公开(公告)号：US5981147A

公开(公告)日：1999-11-09

申请号：US835873

申请日：1997-04-08

申请人： John Scott Hallock ,  Alan Frederick Becknell ,  Cynthia Louise Ebner ,  Daniel Joseph Hart

发明人： John Scott Hallock ,  Alan Frederick Becknell ,  Cynthia Louise Ebner ,  Daniel Joseph Hart

IPC分类号： C09D4/00 ,  C09D4/02 ,  C09D4/06 ,  G03F7/004 ,  G03F7/027 ,  G03F7/031 ,  G03F7/033 ,  H05K3/00 ,  H05K3/06 ,  H05K3/18

CPC分类号： G03F7/033 ,  G03F7/0048 ,  H05K3/0076

摘要： Disclosed are waterborne, stable photoresist compositions and methods of their preparation and use. The compositions are characterized by increased shear and storage stability. The photoresist composition comprises an aqueous emulsion of a 22% or less neutralized carboxylated resin and non-ionic surfactant containing poly(ethylene-oxide) segments, photopolymerizable monomer and photoinitiator. Neutralization is accomplished using either an organic or an inorganic base or mixtures thereof. The photoresist compositions are useful to selectively coat and protect surfaces subjected to corrosive environments, e.g., etchant processes, in the production of circuit traces for electronic circuit boards.

摘要翻译： 公开了水性，稳定的光致抗蚀剂组合物及其制备和使用方法。 组合物的特征在于增加的剪切和储存稳定性。 光致抗蚀剂组合物包含22％或更少中和的羧化树脂和含有聚（环氧乙烷）链段的非离子表面活性剂，光聚合单体和光引发剂的水性乳液。 使用有机或无机碱或其混合物完成中和。 光致抗蚀剂组合物可用于在电子电路板的电路迹线的生产中选择性地涂覆和保护经受腐蚀环境（例如蚀刻剂工艺）的表面。