line. The passivation layer covers the entire surface of the lower substrate, and includes an opening having an elevation difference surface on a predetermined portion thereof. A concave-convex pattern is provided along the elevation difference surface of the opening.
摘要:
According to example embodiments, a memory device includes a substrate, a channel region on the substrate, a plurality of gate electrode layers stacked on each other on the substrate, and a plurality of contact plugs. The gate electrode layers are adjacent to the channel region and extend in one direction to define a pad region. The gate electrode layers include first and second gate electrode layers. The contact plugs are connected to the gate electrode layers in the pad region. At least one of the contact plugs is electrically insulated from the from the first gate electrode layer and electrically connected to the second gate electrode layer by penetrating through the first gate electrode layer.
摘要:
A method of manufacturing a semiconductor device includes alternately stacking mold insulating layers and sacrificial layers on a substrate; forming channel holes penetrating through the mold insulating layers and the sacrificial layers and allowing recessed regions to be formed in the substrate; cleaning a surface of the recessed regions in such a manner that processes of forming a first protective layer in an upper region of the channel holes and performing an anisotropic dry etching process on the recessed regions in a lower portion of the channel holes are alternately repeated one or more times, in-situ; and forming epitaxial layers on the recessed regions of the substrate.