PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE
    2.
    发明申请
    PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE 审中-公开
    制备聚合物消除结构的方法

    公开(公告)号:US20100028816A1

    公开(公告)日:2010-02-04

    申请号:US12438209

    申请日:2007-08-28

    IPC分类号: G03F7/00

    CPC分类号: G03F7/36 G03F7/031

    摘要: The invention relates to a process for the preparation of a polymeric relief structure comprising the steps of coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients, locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, and polymerizing and/or crosslinking the resulting coated substrate, wherein the coating composition comprises one or more radical scavengers in an amount sufficient to inhibit/retard substantial polymerization in the non-treated areas of the coated substrate, and low enough to allow polymerization and/or crosslinking in the treated areas in step c, with the proviso that the amount of oxygen present in the coating composition is not equal to the equilibrium amount of oxygen present when the coating composition is in contact with air.

    摘要翻译: 本发明涉及一种制备聚合物浮雕结构的方法,包括以下步骤:用包含一种或多种辐射敏感成分的涂料组合物涂覆基材,用具有周期性或随机辐射强度的电磁辐射局部处理涂覆的基材 形成潜像,并且聚合和/或交联所得涂覆的基底,其中涂层组合物包含足以抑制/延迟涂覆的基底的未处理区域中的基本聚合的量的一种或多种自由基清除剂,以及 足够低以允许在步骤c中处理的区域中的聚合和/或交联,条件是涂料组合物中存在的氧的量不等于当涂料组合物与空气接触时存在的氧的平衡量。