-
公开(公告)号:US07019908B2
公开(公告)日:2006-03-28
申请号:US10909167
申请日:2004-07-29
申请人: Johannes Christiaan van 't Spijker , Marco Jan-Jaco Wieland , Ernst Habekotte , Floris Pepijn van der Wilt
发明人: Johannes Christiaan van 't Spijker , Marco Jan-Jaco Wieland , Ernst Habekotte , Floris Pepijn van der Wilt
CPC分类号: B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70383 , H01J37/3177 , H01J2237/0435
摘要: The invention relates to a modulator for modulating the magnitude of a beamlet in a multi-beamlet lithography system, said modulator comprising at least one means for influencing the direction of a beamlet, a light sensitive element for receiving light from a modulated light beam and converting said light into a signal, and discretizing means, coupling to said light sensitive element and to at least one of means for influencing, for converting said signal received from said light sensitive element into a discrete signal having discrete values selected from a set of predefined discrete values and providing said discrete signal to said means for influencing.
摘要翻译: 本发明涉及一种用于调制多子束光刻系统中的子束幅度的调制器,所述调制器包括至少一个影响子束方向的装置,用于接收来自调制光束的光的光敏元件和转换器 将所述光转换为信号,以及离散化装置,耦合到所述光敏元件和至少一个用于影响从所述光敏元件接收的信号转换成具有从一组预定离散值中选择的离散值的离散信号的装置 值,并将所述离散信号提供给所述用于影响的装置。
-
公开(公告)号:US08242470B2
公开(公告)日:2012-08-14
申请号:US11653107
申请日:2007-01-11
CPC分类号: G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译: 一种用于将图案转印到目标表面上的无掩模光刻系统。 用于产生多个子束的至少一个光束发生器。 多个调制器调制小波束的幅度,并且控制单元控制调制器。 控制单元生成并将模式数据传送到调制器,以控制每个单独子束的幅度。 控制单元包括用于存储图案数据的至少一个数据存储器,用于从数据存储器读出数据的至少一个读出单元,至少一个数据转换器,用于将从数据存储器读出的数据转换为至少 一个调制光束和至少一个用于将至少一个调制光束发射到调制调制器的光发射器。
-
公开(公告)号:US08525134B2
公开(公告)日:2013-09-03
申请号:US12611847
申请日:2009-11-03
IPC分类号: G21K5/10 , H01J37/147 , G03B27/54 , G03B27/72 , G03F7/20 , H01J37/317
CPC分类号: G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
-
公开(公告)号:US20100045958A1
公开(公告)日:2010-02-25
申请号:US12611847
申请日:2009-11-03
IPC分类号: G03B27/72
CPC分类号: G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译: 一种用于将图案转印到目标表面上的无掩模光刻系统。 用于产生多个子束的至少一个光束发生器。 多个调制器调制小波束的幅度,并且控制单元控制调制器。 控制单元生成并将模式数据传送到调制器,以控制每个单独子束的幅度。 控制单元包括用于存储图案数据的至少一个数据存储器,用于从数据存储器读出数据的至少一个读出单元,至少一个数据转换器,用于将从数据存储器读出的数据转换为至少 一个调制光束,以及至少一个光发射器,用于将至少一个调制光束传输到调制调制器。
-
公开(公告)号:US07173263B2
公开(公告)日:2007-02-06
申请号:US11225604
申请日:2005-09-12
CPC分类号: G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator generates a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls each of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译: 一种用于将图案转印到目标表面上的无掩模光刻系统。 至少一个光束发生器产生多个子束。 多个调制器调制子束的幅度,并且控制单元控制每个调制器。 控制单元生成并将模式数据传送到调制器,以控制每个单独子束的幅度。 控制单元包括用于存储图案数据的至少一个数据存储器,用于从数据存储器读出数据的至少一个读出单元,至少一个数据转换器,用于将从数据存储器读出的数据转换为至少 一个调制光束和至少一个用于将至少一个调制光束发射到调制调制器的光发射器。
-
公开(公告)号:US20080158536A1
公开(公告)日:2008-07-03
申请号:US12041634
申请日:2008-03-03
CPC分类号: G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译: 一种用于将图案转印到目标表面上的无掩模光刻系统。 用于产生多个子束的至少一个光束发生器。 多个调制器调制小波束的幅度,并且控制单元控制调制器。 控制单元生成并将模式数据传送到调制器,以控制每个单独子束的幅度。 控制单元包括用于存储图案数据的至少一个数据存储器,用于从数据存储器读出数据的至少一个读出单元,至少一个数据转换器,用于将从数据存储器读出的数据转换为至少 一个调制光束,以及至少一个光发射器,用于将至少一个调制光束传输到调制调制器。
-
公开(公告)号:US06958804B2
公开(公告)日:2005-10-25
申请号:US10692632
申请日:2003-10-24
IPC分类号: G03F7/20 , H01J37/317 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号: G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译: 一种用于将图案转印到目标表面上的无掩模光刻系统。 用于产生多个子束的至少一个光束发生器。 多个调制器调制小波束的幅度,并且控制单元控制调制器。 控制单元生成并将模式数据传送到调制器,以控制每个单独子束的幅度。 控制单元包括用于存储图案数据的至少一个数据存储器,用于从数据存储器读出数据的至少一个读出单元,至少一个数据转换器,用于将从数据存储器读出的数据转换为至少 一个调制光束和至少一个用于将至少一个调制光束发射到调制调制器的光发射器。
-
-
-
-
-
-