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    Atomic absorption process monitoring
    1.
    发明授权
    Atomic absorption process monitoring 失效
    原子吸收过程监测

    公开(公告)号：US5018855A

    公开(公告)日：1991-05-28

    申请号：US262969

    申请日：1988-10-26

    Applicant: John Davison ,  Chung Hsu

    Inventor： John Davison ,  Chung Hsu

    IPC: G01N1/00 ,  G01N21/31 ,  G01N21/74 ,  G01N35/10

    CPC classification number: G01N35/1083 ,  G01N21/3103 ,  G01N2035/1006 ,  G01N21/74 ,  G01N2201/0469

    Abstract: Disclosed is an atomic absorbtion spectrophotometer method and apparatus, for automated real time analysis of an analyte in a continuous process stream. The apparatus comprises a sample arm for delivering a quantity of sample from a sample cup to a sample atomizer. The sample cup is in valved communication with each of a source of fluid sample and a source of wash solution. In a preferred embodiment, the sample cup is additionally in valved communication with a source of a reference control. Additionally disclosed is an easily serviceable sample atomizer, having a tungsten coil heating element removably secured therein.

    Abstract translation: 公开了一种原子吸收分光光度计方法和装置，用于对连续工艺流中的分析物进行自动化实时分析。 该装置包括用于将一定量样品从样品杯输送到样品雾化器的样品臂。 样品杯与流体样品源和洗涤溶液源中的每一个进行阀门连通。 在优选实施例中，样品杯另外与参考控制源的阀通信。 另外公开了一种易于使用的样品雾化器，其具有可拆卸地固定在其中的钨线圈加热元件。

    Combination therapy with inhibitors of inducible nitric oxide synthase and alkylating agents
    2.
    发明申请
    Combination therapy with inhibitors of inducible nitric oxide synthase and alkylating agents 审中-公开
    用诱导型一氧化氮合酶抑制剂和烷化剂联合治疗

    公开(公告)号：US20050203082A1

    公开(公告)日：2005-09-15

    申请号：US10918535

    申请日：2004-08-13

    Applicant: Chung Hsu ,  Pamela Manning ,  Thomas Misko

    Inventor： Chung Hsu ,  Pamela Manning ,  Thomas Misko

    IPC: A61K31/175 ,  A61K31/198 ,  A61K31/53 ,  A61K31/55 ,  A61K45/06 ,  A61P35/00

    CPC classification number: A61K31/175 ,  A61K31/198 ,  A61K45/06 ,  A61K2300/00

    Abstract: A combination therapy comprising administration of a carbamoylating chemotherapeutic agent in conjunction with administration of a selective iNOS inhibitor compound is disclosed. Optionally, resection and radiation therapy are provided with the therapeutic combination. A medicament comprising a carbamoylating chemotherapeutic agent and a selective iNOS inhibitor compound together with a pharmaceutically acceptable carrier is further disclosed. A kit comprising a carbamoylating chemotherapeutic agent and a selective iNOS inhibitor compound is further disclosed.

    Abstract translation: 公开了一种组合疗法，其包括联合施用选择性iNOS抑制剂化合物的氨基甲酰化化学治疗剂。 任选地，治疗组合提供切除和放射治疗。 还公开了包含氨基甲酰化化学治疗剂和选择性iNOS抑制剂化合物以及药学上可接受的载体的药物。 还公开了包含氨基甲酰化化学治疗剂和选择性iNOS抑制剂化合物的试剂盒。

    Well mask for CMOS process
    3.
    发明授权
    Well mask for CMOS process 失效
    CMOS工艺的掩模

    公开(公告)号：US4713329A

    公开(公告)日：1987-12-15

    申请号：US757331

    申请日：1985-07-22

    Applicant: Robert Fang ,  Jerry Wang ,  Victor Liang ,  Joseph Farb ,  Chung Hsu

    Inventor： Robert Fang ,  Jerry Wang ,  Victor Liang ,  Joseph Farb ,  Chung Hsu

    IPC: H01L27/08 ,  H01L21/762 ,  H01L21/8238 ,  H01L29/78

    CPC classification number: H01L21/823892 ,  H01L21/76221

    Abstract: A method of forming CMOS transistors with self-aligned field regions. First and second spaced apart areas are provided on a silicon substrate. A masking member is formed protecting the first of said areas and exposing the second. The exposed area is doped with a p-type material which is driven in to form a p-well. The same region is again doped with additional p-type material after which the CMOS transistors are fabricated.

    Abstract translation: 一种形成具有自对准场区域的CMOS晶体管的方法。 第一和第二间隔开的区域设置在硅衬底上。 形成掩蔽构件，保护所述第一区域并暴露第二区域。 曝光区域掺杂有p型材料，其被驱动以形成p阱。 相同的区域再次掺杂有额外的p型材料，之后制造CMOS晶体管。

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