Pressure control apparatus and method of establishing a desired level or pressure within at least one processing chamber
    1.
    发明申请
    Pressure control apparatus and method of establishing a desired level or pressure within at least one processing chamber 审中-公开
    在至少一个处理室内建立所需水平或压力的压力控制装置和方法

    公开(公告)号:US20050011351A1

    公开(公告)日:2005-01-20

    申请号:US10919252

    申请日:2004-08-17

    摘要: A desired level of pressure is established in at least one chamber that forms part of a closed atmosphere, such as in a semiconductor device processing facility. A pressure control system includes at least one space increase/decrease device that has a partition which is movable to increase and/or decrease the volume of free space within the chamber(s), a pressure sensor for detecting the pressure within the chamber(s), and a controller for controlling the movement of the partition based on the detected pressure. A chamber is provided with positive or negative pressure to increase or decrease the pressure therein while the pressure in the chamber is monitored. As soon as the pressure within the chamber equals a predetermined pressure, the providing of the positive or negative pressure is stopped. The partition is moved to vary the effective volume of free space in the chamber(s) to change the pressure in the chamber from the predetermined pressure to the desired pressure.

    摘要翻译: 在形成封闭气氛的一部分的至少一个室中,例如在半导体器件处理设备中建立所需的压力水平。 压力控制系统包括至少一个空间增减装置,其具有可移动的分隔件,以增加和/或减小腔室内的自由空间的体积;压力传感器,用于检测腔室内的压力 )和用于基于检测到的压力来控制分隔件的移动的控制器。 腔室具有正压或负压以增加或减小其中的压力,同时监测腔室中的压力。 只要室内的压力等于预定的压力,停止提供正压或负压。 移动隔板以改变腔室中的自由空间的有效体积,以将腔室中的压力从预定压力改变到期望的压力。

    Pressure control apparatus and method of establishing a desired level of pressure within at least one processing chamber
    2.
    发明授权
    Pressure control apparatus and method of establishing a desired level of pressure within at least one processing chamber 有权
    在至少一个处理室内建立所需压力水平的压力控制装置和方法

    公开(公告)号:US07052576B2

    公开(公告)日:2006-05-30

    申请号:US10322557

    申请日:2002-12-19

    IPC分类号: B05C11/00 C23F1/00 H01L21/306

    摘要: A desired level of pressure is established in at least one chamber that forms part of a closed atmosphere, such as in a semiconductor device processing facility. A pressure control system includes at least one space increase/decrease device that has a partition which is movable to increase and/or decrease the volume of free space within the chamber(s), a pressure sensor for detecting the pressure within the chamber(s), and a controller for controlling the movement of the partition based on the detected pressure. A chamber is provided with positive or negative pressure to increase or decrease the pressure therein while the pressure in the chamber is monitored. As soon as the pressure within the chamber equals a predetermined pressure, the providing of the positive or negative pressure is stopped. The partition is moved to vary the effective volume of free space in the chamber(s) to change the pressure in the chamber from the predetermined pressure to the desired pressure.

    摘要翻译: 在形成封闭气氛的一部分的至少一个室中,例如在半导体器件处理设备中建立所需的压力水平。 压力控制系统包括至少一个空间增减装置,其具有可移动的分隔件,以增加和/或减小腔室内的自由空间的体积;压力传感器,用于检测腔室内的压力 )和用于基于检测到的压力来控制分隔件的移动的控制器。 腔室具有正压或负压以增加或减小其中的压力,同时监测腔室中的压力。 只要室内的压力等于预定的压力,停止提供正压或负压。 移动隔板以改变腔室中的自由空间的有效体积,以将腔室中的压力从预定压力改变到期望的压力。