NORMALLY-OFF III-NITRIDE METAL-2DEG TUNNEL JUNCTION FIELD-EFFECT TRANSISTORS
    1.
    发明申请
    NORMALLY-OFF III-NITRIDE METAL-2DEG TUNNEL JUNCTION FIELD-EFFECT TRANSISTORS 有权
    正常关闭III-NITRIDE金属2DEG隧道连接场效应晶体管

    公开(公告)号:US20130092958A1

    公开(公告)日:2013-04-18

    申请号:US13699296

    申请日:2010-09-08

    摘要: Structures, devices and methods are provided for creating heterojunction AlGaN/GaN metal two-dimensional electron gas (2DEG) tunnel-junction field-effect transistors (TJ-FET). In one aspect, metal-2DEG Schottky tunnel junctions can be employed in group III-Nitride field-effect devices that enable normally-off operation, large breakdown voltage, low leakage current, and high on/off current ratio. As a further advantage, AlGaN/GaN metal-2DEG TJ-FETs are disclosed that can be fabricated in a lateral configuration and/or a vertical configuration. Further non-limiting embodiments are provided that illustrate the advantages and flexibility of the disclosed structures.

    摘要翻译: 提供了用于产生异质结AlGaN / GaN金属二维电子气(2DEG)隧道结场效应晶体管(TJ-FET)的结构,器件和方法。 在一方面,金属2DEG肖特基隧道结可以用于能够进行常关断操作,大的击穿电压,低漏电流和高导通/截止电流比的III-N型氮化物场效应器件中。 作为另外的优点,公开了可以以横向配置和/或垂直配置制造的AlGaN / GaN金属2DEG TJ-FET。 提供了另外的非限制性实施例,其示出了所公开的结构的优点和灵活性。

    Normally-off III-nitride metal-2DEG tunnel junction field-effect transistors
    2.
    发明授权
    Normally-off III-nitride metal-2DEG tunnel junction field-effect transistors 有权
    常规III族氮化物金属 - 2DEG隧道结场效应晶体管

    公开(公告)号:US08809987B2

    公开(公告)日:2014-08-19

    申请号:US13699296

    申请日:2010-09-08

    摘要: Structures, devices and methods are provided for creating heterojunction AlGaN/GaN metal two-dimensional electron gas (2DEG) tunnel-junction field-effect transistors (TJ-FET). In one aspect, metal-2DEG Schottky tunnel junctions can be employed in group III-Nitride field-effect devices that enable normally-off operation, large breakdown voltage, low leakage current, and high on/off current ratio. As a further advantage, AlGaN/GaN metal-2DEG TJ-FETs are disclosed that can be fabricated in a lateral configuration and/or a vertical configuration. Further non-limiting embodiments are provided that illustrate the advantages and flexibility of the disclosed structures.

    摘要翻译: 提供了用于产生异质结AlGaN / GaN金属二维电子气(2DEG)隧道结场效应晶体管(TJ-FET)的结构,器件和方法。 在一方面,金属2DEG肖特基隧道结可以用于能够进行常关断操作,大的击穿电压,低漏电流和高导通/截止电流比的III-N型氮化物场效应器件中。 作为另外的优点,公开了可以以横向配置和/或垂直配置制造的AlGaN / GaN金属2DEG TJ-FET。 提供了另外的非限制性实施例,其示出了所公开的结构的优点和灵活性。

    NTC THIN FILM THERMAL RESISTOR AND A METHOD OF PRODUCING IT
    3.
    发明申请
    NTC THIN FILM THERMAL RESISTOR AND A METHOD OF PRODUCING IT 审中-公开
    NTC薄膜热电阻及其生产方法

    公开(公告)号:US20110068890A1

    公开(公告)日:2011-03-24

    申请号:US12919169

    申请日:2008-12-05

    IPC分类号: H01C7/04 H01C7/02

    摘要: This invention relates to a method for thin film device. The method for manufacturing a thin film negative temperature coefficient thermistor is disclosed. It includes selecting a substrate, a temperature-sensitive layer, inner electrodes, a protective layer and end electrodes. The temperature-sensitive layer is an NTC thin film, the inner electrodes have a comb-shaped structure. The resistance value of the present invention can be regulated by changing material composition and the width, gap, length of comb-shaped electrodes, which are not influenced by the error of the thermistor physical size. In present invention, a high temperature glaze is engaged to smooth the surface of cheaper ceramic substrates. This process reduces the manufacturing cost, improves the structure, enhances the reliability and the yield and thus expands the application scope of the NTC thin film thermistor chips. The invention has an industrial practicability.

    摘要翻译: 本发明涉及一种薄膜器件的方法。 公开了薄膜负温度系数热敏电阻的制造方法。 其包括选择基板,感温层,内电极,保护层和端电极。 温度敏感层是NTC薄膜,内部电极具有梳状结构。 可以通过改变不受热敏电阻物理尺寸的误差影响的梳状电极的材料组成和宽度,间隙,长度来调节本发明的电阻值。 在本发明中,高温釉料被接合以使廉价陶瓷基板的表面光滑。 该工艺降低了制造成本,改善了结构,提高了可靠性和产量,从而扩大了NTC薄膜热敏电阻芯片的应用范围。 本发明具有工业实用性。