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公开(公告)号：US07019908B2
公开(公告)日：2006-03-28
申请号：US10909167
申请日：2004-07-29
申请人： Johannes Christiaan van 't Spijker , Marco Jan-Jaco Wieland , Ernst Habekotte , Floris Pepijn van der Wilt
发明人： Johannes Christiaan van 't Spijker , Marco Jan-Jaco Wieland , Ernst Habekotte , Floris Pepijn van der Wilt
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70383 , H01J37/3177 , H01J2237/0435
摘要： The invention relates to a modulator for modulating the magnitude of a beamlet in a multi-beamlet lithography system, said modulator comprising at least one means for influencing the direction of a beamlet, a light sensitive element for receiving light from a modulated light beam and converting said light into a signal, and discretizing means, coupling to said light sensitive element and to at least one of means for influencing, for converting said signal received from said light sensitive element into a discrete signal having discrete values selected from a set of predefined discrete values and providing said discrete signal to said means for influencing.
摘要翻译： 本发明涉及一种用于调制多子束光刻系统中的子束幅度的调制器，所述调制器包括至少一个影响子束方向的装置，用于接收来自调制光束的光的光敏元件和转换器 将所述光转换为信号，以及离散化装置，耦合到所述光敏元件和至少一个用于影响从所述光敏元件接收的信号转换成具有从一组预定离散值中选择的离散值的离散信号的装置 值，并将所述离散信号提供给所述用于影响的装置。
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公开(公告)号：US20120287410A1
公开(公告)日：2012-11-15
申请号：US13290139
申请日：2011-11-07
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31774
摘要： The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.
摘要翻译： 本发明涉及一种用于使用多个带电粒子子束来图案化靶的无掩模光刻系统。 该系统包括电子光学柱，其包括用于调制子束的阻挡阵列。 消隐器阵列包括用于接收数据信号的接收器和用于根据数据信号调制子束的消隐元件。 该系统还包括数据路径，该数据路径包括用于处理模式数据的预处理系统和用于将处理后的图案数据发送到消隐元件的多个传输通道。 数据路径还包括用于接收模式数据和产生数据信号的模式流传输系统。 第一和第二信道选择器连接用于模式数据传输的所选传输信道的子集。 第一通道选择器连接在预处理系统和传输通道之间。 第二通道选择器连接在通道和消声器元件之间。
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公开(公告)号：US09305747B2
公开(公告)日：2016-04-05
申请号：US13290139
申请日：2011-11-07
IPC分类号： H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31774
摘要： The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.
摘要翻译： 本发明涉及一种用于使用多个带电粒子子束来图案化靶的无掩模光刻系统。 该系统包括电子光学柱，其包括用于调制子束的阻挡阵列。 消隐器阵列包括用于接收数据信号的接收器和用于根据数据信号调制子束的消隐元件。 该系统还包括数据路径，该数据路径包括用于处理模式数据的预处理系统和用于将处理后的图案数据发送到消隐元件的多个传输通道。 数据路径还包括用于接收模式数据和产生数据信号的模式流传输系统。 第一和第二信道选择器连接用于模式数据传输的所选传输信道的子集。 第一通道选择器连接在预处理系统和传输通道之间。 第二通道选择器连接在通道和消声器元件之间。
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公开(公告)号：US20050062950A1
公开(公告)日：2005-03-24
申请号：US10909167
申请日：2004-07-29
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70383 , H01J37/3177 , H01J2237/0435
摘要： The invention relates to a modulator for modulating the magnitude of a beamlet in a multi-beamlet lithography system, said modulator comprising at least one means for influencing the direction of a beamlet, a light sensitive element for receiving light from a modulated light beam and converting said light into a signal, and discretizing means, coupling to said light sensitive element and to at least one of means for influencing, for converting said signal received from said light sensitive element into a discrete signal having discrete values selected from a set of predefined discrete values and providing said discrete signal to said means for influencing.
摘要翻译： 本发明涉及一种用于调制多子束光刻系统中的子束幅度的调制器，所述调制器包括至少一个影响子束方向的装置，用于接收来自调制光束的光的光敏元件和转换器 将所述光转换为信号，以及离散化装置，耦合到所述光敏元件和至少一个用于影响从所述光敏元件接收的信号转换成具有从一组预定离散值中选择的离散值的离散信号的装置 值，并将所述离散信号提供给所述用于影响的装置。
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