METHODS OF PATTERNING AND MAKING MASKS FOR THREE-DIMENSIONAL SUBSTRATES
    1.
    发明申请
    METHODS OF PATTERNING AND MAKING MASKS FOR THREE-DIMENSIONAL SUBSTRATES 审中-公开
    用于三维基板的方法和制作掩模

    公开(公告)号:US20150309336A1

    公开(公告)日:2015-10-29

    申请号:US14696108

    申请日:2015-04-24

    IPC分类号: G02C11/00 C25D1/10

    摘要: The present invention provides a method of making a mask for patterning a three-dimensional substrate. A mandrel includes a form machined in a surface corresponding to a shape of the substrate. A layer of material is deposited in a first region of the form and a metal layer is deposited in a second region of the form. A portion of the mandrel is subsequently removed. The present invention also provides a method of patterning a three-dimensional substrate with a mask.

    摘要翻译: 本发明提供一种制备用于图案化三维基板的掩模的方法。 心轴包括在对应于基底的形状的表面中加工的形状。 一层材料沉积在该形式的第一区域中,并且金属层沉积在该形式的第二区域中。 心轴的一部分随后被去除。 本发明还提供了用掩模对三维基板进行图案化的方法。